Patents by Inventor Feng Lu

Feng Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250140489
    Abstract: An automatic transfer switch is provided. A transfer module is arranged between two power switches and disposed on a displacement mechanism which is in linear motion. The transfer module is provided with a seat in which two corresponding levers are mounted and electrically connected with a controller. The two levers are locked or released under control of the controller. Thereby the power switch is pulled or pushed selectively by the levers being locked or released. In combination with the controller used for setting a time delay during transfer between power sources, the power switch can be turned on/off or switched at the time required.
    Type: Application
    Filed: October 25, 2023
    Publication date: May 1, 2025
    Inventor: WEN-FENG LU
  • Patent number: 12288089
    Abstract: A method for transferring virtual machines across hypervisors is described. According to the method, a data management system may interface with a first hypervisor platform and a second hypervisor platform. The data management system may obtain a snapshot of a first virtual machine executing on the first hypervisor platform. The snapshot may include data and metadata associated with the first virtual machine in a first format that is supported by the first hypervisor platform. The data management system may extract the data and the metadata from the snapshot of the first virtual machine and convert the data and the metadata from the first format to a second format that is supported by the second hypervisor platform. The data management system may transfer the data and the metadata in the second format to a second virtual machine executing on the second hypervisor platform.
    Type: Grant
    Filed: March 29, 2022
    Date of Patent: April 29, 2025
    Assignee: Rubrik, Inc.
    Inventors: Feng Lu, Karthik Narasandra Manjunatha Rao, Disheng Su, Li Ding
  • Publication number: 20250132851
    Abstract: A time synchronization method used for a time synchronization device is provided. The time synchronization device runs a plurality of Precision Time Protocol (PTP) instances to connect to a plurality of time synchronization domains through a plurality of ports. The time synchronization method includes selecting a grandmaster (GM) clock from the plurality of time synchronization domains; updating clock information of the grandmaster clock; determining whether each of the plurality of ports is a time receiving port or a time transmitting port according to the grandmaster clock; modifying clock attributes of each of the plurality of PTP instances according to whether the corresponding port is the time receiving port or the time transmitting port; and synchronizing, by the plurality of PTP instances, timings of the plurality of time synchronization domains according to the grandmaster clock.
    Type: Application
    Filed: February 1, 2024
    Publication date: April 24, 2025
    Applicant: Moxa Inc
    Inventors: Yi-Feng Lu, Chien-Yu Lai, Chi-Chuan Liu, Po-Hung Lin, Hou-Chen Liu
  • Publication number: 20250132852
    Abstract: A time synchronization method is provided for a time synchronization device, wherein the time synchronization device runs a plurality of precision time protocol (PTP) instances to connect to a plurality of time synchronization domains respectively. The time synchronization method includes determining whether a frequency of a local PTP clock of the time synchronization device is changed; and updating a frequency of a local clock of the time synchronization device with the frequency of the local PTP clock in response to the frequency of the local PTP clock being changed.
    Type: Application
    Filed: November 20, 2023
    Publication date: April 24, 2025
    Applicant: Moxa Inc.
    Inventors: Yi-Feng Lu, Chien-yu Lai, Chi-Chuan Liu, Po-Hung Lin, Hou-Chen Liu
  • Publication number: 20250127858
    Abstract: Provided herein are cytokine muteins and cytokine prodrugs and methods of making and using thereof.
    Type: Application
    Filed: November 26, 2024
    Publication date: April 24, 2025
    Applicant: ASKGENE PHARMA, INC.
    Inventors: Chunxiao YU, Yuefeng LU, Jian-Feng LU
  • Publication number: 20250124736
    Abstract: Provided are a display panel and a display device. An array layer is located on a substrate. A display layer is located on a side of the array layer facing away from the substrate and includes light-emitting elements. A color filter layer is located on a side of the display layer facing away from the array layer. The color filter layer includes a light-blocking layer and color filters. The light-blocking layer includes first light-blocking part. At least one light-transmitting aperture is disposed in the first light-blocking part. First metal part overlaps the first light-blocking part. Further provided is a display device including the preceding display panel.
    Type: Application
    Filed: December 20, 2024
    Publication date: April 17, 2025
    Applicant: Shanghai Tianma Micro-Electronics Co., Ltd.
    Inventors: Feng LU, Yang ZENG
  • Publication number: 20250102908
    Abstract: An organotin photoresist composition and a method of forming photolithography pattern are described. The organotin photoresist composition comprises a bridged-(stannocenyl)tin compound, a solvent, and/or an additive. Stannocenyl comprises bis(cyclopentadienyl)tin, or substituted bis(cyclopentadienyl)tin, wherein cyclopentadienyl is cyclopentadienyl C5H5 group, or substituted cyclopentadienyl C5H3R, C5H2R2, C5HR3, or C5R4 group. A method of forming the pattern comprises: depositing bridged-(stannocenyl)tin compound photoresist over a substrate to form a photoresist layer, exposing the photoresist layer to actinic radiation to form a latent pattern, and then developing to form photolithography pattern.
    Type: Application
    Filed: July 4, 2024
    Publication date: March 27, 2025
    Inventor: Feng Lu
  • Publication number: 20250104954
    Abstract: According to an embodiment of the present disclosure, there is provided a solid-state circuit breaker and its self-test method.
    Type: Application
    Filed: December 4, 2023
    Publication date: March 27, 2025
    Applicant: Schneider Electric (China) Co., Ltd.
    Inventors: Feng Lu, Haijung Zhao, Jiamin Chen, Jialu Bai
  • Publication number: 20250105849
    Abstract: An electronic oscillator circuit and a method for controlling an oscillation frequency of a ring oscillator circuit. The circuit includes a plurality of inverter stages each Including an inverter and a trans-resistance switch circuit configured to switch on the inverter during an operation of the electronic oscillator circuit thereby facilitating the inverter to generate an inverter output signal in response to an inverter input signal fed to the inverter; wherein the inverters in the plurality of the inverter stages are connected to form a ring oscillator circuit.
    Type: Application
    Filed: September 27, 2023
    Publication date: March 27, 2025
    Inventors: Feng Lu, Jing Jung Tang
  • Publication number: 20250093240
    Abstract: A method of identifying defects in crystals includes the following steps. A silicon carbide crystal to be identified for defects is sliced to obtain a test piece. An etching process is performed on the test piece. Etching conditions of the etching process includes the following. An etchant including potassium hydroxide is used, and etching is performed at a temperature of 400° C. to 550° C. in an environment where dry air or oxygen is introduced, so as to form etching pits of threading edge dislocations (TED) and threading screw dislocations (TSD) in the test piece. After the etching process is performed, a diameter ratio (TED/TSD) of the etching pits of the threading edge dislocations (TED) and the threading screw dislocations (TSD) observed by an optical microscope in the test piece is in a range of 0.2 to 0.5.
    Type: Application
    Filed: July 18, 2024
    Publication date: March 20, 2025
    Applicant: GlobalWafers Co., Ltd.
    Inventors: YewChung Sermon Wu, Bing-Yue Tsui, Tsan-Feng Lu, Cheng-Jui Yang, Chen Yuan Lee
  • Publication number: 20250094630
    Abstract: A proxy service apparatus obtains first data of user equipment. The proxy service apparatus saves the first data locally to obtain second data, where the second data is configured for review by a user. The proxy service apparatus sends the second data when the proxy service apparatus determines that the second data meets a first forwarding rule.
    Type: Application
    Filed: November 25, 2024
    Publication date: March 20, 2025
    Inventors: Feng LU, Shuo YANG
  • Patent number: 12256612
    Abstract: A display panel and a display device are provided. The display panel includes a display area, a light transmission area, a first frame area, a crack detection line in the first frame area, and two first connection lines. The first frame area surrounds the light transmission area and the display area surrounding the first frame area. At least a portion of the crack detection line extends along a circumferential direction of the light transmission area. The crack detection line is connected to the two first connection lines. Each first connection line of the two first connection lines includes a first end connected to the crack detection line and a second end away from the first end. A distance between two first ends of the two first connection lines is larger than a distance between two second ends of the two first connection lines.
    Type: Grant
    Filed: February 17, 2022
    Date of Patent: March 18, 2025
    Assignee: Shanghai Tianma Micro-Electronics Co., Ltd.
    Inventors: Jing Zhang, Feng Lu
  • Patent number: 12252777
    Abstract: A physical vapor deposition (PVD) system is provided. The PVD system includes a PVD chamber defining a PVD volume within which a target material of a target is deposited onto a wafer. The PVD system includes the target in the PVD chamber. The target is configured to overlie the wafer. An edge of the target extends from a first surface of the target to a second surface of the target, opposite the first surface of the target. A first portion of the edge of the target has a first surface roughness. The first portion of the edge of the target extends at most about 6 millimeters from the first surface of the target to a second portion of the edge of the target. The second portion of the edge of the target has a second surface roughness less than the first surface roughness.
    Type: Grant
    Filed: May 7, 2021
    Date of Patent: March 18, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
    Inventors: Sheng-Ying Wu, Ming-Hsien Lin, Po-Wei Wang, Hsiao-Feng Lu
  • Publication number: 20250089245
    Abstract: A semiconductor structure includes a substrate and a word line. The substrate includes active regions and non-active regions that are alternately disposed in the first direction and extend in the second direction. The word line across the active regions and the non-active regions. The word line includes first conductive portions corresponding to the active regions, isolation pillars corresponding to the non-active regions, an inter-gate dielectric layer disposed on the first conductive portions and the isolation pillars, and a second conductive portion disposed on the inter-gate dielectric layer and extends in the first direction. The first conductive portions and the isolation pillars are disposed alternately in the first direction. Protruding parts of the second conductive portion correspond to the non-active regions, and the isolation pillars are on opposite sides of the corresponding protruding parts in a cross-section of the non-active region along the second direction.
    Type: Application
    Filed: November 2, 2023
    Publication date: March 13, 2025
    Inventors: Cheng-Shuai LI, Meng-Hsien TSAI, Yueh-Feng LU, Kao-Tsair TSAI
  • Patent number: 12249985
    Abstract: A voltage comparator circuit for a power source having an energy harvester and an energy storage. The circuit comprises a first voltage input node and a second voltage input node arranged to respectively receive a first voltage level of a first output of the energy harvester and a voltage level of a second output of the energy storage; an output node arranged to switch in response to a comparison of the first and second first voltage levels; and a plurality of semiconductor junction devices arranged to provide a floating local ground arranged to vary in response to a change of the first and/or the second voltage level, wherein the floating local ground has a voltage level higher than an absolute ground connected to the voltage comparator circuit; wherein the floating local ground is arranged to prevent a breakdown of circuit components due to a voltage difference connected at terminals of each of the circuit component exceeding a breakdown voltage of the respective circuit component.
    Type: Grant
    Filed: March 16, 2023
    Date of Patent: March 11, 2025
    Inventors: Feng Lu, Jing Jung Tang
  • Publication number: 20250076755
    Abstract: An organotin photoresist composition for photolithography patterning is described, wherein organotin photoresist composition comprises a (stannocenyl oxide) tin compound, a solvent, and/or an additive. (Stannocenyl oxide) tin compound comprises cyclopentadienyl C5H5 group, or substituted cyclopentadienyl C5H4R, C5H3R2, C5H2R3, C5HR4, or C5R5 group. A method for photolithography patterning comprises depositing (stannocenyl oxide)tin compound photoresist composition over a substrate to form a photoresist layer; exposing the (stannocenyl oxide)tin photoresist layer to actinic radiation to form a latent pattern; and developing the latent pattern by applying a developer to remove the unexposed or exposed portion of photoresists to form a photolithography pattern.
    Type: Application
    Filed: August 22, 2024
    Publication date: March 6, 2025
    Inventor: Feng Lu
  • Publication number: 20250076369
    Abstract: A minimum IC operating voltage searching method includes acquiring a corner type of an IC, acquiring ring oscillator data of the IC, generating a first prediction voltage according to the corner type and the ring oscillator data by using a training model, generating a second prediction voltage according to the ring oscillator data by using a non-linear regression approach under an N-ordered polynomial, and generating a predicted minimum IC operating voltage according to the first prediction voltage and the second prediction voltage. N is a positive integer.
    Type: Application
    Filed: April 16, 2024
    Publication date: March 6, 2025
    Applicant: MEDIATEK INC.
    Inventors: Ronald Kuo-Hua Ho, Kun-Yu Wang, Yen-Chang Shih, Sung-Te Chen, Cheng-Han Wu, Yi-Ying Liao, Chun-Ming Huang, Yen-Feng Lu, Ching-Yu Tsai, Tai-Lai Tung, Kuan-Fu Lin, Bo-Kang Lai, Yao-Syuan Lee, Tsyr-Rou Lin, Ming-Chao Tsai, Li-Hsuan Chiu
  • Patent number: 12244210
    Abstract: The invention discloses a convenient human and animal power drive permanent magnet power generation and storage system, comprising a grip power drive power generation system; the grip power drive power generation system is a dumbbell-shaped grip power generation device, comprising a grip handle and power generation devices provided at both ends of the grip handle; the power generation device is composed of a permanent magnet generator, a tensioning wheel, a spring sheet, a winder ratchet device, and a battery; folding buckles are provided between the power generation devices at both ends and the grip handle so as to be folded inward. The invention solves the problem of continuous power guarantee of wearable intelligent device; in the invention, the grip-type slow gear is designed as a spring tensioning device similar to a mechanical watch; the stress generated during the grip tightens the spring.
    Type: Grant
    Filed: November 29, 2022
    Date of Patent: March 4, 2025
    Inventors: Yifei Lu, Feng Lu, Hao Wei, Tong Zhang, Yuanzhe Ge
  • Publication number: 20250070589
    Abstract: Embodiments of the present disclosure provide a voltage stabilizing circuit and a DC microgrid.
    Type: Application
    Filed: December 20, 2023
    Publication date: February 27, 2025
    Applicant: Schneider Electric (China) Co., Ltd.
    Inventors: Feng Lu, Haijun Zhao, Jialu Bai
  • Publication number: 20250060666
    Abstract: An organotin photoresist composition for photolithography patterning is described, wherein organotin photoresist composition comprises a (cyclopentadienyl)tin compound, a solvent, and/or an additive. (Cyclopentadienyl)tin compound comprises cyclopentadienyl, or substituted cyclopentadienyl C5H4R, C5H3R2, C5H2R3, C5HR4, or C5R5 group, wherein R is H, a substituted or unsubstituted alkyl, alkenyl, alkynyl, cycloalkyl, or cycloalkenyl group with 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group with 6-20 carbon atoms, or an amino, cyano, ether, ester, halide, nitro, silyl, thiol, or carbonyl group.
    Type: Application
    Filed: August 2, 2024
    Publication date: February 20, 2025
    Inventor: Feng Lu