Patents by Inventor Fernando Gustavo Tomasel
Fernando Gustavo Tomasel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210202209Abstract: Plasma processing systems and power delivery methods are disclosed. A system may comprise at least one modulating supply that modulates plasma properties where the modulation of the plasma properties has a repetition period, T. Electrical characteristics of an output of the modulating supply are monitored and provided to a controller where the electrical characteristics are analyzed. Characteristics of a waveform with the repetition period T are communicated to at least one piece of equipment connected to plasma processing system to enable synchronization of pieces of equipment connected to the plasma processing system. And in addition, instructions are relayed to the modulating supply and a match network, based on the analyzing of the electrical characteristics, enabling simultaneous tuning of the modulating supply and the match network.Type: ApplicationFiled: February 22, 2021Publication date: July 1, 2021Inventors: Gideon Van Zyl, Thomas Joel Blackburn, Thomas McIntyre, Fernando Gustavo Tomasel
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Patent number: 9536713Abstract: This disclosure describes systems, methods, and apparatus for ensuring desirable ignition of plasma in a plasma processing chamber via providing increased instantaneous power during an ignition period for both continuous wave (CW) and pulsed power delivery. The systems, methods, and apparatus can be applied to both initial ignition of a plasma and reignition of a plasma where pulsed power delivery leads to periodic extinction of the plasma.Type: GrantFiled: February 24, 2014Date of Patent: January 3, 2017Assignee: Advanced Energy Industries, Inc.Inventors: Gideon Van Zyl, David W. Madsen, Fernando Gustavo Tomasel
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Patent number: 9478397Abstract: The present disclosure discusses a power delivery system, and methods of operation, configured to monitor characteristics of a generator, a match network, and a plasma load, via one or more sensors, and control these components via a local controller in order to improve power delivery accuracy and consistency to the plasma load. Control can be based on a unified monitoring of power characteristics in the power delivery system as well as variations between components and even non-electrical characteristics such as plasma density, end point, and spectral components of plasma light emission, to name a few.Type: GrantFiled: June 16, 2015Date of Patent: October 25, 2016Assignee: Advanced Energy Industries, Inc.Inventors: Thomas Joel Blackburn, Thomas McIntyre, Fernando Gustavo Tomasel
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Publication number: 20150279625Abstract: The present disclosure discusses a power delivery system, and methods of operation, configured to monitor characteristics of a generator, a match network, and a plasma load, via one or more sensors, and control these components via a local controller in order to improve power delivery accuracy and consistency to the plasma load. Control can be based on a unified monitoring of power characteristics in the power delivery system as well as variations between components and even non-electrical characteristics such as plasma density, end point, and spectral components of plasma light emission, to name a few.Type: ApplicationFiled: June 16, 2015Publication date: October 1, 2015Inventors: Thomas Joel Blackburn, Thomas McIntyre, Fernando Gustavo Tomasel
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Patent number: 9088267Abstract: The present disclosure discusses a power delivery system, and methods of operation, configured to monitor characteristics of a generator, a match network, and a plasma load, via one or more sensors, and control these components via a local controller in order to improve power delivery accuracy and consistency to the plasma load. Control can be based on a unified monitoring of power characteristics in the power delivery system as well as variations between components and even non-electrical characteristics such as plasma density, end point, and spectral components of plasma light emission, to name a few.Type: GrantFiled: January 4, 2012Date of Patent: July 21, 2015Assignee: Advanced Energy Industries, Inc.Inventors: Thomas Joel Blackburn, Thomas McIntyre, Fernando Gustavo Tomasel
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Publication number: 20140239813Abstract: This disclosure describes systems, methods, and apparatus for ensuring desirable ignition of plasma in a plasma processing chamber via providing increased instantaneous power during an ignition period for both continuous wave (CW) and pulsed power delivery. The systems, methods, and apparatus can be applied to both initial ignition of a plasma and reignition of a plasma where pulsed power delivery leads to periodic extinction of the plasma.Type: ApplicationFiled: February 24, 2014Publication date: August 28, 2014Applicant: Advanced Energy Industries, Inc.Inventors: Gideon Van Zyl, David W. Madsen, Fernando Gustavo Tomasel
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Publication number: 20130002136Abstract: The present disclosure discusses a power delivery system, and methods of operation, configured to monitor characteristics of a generator, a match network, and a plasma load, via one or more sensors, and control these components via a local controller in order to improve power delivery accuracy and consistency to the plasma load. Control can be based on a unified monitoring of power characteristics in the power delivery system as well as variations between components and even non-electrical characteristics such as plasma density, end point, and spectral components of plasma light emission, to name a few.Type: ApplicationFiled: January 4, 2012Publication date: January 3, 2013Applicant: ADVANCED ENERGY INDUSTRIES, INC.Inventors: Thomas Joel Blackburn, Thomas McIntyre, Fernando Gustavo Tomasel
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Patent number: 7942112Abstract: A system and method for preventing formation of a plasma-inhibiting substance within a plasma chamber is provided. In one embodiment, an apparatus that includes a barrier component configured to be disposed within a plasma chamber. The barrier component includes a wall that defines a plasma formation region where a chemically-reducing species is formed from a fluid. A portion of the wall is formed of a substance that is substantially inert to the chemically-reducing species. The wall prevents the chemically-reducing species from interacting with an inner surface of the plasma chamber to form a conductive substance. The barrier component also includes an opening in fluid communication with the plasma formation region. The fluid is introduced into the plasma formation region via the opening.Type: GrantFiled: December 4, 2006Date of Patent: May 17, 2011Assignee: Advanced Energy Industries, Inc.Inventors: Fernando Gustavo Tomasel, Justin Mauck, Andrew Shabalin, Denis Shaw, Juan Jose Gonzalez
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Patent number: 7547005Abstract: A system and method for providing a vapor are described. In one variation, liquid is placed in a containment vessel, and a pressure in the containment vessel is reduced below atmospheric pressure. The pressure in the vessel is monitored and the liquid is heated in response to the sensed pressure falling below a desired level. When needed, the vapor is delivered from the liquid containment vessel to the external system.Type: GrantFiled: February 16, 2006Date of Patent: June 16, 2009Assignee: Advanced Energy Industries, Inc.Inventors: Fernando Gustavo Tomasel, Justin Mauck, Juan Jose Gonzalez
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Patent number: 7468494Abstract: In one aspect of the invention is a gas feed for injecting gas into a plasma-processing chamber that reduces the speed at which the gas interacts with the plasma discharge, so enhancing the stability of the plasma and the production of reaction products. In one embodiment, the gas feed comprises a gas speed reducer having apertures along its wall through which gas is distributed into the plasma chamber at a tangent to the chamber walls. In another embodiment, the gas feed comprises a gas speed reducer, which is made up of one or more channels such that, when traveling through the channels, the input and the output holes of the channels can only be connected by a broken line. In yet another embodiment, the gas speed reducer has a plurality of perforated sheaths, such that holes on one perforated sheath are not aligned with holes on another perforated sheath.Type: GrantFiled: January 31, 2003Date of Patent: December 23, 2008Assignee: Advanced Energy IndustriesInventors: Juan Jose Gonzalez, Andrew Shabalin, Fernando Gustavo Tomasel
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Publication number: 20080127893Abstract: A system and method for preventing formation of a plasma-inhibiting substance within a plasma chamber is provided. In one embodiment, an apparatus that includes a barrier component configured to be disposed within a plasma chamber. The barrier component includes a wall that defines a plasma formation region where a chemically-reducing species is formed from a fluid. A portion of the wall is formed of a substance that is substantially inert to the chemically-reducing species. The wall prevents the chemically-reducing species from interacting with an inner surface of the plasma chamber to form a conductive substance. The barrier component also includes an opening in fluid communication with the plasma formation region. The fluid is introduced into the plasma formation region via the opening.Type: ApplicationFiled: December 4, 2006Publication date: June 5, 2008Inventors: Fernando Gustavo Tomasel, Justin Mauck, Andrew Shabalin, Denis Shaw, Juan Jose Gonzalez
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Patent number: 7245084Abstract: An apparatus includes a vacuum chamber, an electrical transformer that surrounds the vacuum chamber to induce an electromagnetic field within the vacuum chamber, and an ignition circuit. The electrical transformer induces an electromagnetic field within the vacuum chamber. The transformer includes a primary winding and a plasma loop coupled to the vacuum chamber to perform as a secondary winding. The ignition circuit is coupled to an ignition core section of the vacuum chamber to ignite the vacuum chamber.Type: GrantFiled: September 29, 2004Date of Patent: July 17, 2007Assignee: Advanced Energy Industries, Inc.Inventors: Juan Jose Gonzalez, Andrew Shabalin, Steven J. Geissler, Fernando Gustavo Tomasel
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Patent number: 7115185Abstract: The reaction rate of a feed gas flowed into a plasma chamber is controlled. In one embodiment a pulsed power supply repeatedly applies a high power pulse to the plasma chamber to increase the reaction rate of plasma within the chamber, and applies a low power pulse between applications of the high power pulses.Type: GrantFiled: September 16, 2003Date of Patent: October 3, 2006Assignee: Advanced Energy Industries, Inc.Inventors: Juan Jose Gonzalez, Fernando Gustavo Tomasel, Andrew Shabalin
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Patent number: 7005845Abstract: An apparatus is described. The apparatus includes a vacuum chamber and an electrical transformer to induce an electromagnetic field within the vacuum chamber. The transformer includes a primary winding, a secondary winding formed by the plasma loop, and a separate secondary winding implemented to measure the voltage along the plasma loop. The apparatus also includes a current transformer to measure the current flow through the plasma loop.Type: GrantFiled: September 29, 2004Date of Patent: February 28, 2006Assignee: Advanced Energy Industries, Inc.Inventors: Juan Jose Gonzalez, Steven J. Geissler, Fernando Gustavo Tomasel
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Patent number: 6946063Abstract: In one aspect of the invention is a method to construct plasma chambers with improved wall resistance to deterioration. In one embodiment of the invention, a chamber is made of an aluminum alloy having low concentrations of elements that form non-soluble, intermetallic particles to address coating/substrate issues, has swaged-in cooling tubes to reduce thermal stress by improving thermal resistance, and has a plurality of dielectric gaps to decrease ion bombardment.Type: GrantFiled: February 25, 2003Date of Patent: September 20, 2005Assignee: Advanced Energy Industries, Inc.Inventors: Juan Jose Gonzalez, Steve Dillon, Andrew Shabalin, Justin Mauck, Fernando Gustavo Tomasel
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Patent number: 6927358Abstract: In one aspect of the invention is a method to create a vacuum seal with extended lifetime to form a dielectric break in a vacuum chamber. The method includes the use of an elastic dielectric seal to form a high vacuum seal. It also includes the use of different means to protect the vacuum seal from direct exposure to the plasma and to reactive gases present inside the plasma chamber. Furthermore, it includes the use of elements to ensure a proper compression of the elastic seal, and to avoid its expansion or contraction when the pressures on both sides of the seal are different.Type: GrantFiled: January 31, 2003Date of Patent: August 9, 2005Assignee: Advanced Energy Industries, Inc.Inventors: Juan Jose Gonzalez, Steve Dillon, Andrew Shabalin, Fernando Gustavo Tomasel
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Patent number: 6822396Abstract: According to one embodiment, an apparatus is described. An apparatus includes a vacuum chamber, an electrical transformer coupled to the vacuum chamber, and an ignition circuit. The electrical transformer induces an electromagnetic field within the vacuum chamber. The transformer includes a primary winding and a magnetic core. In addition, the transformer includes a secondary winding, to which the circuit used to ignite the vacuum chamber is coupled. The ignition circuit is used to establish a controlled capacitive discharge that is used to ignite the vacuum chamber.Type: GrantFiled: January 31, 2003Date of Patent: November 23, 2004Assignee: Advanced Energy Industries, Inc.Inventors: Juan Jose Gonzalez, Andrew Shabalin, Steven J. Geissler, Fernando Gustavo Tomasel
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Patent number: 6819096Abstract: According to one embodiment, an apparatus is described. The apparatus includes a vacuum chamber and an electrical transformer to induce an electromagnetic field within the vacuum chamber. The transformer includes a primary winding, a secondary winding formed by the plasma loop, and a separate secondary winding implemented to measure the voltage along the plasma loop. The apparatus also includes a current transformer to measure the current flow through the plasma loop.Type: GrantFiled: January 31, 2003Date of Patent: November 16, 2004Assignee: Advanced Energy Industries, Inc.Inventors: Juan Jose Gonzalez, Steven J. Geissler, Fernando Gustavo Tomasel
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Publication number: 20040160190Abstract: According to one embodiment, an apparatus is described. The apparatus includes a vacuum chamber, an electrical transformer coupled to the vacuum chamber, and an ignition circuit. The electrical transformer induces an electromagnetic field within the vacuum chamber. The transformer includes a primary winding and a magnetic core. In addition, the transformer includes a secondary winding, to which the circuit used to ignite the vacuum chamber is coupled. The ignition circuit is used to establish a controlled capacitive discharge that is used to ignite the vacuum chamber.Type: ApplicationFiled: January 31, 2003Publication date: August 19, 2004Inventors: Juan Jose Gonzalez, Andrew Shabalin, Steven J. Geissler, Fernando Gustavo Tomasel
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Publication number: 20040149701Abstract: In one aspect of the invention is a gas feed for injecting gas into a plasma-processing chamber that reduces the speed at which the gas interacts with the plasma discharge, so enhancing the stability of the plasma and the production of reaction products. In one embodiment, the gas feed comprises a gas speed reducer having apertures along its wall through which gas is distributed into the plasma chamber at a tangent to the chamber walls. In another embodiment, the gas feed comprises a gas speed reducer, which is made up of one or more channels such that, when traveling through the channels, the input and the output holes of the channels can only be connected by a broken line. In yet another embodiment, the gas speed reducer has a plurality of perforated sheaths, such that holes on one perforated sheath are not aligned with holes on another perforated sheath.Type: ApplicationFiled: January 31, 2003Publication date: August 5, 2004Inventors: Juan Jose Gonzalez, Andrew Shabalin, Fernando Gustavo Tomasel