Patents by Inventor Frank Melzer
Frank Melzer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180259984Abstract: A system for supplying a regulatable inflow fitting, a vehicle with such a system, and a method for filling such a system. The system for supplying the regulatable inflow fitting with temperature-controlled water includes a cold water feed, a water heater, a bypass line and a mixing valve. At an input side, the water heater is connected to the cold water feed. At an output side, the water heater is connected to a hot water inlet of the mixing valve. The bypass line directly connects the cold water feed to a cold water inlet of the mixing valve. The mixing valve is connected at the output side to the inflow fitting and is configured to provide temperature-controlled water depending on a valve position. A flow element is integrated in the bypass line that at least temporarily at least limits a flow rate through the bypass line.Type: ApplicationFiled: August 3, 2017Publication date: September 13, 2018Inventors: Thomas KEMKOWSKI, Frank MELZER
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Patent number: 9383544Abstract: An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component.Type: GrantFiled: August 21, 2012Date of Patent: July 5, 2016Assignee: Carl Zeiss SMT GmbHInventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
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Patent number: 8454230Abstract: The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.Type: GrantFiled: February 16, 2010Date of Patent: June 4, 2013Assignee: Carl Zeiss SMT GmbHInventors: Frank Melzer, Axel Scholz
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Publication number: 20120327385Abstract: Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.Type: ApplicationFiled: August 21, 2012Publication date: December 27, 2012Applicant: CARL ZEISS SMT GMBHInventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
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Patent number: 8269947Abstract: An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component.Type: GrantFiled: February 17, 2009Date of Patent: September 18, 2012Assignee: Carl Zeiss SMT GmbHInventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
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Patent number: 7871171Abstract: A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1?) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1?) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.Type: GrantFiled: July 15, 2008Date of Patent: January 18, 2011Assignee: Carl Zeiss SMT AGInventors: Martin Antoni, Frank Melzer, Andreas Seifert, Wolfgang Singer
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Patent number: 7580207Abstract: An optical apparatus comprises an optical component having at least one optical surface and a first optical axis, a socket in which said optical component is mounted, first manipulators arranged to exert forces approximately parallel to the optical axis of the optical component for varying stresses in the optical component, the forces having a strength such that stress birefringence is induced in the component.Type: GrantFiled: May 12, 2006Date of Patent: August 25, 2009Assignee: Carl Zeiss SMT AGInventor: Frank Melzer
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Publication number: 20090207396Abstract: An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component.Type: ApplicationFiled: February 17, 2009Publication date: August 20, 2009Applicant: CARL ZEISS SMT AGInventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
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Publication number: 20090135395Abstract: An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component.Type: ApplicationFiled: December 17, 2008Publication date: May 28, 2009Applicant: CARL ZEISS SMT AGInventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
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Publication number: 20090002670Abstract: The invention relates to an apparatus for the manipulation and/or adjustment of an optical element with respect to a structure, the optical element being connected to the structure by means of a number of setting members, and the setting members having as active adjusting elements screw elements or piezoceramic elements, which in each case produce an active force along one degree of freedom and by means of which the optical element is connected to the structure in such a way that it can be set in up to six degrees of freedom.Type: ApplicationFiled: July 30, 2008Publication date: January 1, 2009Applicant: CARL ZEISS SMT AGInventors: Frank Melzer, Markus Weiss, Guenther Dengel, Volker Stein
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Publication number: 20080297755Abstract: A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1?) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1?) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.Type: ApplicationFiled: July 15, 2008Publication date: December 4, 2008Applicant: Carl Zeiss SMT AGInventors: Martin Antoni, Frank Melzer, Andreas Seifert, Wolfgang Singer
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Patent number: 7460212Abstract: There is provided a collector. The collector includes a first mirror shell positioned inside a second mirror shell that has a chamfered end.Type: GrantFiled: July 3, 2007Date of Patent: December 2, 2008Assignee: Carl-Zeiss SMT AGInventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek, Frank Melzer, Johannes Wangler
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Patent number: 7410265Abstract: A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1?) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1?) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.Type: GrantFiled: September 30, 2003Date of Patent: August 12, 2008Assignee: Carl Zeiss Smt AgInventors: Martin Antoni, Frank Melzer, Andreas Seifert, Wolfgang Singer, Wilhelm Egle, Bernhard Gellrich, Bernhard Geuppert
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Patent number: 7354168Abstract: A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).Type: GrantFiled: May 18, 2004Date of Patent: April 8, 2008Assignee: Carl Zeiss SMT AGInventors: Hubert Holderer, Andreas Heisler, Wolfgang Singer, Markus Weiss, Andreas Seifert, Frank Melzer, Heinz Mann, Jurgen Faltus, Berndt Warm, Stefan Dornheim
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Publication number: 20080042079Abstract: There is provided a system that includes a first optical sub-system contained in a first space, and a second optical sub-system contained in a second space. The first and said second spaces are separated by a structure selected from the group consisting of a diaphragm and a valve.Type: ApplicationFiled: October 16, 2007Publication date: February 21, 2008Applicant: Carl Zeiss SMTInventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler, Frank Melzer, Bernhard Gellrich, Bernhard Geuppert, Erich Schubert, Martin Antoni
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Patent number: 7321126Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ?193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.Type: GrantFiled: May 2, 2006Date of Patent: January 22, 2008Assignee: Carl Zeiss SMT AGInventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler, Frank Melzer, Bernhard Gellrich, Bernhard Geuppert, Erich Schubert, Martin Antoni
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Publication number: 20080013680Abstract: There is provided a collector. The collector includes a first mirror shell positioned inside a second mirror shell that has a chamfered end.Type: ApplicationFiled: July 3, 2007Publication date: January 17, 2008Applicant: Carl Zeiss SMT AGInventors: Wolfgang Singer, Wilhelm Egle, Markus Wiess, Joachim Hainz, Jochen Wietzorrek, Frank Melzer, Johannes Wangler
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Patent number: 7244954Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.Type: GrantFiled: October 4, 2005Date of Patent: July 17, 2007Assignee: Carl Zeiss SMT AGInventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek, Frank Melzer, Johannes Wangler
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Patent number: 7196841Abstract: A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ?193 nm is provided with a light source, an object plane, an exit pupil, a first optical element having first screen elements for producing light channels, and with a second optical element having second screen elements. A screen element of the second optical element is assigned to each light channel that is formed by one of the first screen elements of the first optical element. The screen elements of the first optical element and of the second optical element can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source up to the object plane. The angles of the first screen elements of the first optical element can be adjusted in order to modify a tilt.Type: GrantFiled: April 8, 2003Date of Patent: March 27, 2007Assignee: Carl Zeiss SMT AGInventors: Frank Melzer, Wolfgang Singer
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Publication number: 20070019310Abstract: In a method for producing mirror facets (1) for facet mirrors in illuminating devices or projection exposure machines in microlithography by using radiation in the extreme ultraviolet range, individual tilting angles are recessed into an optical surface (2) of the mirror facet (1), preferably a surface with tilting angles relative to a reference surface of the mirror facet (1) is machined into or on said optical surface.Type: ApplicationFiled: July 8, 2004Publication date: January 25, 2007Applicant: CARL-ZEISS SMT AGInventors: Andreas Seifert, Frank Melzer, Andreas Heisler, Heinz Mann, Gerhard Romeyn