Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength 193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Abstract: An optical apparatus comprises an optical component having at least one optical surface and a first optical axis, a socket in which said optical component is mounted, first manipulators arranged to exert forces approximately parallel to the optical axis of the optical component for varying stresses in the optical component, the forces having a strength such that stress birefringence is induced in the component.

Abstract: The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.

Abstract: In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.

Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ?193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract: In a method of connecting a multiplicity of optical elements (9) to a basic body (8), in particular for producing a faceted mirror (1), for example for beam mixing and field imaging for an EUV lighting system, the individual optical elements (9) are positioned on the basic body (8, 14) and subsequently connected to one another by an galvanoplastic process. Alternatively, the multiplicity of optical elements are aligned on an auxiliary structure (11) and the optical elements (9) are subsequently made to grow up galvanoplastically on their rear sides, forming a supporting structure (14) as the basic body.

Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract: A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ?193 nm is provided with a light source, an object plane, an exit pupil, a first optical element having first screen elements for producing light channels, and with a second optical element having second screen elements. A screen element of the second optical element is assigned to each light channel that is formed by one of the first screen elements of the first optical element. The screen elements of the first optical element and of the second optical element can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source up to the object plane. The angles of the first screen elements of the first optical element can be adjusted in order to modify a tilt.

Abstract: In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (5), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (9), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.

Abstract: Facet mirror having a number of mirror facets A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).

Abstract: In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.

Abstract: In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.

Abstract: There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.

Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Abstract: A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1′) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1′) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.

Abstract: There is provided a collector for illumination systems for light having a wavelength ≦193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract: The invention relates to a pump (10), having a pump head (12), which has a pump chamber (11), and having an electric motor (14), which drives the pump head (12) and has a stator (40) and a rotor (38), the rotor (38) being connected to the pump head (12) and being disposed in a rotor chamber (82) open toward the pump chamber (11).

Abstract: In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.

Abstract: A focusing-device for the radiation from a light source, in particular a laser plasma source, has a collector mirror which collects the light from the light source at a second focus in virtual or real terms, in particular for micro-lithography using EUV radiation, and a routing unit and downstream beam formation in an illuminating system. The collector mirror can be displaced in the z-direction (optical axis) and is designed and/or mounted in such a way that the position of the second focus remains unchanged in the event of temperature changes.