Patents by Inventor Frank Staals
Frank Staals has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9329500Abstract: The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.Type: GrantFiled: April 29, 2008Date of Patent: May 3, 2016Assignee: ASML Netherlands B.V.Inventors: Frank Staals, Joeri Lof, Erik Roelof Loopstra, Wim Tjibbo Tel, Bearrach Moest
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Publication number: 20160109812Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: ApplicationFiled: December 10, 2015Publication date: April 21, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Joost Jeroen OTTENS, Emiel Jozef Melanie EUSSEN, Johannes Henricus Wilhelmus JACOBS, William Peter VAN DRENT, Frank STAALS, Lukasz Jerzy MACHT, Erik Willem BOGAART
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Patent number: 9280064Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.Type: GrantFiled: November 26, 2012Date of Patent: March 8, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Peter David Engblom, Carsten Andreas Köhler, Frank Staals, Laurentius Cornelius De Winter
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Patent number: 9229340Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: GrantFiled: September 25, 2013Date of Patent: January 5, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Joost Jeroen Ottens, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, William Peter Van Drent, Frank Staals, Lukasz Jerzy Macht, Erik Willem Bogaart
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Patent number: 9134631Abstract: In a lithographic apparatus, a control system is provided to automatically reduce throughput in the event that lens-heating aberrations exceed a certain threshold. The determination of whether lens-heating aberrations will exceed the threshold may be based upon a prediction, e.g. using a lens-heating model, or on measurements taken from a previously exposed substrate. Reduction of throughput of the device manufacture may be effected by reducing beam power or the duty cycle of the apparatus. In a particular embodiment, the time taken for substrate movement between exposure portions is increased.Type: GrantFiled: March 19, 2009Date of Patent: September 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Jan-Jaap Kuit, Frank Staals, Alexander Hendrikus Martinus Van Der Hoff
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Patent number: 8975599Abstract: The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.Type: GrantFiled: May 3, 2007Date of Patent: March 10, 2015Assignee: ASML Netherlands B.V.Inventors: Frank Staals, Joeri Lof, Erik Roelof Loopstra, Wim Tjibbo Tel, Bearrach Moest
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Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
Patent number: 8947632Abstract: A lithographic apparatus includes a patterning subsystem for transferring a pattern from a patterning device onto a substrate controlled in accordance with recorded measurements of level variations across a surface of the substrate. A level sensor is provided for projecting a level sensing beam of radiation to reflect from a location on the substrate surface and for detecting the reflected sensing beam to record the surface level at said location. The level sensor incorporates at least one moving optical element to scan the substrate surface by optical movement in at least one dimension to obtain measurements of surface level at different locations without mechanical movement between the level sensor and the substrate. Optical path length equalization measures may be employed, using shaped reflectors and/or additional moving mirrors, to avoid focus variation during the scan.Type: GrantFiled: December 15, 2010Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Frank Staals, Marcus Adrianus Van De Kerkhof -
Patent number: 8717540Abstract: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.Type: GrantFiled: February 2, 2011Date of Patent: May 6, 2014Assignee: ASML Netherlands B.V.Inventors: Carsten Andreas Köhler, Hans Van Der Laan, Frank Staals, Laurentius Cornelius De Winter, Herman Philip Godfried
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Publication number: 20140022527Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: ApplicationFiled: September 25, 2013Publication date: January 23, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Joost Jeroen Ottens, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, William Peter Van Drent, Frank Staals, Lukasz Jerzy Macht, Erik Willem Bogaart
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Patent number: 8582082Abstract: A lithographic apparatus includes a level sensor for use in positioning a target portion of the substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually.Type: GrantFiled: March 6, 2009Date of Patent: November 12, 2013Assignee: ASML Netherlands B.V.Inventors: Frank Staals, Paulus Antonius Andreas Teunissen, Ronald Albert John Van Doorn
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Patent number: 8570492Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: GrantFiled: March 7, 2012Date of Patent: October 29, 2013Assignee: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Frank Staals, Lukasz Jerzy Macht, William Peter Van Drent, Erik Willem Bogaart
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Patent number: 8554510Abstract: Movements of a lithographic apparatus include dynamic positioning errors on one or more axes which cause corresponding errors which can be measured in the applied pattern. A test method includes operating the apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes. Variations in the error in the applied pattern are measured for different frequencies and amplitudes of the injected error across a frequency band of interest for a given axis or axes. Calculation using said measurements and knowledge of the frequencies injected allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency.Type: GrantFiled: December 15, 2010Date of Patent: October 8, 2013Assignee: ASML Netherlands B.V.Inventors: Frank Staals, Hans Van Der Laan, Hans Butler, Gerardus Carolus Johannus Hofmans, Sven Gunnar Krister Magnusson
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Patent number: 8488107Abstract: The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.Type: GrantFiled: July 8, 2011Date of Patent: July 16, 2013Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Frank Staals, Lukasz Jerzy Macht
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Publication number: 20130141706Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.Type: ApplicationFiled: November 26, 2012Publication date: June 6, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Peter David ENGBLOM, Carsten Andreas KÖHLER, Frank STAALS, Laurentius Cornelius DE WINTER
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Publication number: 20120242969Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: ApplicationFiled: March 7, 2012Publication date: September 27, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Frank Staals, Lukasz Jerzy Macht, William Peter Van Drent, Erik Willem Bogaart
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Patent number: 8208122Abstract: A method of measuring a lithographic projection apparatus is described. The method includes imaging a verification mark of a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark includes at least a first, a second and a third verification structure that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting.Type: GrantFiled: April 14, 2009Date of Patent: June 26, 2012Assignee: ASML Netherlands B.V.Inventors: Frank Staals, Gerardus Carolus Johannus Hofmans, Hans Van Der Laan, Sven Gunnar Krister Magnusson
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Patent number: 8208118Abstract: Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.Type: GrantFiled: February 6, 2009Date of Patent: June 26, 2012Assignee: ASML Netherlands B.V.Inventors: David Warren Burry, Ralph Brinkhof, Frank Staals, Robert Franken, Erik Johan Koop
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Patent number: 8174678Abstract: A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, and a projection system to project the patterned radiation beam in a scanning exposure along a scanning direction onto a target portion of the substrate. The illumination system is configured to form in a plane of the patterning device a slit shaped image. The slit shaped image has a curved shape with a slit curvature in the scanning direction, with a length in the scanning direction and a width perpendicular to the scanning direction. The slit shaped image is configured to create a curved pattern image portion of the patterned radiation beam in an image plane of the projection system.Type: GrantFiled: December 5, 2008Date of Patent: May 8, 2012Assignee: ASML Netherlands B.V.Inventors: Sven Gunnar Krister Magnusson, Martin Jules Marie-Emile De Nivelle, Frank Staals, Wim Tjibbo Tel
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Publication number: 20120013879Abstract: The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.Type: ApplicationFiled: July 8, 2011Publication date: January 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Arie Jeffrey Den Boef, Frank Staals, Lukasz Jerzy Macht
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Publication number: 20110200922Abstract: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.Type: ApplicationFiled: February 2, 2011Publication date: August 18, 2011Applicant: ASML Netherlands B.V.Inventors: Carsten Andreas Köhler, Hans Van Der Laan, Frank Staals, Laurentius Cornelius De Winter, Herman Philip Godfried