Patents by Inventor Friedrich Kroener

Friedrich Kroener has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9389200
    Abstract: A sensor device according to an embodiment includes a semiconductor substrate including a plurality of channels, the channels connecting a cavity and a measurement electrode, and a counter electrode arranged to be in contact with the cavity, wherein the cavity, the measurement electrode and the counter electrode are arranged to accommodate a drop of a liquid and to allow a voltage to be applied to the drop of liquid.
    Type: Grant
    Filed: November 9, 2012
    Date of Patent: July 12, 2016
    Assignee: Infineon Technologies AG
    Inventor: Friedrich Kroener
  • Patent number: 9337311
    Abstract: An electronic component includes a semiconductor substrate defined by a generally planar first face, a generally planar second face and side faces extending between the generally planar second face and the generally planar first face. The semiconductor substrate has a curved contour between the generally planar second face and the side faces.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: May 10, 2016
    Assignee: Infineon Technologies AG
    Inventor: Friedrich Kroener
  • Publication number: 20160087418
    Abstract: A device and a method for temporarily closing a switch are disclosed. In an embodiment the device includes a first switch configured to be coupled to a load and a control circuit configured to temporarily close the first switch in response to a detection of a failure event in the first switch.
    Type: Application
    Filed: September 19, 2014
    Publication date: March 24, 2016
    Inventors: Harald Christian Koffler, Friedrich Kroener
  • Patent number: 9293330
    Abstract: A method for producing a semiconductor is disclosed, the method having: providing a semiconductor body having a first side and a second side; forming an n-doped zone in the semiconductor body by a first implantation into the semiconductor body via the first side to a first depth location of the semiconductor body; and forming a p-doped zone in the semiconductor body by a second implantation into the semiconductor body via the second side to a second depth location of the semiconductor body, a pn-junction forming between said n-doped zone and said p-doped zone in the semiconductor body.
    Type: Grant
    Filed: August 28, 2013
    Date of Patent: March 22, 2016
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Hans-Joachim Schulze, Ingo Muri, Friedrich Kroener, Werner Schustereder
  • Publication number: 20160071814
    Abstract: A preform structure for soldering a semiconductor chip arrangement includes a carbon fiber composite sheet and a solder layer formed over the carbon fiber composite sheet.
    Type: Application
    Filed: September 5, 2014
    Publication date: March 10, 2016
    Inventor: Friedrich Kroener
  • Publication number: 20160060144
    Abstract: A method of removing particulate silicon from an effluent water in accordance with various embodiments may include: adding a base to the effluent water, an amount of the added base being sub-stoichiometric with regard to a basic oxidation reaction of an entire amount of silicon contained in the effluent water to ortho-silicic acid or ortho-silicate ions; maintaining a resulting mixture of the effluent water and the base in a predetermined temperature range for a period of time, so that a sediment including silicon is formed; and separating the sediment and the effluent water from each other.
    Type: Application
    Filed: August 28, 2014
    Publication date: March 3, 2016
    Inventors: Friedrich KROENER, Zeljka KROENER
  • Publication number: 20160061967
    Abstract: In various embodiments, a gamma ray detector is provided. The gamma ray detector may include a converter element, configured to release an electron when a gamma ray moves at least partially through the converter element. The gamma ray detector may further include a semiconductor detector, arranged to receive the electron and configured to produce a signal when the electron moves at least partially through the semiconductor detector; and an amplifier circuit, coupled to the semiconductor detector and configured to amplify the signal produced by the semiconductor detector. In the gamma ray detector, the converter element may be arranged to at least partially shield the amplifier circuit from electromagnetic radiation.
    Type: Application
    Filed: August 28, 2014
    Publication date: March 3, 2016
    Inventors: Friedrich Kroener, Johannes Hacker
  • Publication number: 20160053397
    Abstract: A method of forming a composite material is provided. The method may include: arranging a suspension in physical contact with a carrier, wherein the suspension may comprise an electrolyte and a plurality of particles of a first component of the composite material; causing the particles of the first component of the composite material to sediment on the carrier, wherein a plurality of spaces may be formed between the sedimented particles; and forming by electroplating a second component of the composite material from the electrolyte in at least a fraction of the plurality of spaces.
    Type: Application
    Filed: August 25, 2014
    Publication date: February 25, 2016
    Inventors: Friedrich Kroener, Ingo Muri
  • Patent number: 9245684
    Abstract: A method for manufacturing a transformer device includes providing a glass substrate having a first side and a second side arranged opposite the first side, forming a first recess in the glass substrate at the first side of the glass substrate, forming a second recess in the glass substrate at the second side of the glass substrate opposite to the first recess, forming a first coil in the first recess, and forming a second coil in the second recess.
    Type: Grant
    Filed: August 21, 2013
    Date of Patent: January 26, 2016
    Assignee: Infineon Technologies Austria AG
    Inventors: Friedrich Kroener, Carsten von Koblinski
  • Publication number: 20150197869
    Abstract: A method for fabricating a heat sink according to an embodiment may include: providing a carbon fiber fabric having a plurality of carbon fibers and a plurality of openings, the openings leading from a first side of the fabric to a second side of the carbon fiber fabric; and electroplating the carbon fiber fabric with metal, wherein metal is deposited with a higher rate at the first side than at the second side of the carbon fiber fabric.
    Type: Application
    Filed: March 25, 2015
    Publication date: July 16, 2015
    Inventor: Friedrich Kroener
  • Patent number: 9017539
    Abstract: A method for fabricating a heat sink may include: providing a carbon fiber fabric having carbon fibers and openings, the openings leading from a first side to a second side of the fabric; and electroplating the fabric with metal, wherein metal is deposited with a higher rate at the first side than at the second side of the fabric. Another method for fabricating a heat sink may include: providing a carbon metal composite having metal-coated carbon fibers and openings, the openings leading from a first side to a second side of the carbon metal composite; disposing the composite over a semiconductor element such that the first side of the composite faces the semiconductor element; and bonding the composite to the semiconductor element by means of an electroplating process, wherein metal electrolyte is supplied to an interface between the carbon metal composite and the semiconductor element via the openings.
    Type: Grant
    Filed: August 22, 2012
    Date of Patent: April 28, 2015
    Assignee: Infineon Technologies AG
    Inventor: Friedrich Kroener
  • Publication number: 20150068918
    Abstract: A wafer contacting device may include: a receiving region configured to receive a wafer; and an elastically deformable carrier disposed in the receiving region and including an electrically conductive surface region.
    Type: Application
    Filed: September 11, 2013
    Publication date: March 12, 2015
    Applicant: Infineon Technologies AG
    Inventors: Friedrich Kroener, Ingo Muri
  • Patent number: 8922016
    Abstract: A method for producing a composite material, associated composite material and associated semiconductor circuit arrangements is disclosed. A plurality of first electrically conducting material particles are applied to a carrier substrate and a second electrically conducting material is galvanically deposited on a surface of the first material particles in such a way that the second material mechanically and electrically bonds the plurality of first material particles to one another.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: December 30, 2014
    Assignee: Infineon Technologies AG
    Inventors: Oliver Hellmund, Daniel Kraft, Friedrich Kroener, Francisco Javier Santos Rodriguez, Carsten Von Koblinski
  • Publication number: 20140206163
    Abstract: An electronic component includes a semiconductor substrate defined by a generally planar first face, a generally planar second face and side faces extending between the generally planar second face and the generally planar first face. The semiconductor substrate has a curved contour between the generally planar second face and the side faces.
    Type: Application
    Filed: March 26, 2014
    Publication date: July 24, 2014
    Applicant: Infineon Technologies AG
    Inventor: Friedrich Kroener
  • Publication number: 20140131224
    Abstract: A sensor device according to an embodiment includes a semiconductor substrate including a plurality of channels, the channels connecting a cavity and a measurement electrode, and a counter electrode arranged to be in contact with the cavity, wherein the cavity, the measurement electrode and the counter electrode are arranged to accommodate a drop of a liquid and to allow a voltage to be applied to the drop of liquid.
    Type: Application
    Filed: November 9, 2012
    Publication date: May 15, 2014
    Applicant: Infineon Technologies AG
    Inventor: Friedrich Kroener
  • Patent number: 8710665
    Abstract: An electronic component includes a semiconductor substrate defined by a generally planar first face, a generally planar second face and side faces extending between the generally planar second face and the generally planar first face. The semiconductor substrate has a curved contour between the generally planar second face and the side faces.
    Type: Grant
    Filed: October 6, 2008
    Date of Patent: April 29, 2014
    Assignee: Infineon Technologies AG
    Inventor: Friedrich Kroener
  • Publication number: 20140054020
    Abstract: A method for fabricating a heat sink may include: providing a carbon fiber fabric having carbon fibers and openings, the openings leading from a first side to a second side of the fabric; and electroplating the fabric with metal, wherein metal is deposited with a higher rate at the first side than at the second side of the fabric. Another method for fabricating a heat sink may include: providing a carbon metal composite having metal-coated carbon fibers and openings, the openings leading from a first side to a second side of the carbon metal composite; disposing the composite over a semiconductor element such that the first side of the composite faces the semiconductor element; and bonding the composite to the semiconductor element by means of an electroplating process, wherein metal electrolyte is supplied to an interface between the carbon metal composite and the semiconductor element via the openings.
    Type: Application
    Filed: August 22, 2012
    Publication date: February 27, 2014
    Applicant: INFINEON TECHNOLOGIES AG
    Inventor: Friedrich Kroener
  • Publication number: 20140057127
    Abstract: A method for processing at least one carbon fiber according to an embodiment may include: electroplating a metal layer over at least one carbon fiber, wherein the metal layer contains a metal, which forms a common phase with carbon and a common phase with copper; and annealing the at least one carbon fiber and the metal layer. A method for processing at least one carbon fiber according to another embodiment may include: electroplating a first metal layer over at least one carbon fiber, wherein the first metal layer contains a metal, which forms a common phase with carbon and a common phase with nickel; electroplating a second metal layer over the first metal layer, wherein the second metal layer contains nickel; and annealing the at least one carbon fiber, the first metal layer and the second metal layer.
    Type: Application
    Filed: August 22, 2012
    Publication date: February 27, 2014
    Applicant: INFINEON TECHNOLOGIES AG
    Inventor: Friedrich Kroener
  • Publication number: 20130333203
    Abstract: A method for manufacturing a transformer device includes providing a glass substrate having a first side and a second side arranged opposite the first side, forming a first recess in the glass substrate at the first side of the glass substrate, forming a second recess in the glass substrate at the second side of the glass substrate opposite to the first recess, forming a first coil in the first recess, and forming a second coil in the second recess.
    Type: Application
    Filed: August 21, 2013
    Publication date: December 19, 2013
    Applicant: Infineon Technologies Austria AG
    Inventors: Friedrich Kroener, Carsten von Koblinski
  • Patent number: 8610257
    Abstract: A semiconductor device and method for producing such a device is disclosed. One embodiment provides a semiconductor functional wafer having a first and second main surface. Component production processes are performed for producing a component functional region at the first main surface, wherein the component production processes produce an end state that is stable up to at least a first temperature. A carrier substrate is fitted to the first main surface. Access openings are produced to the first main surface. At least one further component production process is performed for producing patterned component functional regions at the first main surface of the functional wafer in the access openings. The end state produced in this process is stable up to a second temperature, which is less than the first temperature.
    Type: Grant
    Filed: October 10, 2011
    Date of Patent: December 17, 2013
    Assignee: Infineon Technologies AG
    Inventors: Friedrich Kroener, Francisco Javier Santos Rodriguez, Carsten von Koblinski