Abstract: A quantum bit array is disclosed. In an embodiment, the quantum bit array includes a control gate coupled to a qubit and at least one pass gate coupled between the qubit and an adjacent qubit to control operation of the qubit of the quantum bit array, a bit line, and a first transistor channel that connects the bit line to the control gate. The array further comprises at least one word line coupled to the first transistor channel. The at least one word line selectively controls charge flow through the first transistor channel. The array further comprises a capacitor coupled to selectively store charge in the first transistor channel.

Abstract: A three dimensional double-density memory array is disclosed. In an embodiment, a three-dimensional (3D) double density array comprises a string of memory devices that are configured so that a first portion of the memory devices form a first channel and a second portion of the memory devices form a second channel. The array also comprises a plurality of word lines coupled to the string of memory devices. Each word line is coupled to a memory device that forms the first channel and a memory device that forms the second channel. The array also comprises at least one drain select gate that couples the first and second channels to a bit line.

Abstract: Methods and apparatus for NAND flash memory are disclosed. In an embodiment, a method is provided for programming a NAND flash memory includes setting programming conditions on word lines to set up programming of multiple memory cells associated with multiple bit lines, and sequentially enabling bit line select gates to load data from a page buffer to the multiple bit lines of the memory. After each bit line is loaded with selected data, an associated bit line select gate is disabled so that the selected data is maintained on the bit line using bit line capacitance. The method also includes waiting for a programming interval to complete after all the bit lines are loaded with data to program the multiple memory cells associated with the multiple bit lines. At least a portion of the multiple memory cells are programmed simultaneously.

Abstract: Methods and apparatus for NAND flash memory are disclosed. In an embodiment, a method is provided for programming a NAND flash memory. The method includes precharging selected bit lines of selected memory cells with a bias voltage level while unselected bit lines maintain the inhibit voltage, applying a verify voltage to a selected word line that is coupled to the selected memory cells, and discharging the selected bit lines that are coupled to on-cells over a first time interval. The method also includes sensing a sensed voltage level on a selected bit line, loading the selected bit line with the inhibit voltage level when the sensed voltage level is above a threshold level and a program voltage when the sensed voltage level is equal to or below the threshold level, and repeating the operations of sensing and loading for each of the selected bit lines.

Abstract: Three-dimensional vertical memory array cell structures and processes. In an exemplary embodiment, a 3D vertical memory array structure is formed by performing operations that include forming an array stack having alternating metal layers and insulator layers, forming a hole through the array stack to expose internal surfaces of the metal layers and internal surfaces of the insulator layers, and performing a metal-oxidation process on the internal surfaces of the metal layers to form selector devices on the internal surfaces of the metal layers. The operations also include depositing one of resistive material or phase-change material within the hole on the selector devices and the internal surfaces of the insulator layers, such that the hole is reduced to a smaller hole, and depositing conductor material in the smaller hole.

Abstract: Methods and apparatus for reading NAND flash memory are disclosed. In an embodiment, a method is provided for reading a NAND flash memory that includes strings of memory cells that are coupled to bit lines and word lines. The method includes precharging a plurality of bit lines to a precharge voltage level, and applying a sequence of word line voltages to a selected word line. The method also includes initiating discharge of one or more bit lines associated with one or more cells, respectively. The method also includes controlling discharging current of discharging bit lines to achieve identical discharge rates, waiting for a discharging time period for each bit line that is discharging, and latching bit line data at an end of each discharge time period.

Abstract: Three-dimensional vertical memory array cell structures and processes. In an exemplary embodiment, a 3D vertical memory array structure is formed by performing operations that include forming an array stack having alternating metal layers and insulator layers, forming a hole through the array stack to expose internal surfaces of the metal layers and internal surfaces of the insulator layers, and performing a metal-oxidation process on the internal surfaces of the metal layers to form selector devices on the internal surfaces of the metal layers. The operations also include depositing one of resistive material or phase-change material within the hole on the selector devices and the internal surfaces of the insulator layers, such that the hole is reduced to a smaller hole, and depositing conductor material in the smaller hole.

Abstract: Three-dimensional vertical memory array cell structures and processes. In an exemplary embodiment, a cell structure includes a word line, a selector layer, and a memory layer. The word line, the selector layer, and the memory layer form a vertical cell structure in which at least one of the selector layer and the memory layer are segmented to form a segment that blocks sneak path leakage current on the word line.

Abstract: A CMOS anti-fuse cell is disclosed. In one aspect, an apparatus includes an N? well and an anti-fuse cell formed on the N? well. The anti-fuse cell includes a drain P+ diffusion deposited in the N? well, a source P+ diffusion deposited in the N? well, and an oxide layer deposited on the N? well and having an overlapping region that overlaps the drain P+ diffusion. A control gate is deposited on the oxide layer. A data bit of the anti-fuse cell is programmed when a voltage difference between the control gate and the drain P+ diffusion exceeds a voltage threshold of the oxide layer and forms a leakage path from the control gate to the drain P+ diffusion. The leakage path is confined to occur in the overlapping region.

Abstract: Methods and apparatus for NAND flash memory are disclosed. In an embodiment, a method is provided for programming a NAND flash memory. The method includes precharging selected bit lines of selected memory cells with a bias voltage level while unselected bit lines maintain the inhibit voltage, applying a verify voltage to a selected word line that is coupled to the selected memory cells, and discharging the selected bit lines that are coupled to on-cells over a first time interval. The method also includes sensing a sensed voltage level on a selected bit line, loading the selected bit line with the inhibit voltage level when the sensed voltage level is above a threshold level and a program voltage when the sensed voltage level is equal to or below the threshold level, and repeating the operations of sensing and loading for each of the selected bit lines.

Abstract: Methods and apparatus for writing nonvolatile 3D NAND flash memory using multiple-page programming. A method is provided for multiple-page programming of an array having a block that includes page groups and each page group includes cell strings that form pages. The method includes deactivating drain select gates (DSGs) and source select gates (SSG), applying a programming voltage to a selected word line, and applying a middle high voltage to unselected word lines. The method also includes repeating multiple programming operations while maintaining the word line voltage levels from a first programming operation to a last programming operation. Each programming operation includes loading data onto bit lines and pulsing a drain select gate associated with a selected page group to load the data into a selected page of the selected page group.

Abstract: Methods and apparatus for NAND flash memory are disclosed. In an embodiment, a method is provided for programming a NAND flash memory includes setting programming conditions on word lines to set up programming of multiple memory cells associated with multiple bit lines, and sequentially enabling bit line select gates to load data from a page buffer to the multiple bit lines of the memory. After each bit line is loaded with selected data, an associated bit line select gate is disabled so that the selected data is maintained on the bit line using bit line capacitance. The method also includes waiting for a programming interval to complete after all the bit lines are loaded with data to program the multiple memory cells associated with the multiple bit lines. At least a portion of the multiple memory cells are programmed simultaneously.

Abstract: Three-dimensional vertical memory array cell structures and processes. In an exemplary embodiment, a cell structure includes a word line, a selector layer, and a memory layer. The word line, the selector layer, and the memory layer form a vertical cell structure in which at least one of the selector layer and the memory layer are segmented to form a segment that blocks sneak path leakage current on the word line.

Abstract: Methods and apparatus for a three-dimensional (3D) array having aligned deep-trench contacts are disclosed. In an embodiment, a method includes forming an array stack having conductor layers and insulator layers, and forming a hard mask on top of the array stack. The hard mask includes a plurality of holes. The method also includes forming a pull-back mask on top of the hard mask, and etching the pull-back mask so that at least one hole of the hard mask is exposed. The method also includes etching through one or more exposed holes of the hard mask to remove one or more layers of the array stack.

Abstract: A 3D NAND array with divided string architecture. In one aspect, an apparatus includes a plurality of charge storing devices connected to form a cell string. The apparatus also includes one or more internal select gates connected between selected charge storing devices in the cell string. The one or more internal select gates divide the cell string into two or more segments of charge storing devices. Selectively enabling and disabling the one or more internal select gates during programming operates to isolate one or more selected segments to reduce program-disturb to remaining segments. In another embodiment, a method is provided for programming a memory cell of a cell string having internal select gates that isolate the memory cell to reduce the effects of program-disturb. In another embodiment, multiple memory cells of a cell string having internal select gates are programmed with reduced program-disturb.

Abstract: A CMOS anti-fuse cell is disclosed. In one aspect, an apparatus includes an N? well and an anti-fuse cell formed on the N? well. The anti-fuse cell includes a drain P+ diffusion deposited in the N? well, a source P+ diffusion deposited in the N? well, and an oxide layer deposited on the N? well and having an overlapping region that overlaps the drain P+ diffusion. A control gate is deposited on the oxide layer. A data bit of the anti-fuse cell is programmed when a voltage difference between the control gate and the drain P+ diffusion exceeds a voltage threshold of the oxide layer and forms a leakage path from the control gate to the drain P+ diffusion. The leakage path is confined to occur in the overlapping region.

Abstract: Three-dimensional vertical memory array cell structures and processes. In an exemplary embodiment, a cell structure includes a word line, a selector layer, and a memory layer. The word line, the selector layer, and the memory layer form a vertical cell structure in which at least one of the selector layer and the memory layer are segmented to form a segment that blocks sneak path leakage current on the word line.

Abstract: A CMOS anti-fuse cell is disclosed. In one aspect, an apparatus includes an N-well and an anti-fuse cell formed on the N-well. The anti-fuse cell includes a drain P+ diffusion deposited in the N-well, a source P+ diffusion deposited in the N-well, and an oxide layer deposited on the N-well and having an overlapping region that overlaps the drain P+ diffusion. A control gate is deposited on the oxide layer. A data bit of the anti-fuse cell is programmed when a voltage difference between the control gate and the drain P+ diffusion exceeds a voltage threshold of the oxide layer and forms a leakage path from the control gate to the drain P+ diffusion. The leakage path is confined to occur in the overlapping region.

Abstract: Methods and apparatus for memory cells that combine static random-access memory and non-volatile memory. In an exemplary embodiment, a memory cell is provided that includes a static random-access memory (SRAM) cell having Q and QB nodes and a non-volatile memory (NVM) array having a plurality of NVM cells. Each NVM cell comprises a memory element and a selector. The memory cell also includes select gates that selectively couple at least one of the Q and QB nodes to the plurality of NVM cells.

Abstract: Three-dimensional vertical memory array cell structures and processes. In an exemplary embodiment, a 3D vertical memory array structure is formed by performing operations that include forming an array stack having alternating metal layers and insulator layers, forming a hole through the array stack to expose internal surfaces of the metal layers and internal surfaces of the insulator layers, and performing a metal-oxidation process on the internal surfaces of the metal layers to form selector devices on the internal surfaces of the metal layers. The operations also include depositing one of resistive material or phase-change material within the hole on the selector devices and the internal surfaces of the insulator layers, such that the hole is reduced to a smaller hole, and depositing conductor material in the smaller hole.