Abstract: The present invention relates to a defect inspection apparatus for inspecting defects in patterns formed on a semiconductor device, on the GUI of which for the confirmation of the inspection results an area is provided for displaying any one of or facing each other the features amount of defects, and the image during inspection or the reacquired image, and on the GUI of which a means is provided for setting the classification class and importance of the defects, and based on the classification class and the importance of the defects information set by this setting means, the classification conditions or the defect judging conditions are automatically or manually set so that the inspection conditions may be set easily.

Abstract: The present invention relates to a defect inspection apparatus for inspecting defects in patterns formed on a semiconductor device, on the GUI of which for the confirmation of the inspection results an area is provided for displaying any one of or facing each other the features amount of defects, and the image during inspection or the reacquired image, and on the GUI of which a means is provided for setting the classification class and importance of the defects, and based on the classification class and the importance of the defects information set by this setting means, the classification conditions or the defect judging conditions are automatically or manually set so that the inspection conditions may be set easily.

Abstract: A charged particle application circuit pattern inspection apparatus and method are disclosed, in which the reduction in the rejection rate attributable to an out-of-focus state due to the change in the charge condition on the sample surface is prevented and the false information is reduced to improve the apparatus reliability. The image acquisition position on a sample is stored in an image acquisition position storage unit, a focus correction value is stored in a focus correction value storage unit in accordance with the image acquisition position and the sample charge condition, the inspection conditions and the sample to be inspected are input from an input unit, the sample charge condition is evaluated in accordance with the image position acquisition position, and the focal point is corrected by a focus correction unit.

Abstract: An apparatus for forming an image corresponding to an input image signal, includes a light beam generator for generating a light beam; a driver for driving the light beam generator; and an image outputting device for scanning the generated light beam which has been reflected by a rotary polygonal mirror to a recording medium in a primary direction and, for moving the recording medium in a secondary direction substantially perpendicular to the primary direction so that the image is formed. A periodical modulation signal generator changes a phase or an amplitude of a first reference signal including a fundamental frequency having a period corresponding to one rotation of the rotary polygonal mirror, and generates a plurality of periodical modulation signals having different phases or different amplitudes from each other. A multiplier multiplies a second reference signal having a predetermined frequency value by the plurality of periodical modulation signals respectively.