Patents by Inventor Fumihiro Sasajima
Fumihiro Sasajima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7435959Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: GrantFiled: May 14, 2007Date of Patent: October 14, 2008Assignee: Hitachi, Ltd.Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
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Patent number: 7381951Abstract: A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified. sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.Type: GrantFiled: August 24, 2005Date of Patent: June 3, 2008Assignee: Hitachi High-Technologies CorporationInventors: Takashi Doi, Noriaki Arai, Hidetoshi Morokuma, Katsumi Setoguchi, Fumihiro Sasajima, Maki Tanaka, Atsushi Miyamoto
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Publication number: 20080099676Abstract: A scanning electron microscope capable of performing alone the critical dimension measurement and the defect inspection is provided. The scanning electron microscope has a reference image storage unit for storing a reference image transcribing a reference pattern, an inspected image pick-up unit for picking up, on the basis of the reference image, an inspected image transcribing an inspection pattern which pattern-matches with the reference pattern, a critical dimension measuring unit for measuring critical dimensions of the inspection pattern by using the inspected image, and a defect inspection unit for performing an inspection of a defect inside or outside the inspection pattern by comparing the reference image with the inspected image.Type: ApplicationFiled: October 30, 2007Publication date: May 1, 2008Inventors: Fumihiro Sasajima, Saori Kato
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Publication number: 20070290697Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: ApplicationFiled: May 14, 2007Publication date: December 20, 2007Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
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Patent number: 7288764Abstract: A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.Type: GrantFiled: January 10, 2007Date of Patent: October 30, 2007Assignee: Hitachi High-Technologies CorporationInventors: Fumihiro Sasajima, Yoshihiro Kimura, Osamu Komuro
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Publication number: 20070114399Abstract: A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.Type: ApplicationFiled: January 10, 2007Publication date: May 24, 2007Applicant: HITACHI HIGH TECHNOLOGIES CORPORATIONInventors: Fumihiro Sasajima, Yoshihiro Kimura, Osamu Komuro
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Patent number: 7217923Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: GrantFiled: August 5, 2005Date of Patent: May 15, 2007Assignee: Hitachi, Ltd.Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
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Publication number: 20070045538Abstract: Information indicating the reason for a failure of template matching is provided. Difference information between a first image, which is referred to as a template, and a third image that is selected by the operator from a second image and that is larger than the template is displayed.Type: ApplicationFiled: August 7, 2006Publication date: March 1, 2007Applicant: Hitachi High-Technologies CorporationInventors: Mitsuji Ikeda, Tatsuya Maeda, Osamu Nasu, Fumihiro Sasajima
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Patent number: 7180062Abstract: A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.Type: GrantFiled: February 28, 2005Date of Patent: February 20, 2007Assignee: Hitachi High-Technologies CorporationInventors: Fumihiro Sasajima, Yoshihiro Kimura, Osamu Komuro
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Publication number: 20060043293Abstract: A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.Type: ApplicationFiled: August 24, 2005Publication date: March 2, 2006Inventors: Takashi Doi, Noriaki Arai, Hidetoshi Morokuma, Katsumi Setoguchi, Fumihiro Sasajima, Maki Tanaka, Atsushi Miyamoto
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Publication number: 20050277029Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: ApplicationFiled: August 5, 2005Publication date: December 15, 2005Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
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Publication number: 20050236570Abstract: In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.Type: ApplicationFiled: April 13, 2005Publication date: October 27, 2005Inventors: Hidetoshi Morokuma, Noriaki Arai, Takashi Doi, Fumihiro Sasajima, Yoshihiro Kimura
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Publication number: 20050211897Abstract: A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.Type: ApplicationFiled: February 28, 2005Publication date: September 29, 2005Inventors: Fumihiro Sasajima, Yoshihiro Kimura, Osamu Komuro
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Patent number: 6936819Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: GrantFiled: June 2, 2004Date of Patent: August 30, 2005Assignee: Hitachi, Ltd.Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
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Publication number: 20040222375Abstract: A method and apparatus suitable for determining the concavity and convexity of line and space patterns formed on a sample. A profile is formed based on a charged-particle beam scan, the profile having a peak. When one foot portion of the peak converges more gradually than the other foot portion, a portion of the sample corresponding to the one foot portion is determined to be a convex portion. Alternatively, when one foot portion of the peak converges more steeply than the other foot portion, a portion of the sample corresponding to the one foot portion is determined to be a concave portion.Type: ApplicationFiled: February 18, 2004Publication date: November 11, 2004Inventors: Yoshihiro Kimura, Osamu Komuro, Fumihiro Sasajima
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Publication number: 20040217288Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: ApplicationFiled: June 2, 2004Publication date: November 4, 2004Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
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Patent number: 6765204Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: GrantFiled: March 18, 2003Date of Patent: July 20, 2004Assignee: Hitachi, Ltd.Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
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Publication number: 20030168596Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: ApplicationFiled: March 18, 2003Publication date: September 11, 2003Applicant: Hitachi, Ltd.Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno
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Patent number: 6573499Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot. area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.Type: GrantFiled: October 6, 2000Date of Patent: June 3, 2003Assignee: Hitachi, Ltd.Inventors: Fumihiro Sasajima, Osamu Komuro, Fumio Mizuno