Abstract: An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.

Abstract: A method of performing an imprint process on each of a plurality of shot regions of a substrate, wherein each shot region includes at least one of at least one valid chip area and at least one invalid chip area, the invalid chip area including an inhibited area in which resin coating is inhibited, the imprint process for a shot region including both the invalid chip area and the valid chip area includes coating the valid chip area of the shot region with the resin, bringing a pattern surface of a mold into contact with the resin, and curing the resin, and in the step of coating, at least the inhibited area of the invalid chip area is not coated with the resin.

Abstract: An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.

Abstract: An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.

Abstract: An object of the present invention is to provide a process for stably producing a catalyst for methacrylic acid production exhibiting high activity and high performance. The process for producing a catalyst for methacrylic acid production of the invention is characterized in that the water content of the catalyst ingredient powder for use in molding, temperature and humidity of a molding step, humidity and temperature of a baking step are individually controlled in the case where molding is performed by a coating method using an Mo—V—P—Cu-based hetero polyacid as an active ingredient and water or an alcohol and/or an aqueous solution of an alcohol as a binder.

Abstract: A method of performing an imprint process on each of a plurality of shot regions of a substrate, wherein each shot region includes at least one of at least one valid chip area and at least one invalid chip area, the invalid chip area including an inhibited area in which resin coating is inhibited, the imprint process for a shot region including both the invalid chip area and the valid chip area includes coating the valid chip area of the shot region with the resin, bringing a pattern surface of a mold into contact with the resin, and curing the resin, and in the step of coating, at least the inhibited area of the invalid chip area is not coated with the resin.

Abstract: An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.

Abstract: An object of the present invention is to provide a process for stably producing a catalyst for methacrylic acid production exhibiting high activity and high performance. The process for producing a catalyst for methacrylic acid production of the invention is characterized in that the water content of the catalyst ingredient powder for use in molding, temperature and humidity of a molding step, humidity and temperature of a baking step are individually controlled in the case where molding is performed by a coating method using an Mo—V—P—Cu-based hetero polyacid as an active ingredient and water or an alcohol and/or an aqueous solution of an alcohol as a binder.

Abstract: A system includes a DVD recorder capable of recording and playing back video data using an HDD, a TV receiver capable of displaying TV broadcasts or effecting display based on the video data played back by the DVD recorder, and an HDMI interface that integrates the function of the two devices, i.e. the TV receiver and DVD recorder. The DVD recorder is powered on in step with the power-on of the TV receiver via the HDMI interface, enabling video data to be supplied from the DVD recorder to the TV receiver. When powered on, the DVD recorder maintains the magnetic disk of the HDD in rotation while the magnetic head is held above the surface of the magnetic disk. The magnetic head is retracted off of the surface of the magnetic disk upon elapse of a predetermined standby time in the absence of instructions regarding recording or playback. HDD malfunctions due to penetration of dust etc.

Abstract: The present invention relates to a compound which has a glucokinase-activating effect and is useful as a therapeutic agent for diabetes mellitus, being represented by a formula (I): [wherein X1 represents a nitrogen atom, sulfur atom, oxygen atom or the like; R1 represents a 6- to 10-membered aryl group, 5- to 7-membered heteroaryl group or the like; D represents an oxygen atom or sulfur atom; R and R3 are the same or different, each representing a hydrogen atom, lower alkyl group or the like; a formula (II) represents an optionally substituted 5- to 7-membered heteroaryl group or the like; a formula (III) represents a monocyclic or bicyclic heteroaryl group] or a pharmaceutically acceptable salt thereof.

Abstract: The present invention concerns a method for producing acrolein and acrylic acid by carrying out vapor phase catalytic oxidation of propylene with molecular oxygen or a gas containing molecular oxygen using a oxidation catalysts comprising Mo, Bi and Fe as an essentially element and a fixed bed multitubular reactor, which comprisesa) using a plurality of supported catalysts having different activities, which was obtained, for example, by different calcination method in the production process of the supported catalysts,b) setting a catalyst layer in a reaction tube, which is formed by dividing it into plural portions in the tube axial direction, andc) arranging the aforementioned plural supported catalysts in such order that the activity becomes high toward the outlet from the inlet of the material gas in the reaction tube axial direction.

Abstract: A catalyst having a high activity and mechanical strength and a process for preparing it are provided. The catalyst comprises molybdenum, vanadium, copper and antimony as essential components. The peak in X-ray diffractometry of the catalytically active component with Cu--K.alpha. line is largest at 22.2.+-.0.30.degree. (2.theta.).

Abstract: A catalyst for the production of unsaturated aldehyde and unsaturated acid, obtained by loading a catalytically active component on a carrier and calcining the loaded catalyst, characterized by an average particle diameter of the catalyst of 4 to 16 mm, an average particle diameter of the carrier of 3 to 12 mm, a calcining temperature of 520 to 600.degree. C. and an amount of the catalytically active component loaded on the carrier of 5 to 80% by weight ?weight of the catalytically active component)/(weight of the catalytically active component+weight of the carrier+weight of a strength improver)!, and a process for producing unsaturated aldehyde and unsaturated acid with the catalyst.

Abstract: A projection exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a substrate, an optical characteristic detecting device for detecting a change in optical characteristic of the projection optical system, which change may result from the projection of the reticle pattern onto the substrate through the projection optical system, and a light detecting device for detecting at least one of (i) an intensity distribution of light from the reticle pattern, at a position adjacent to the reticle or adjacent to an imaging plane on which the reticle is to be imaged, and (ii) an intensity distribution of the light from the reticle pattern, at a position adjacent to a pupil plane of the projection optical system, wherein the optical characteristic detecting device is arranged to detect the amount of change in optical characteristic in accordance with the intensity distribution detected by the light detecting device.

Abstract: A magnetic head includes a back core made of ferrite and a magnetic alloy film arranged in a vicinity of a magnetic gap and having an average composition expressed by TxMyNz wherein T is Fe or Co; M is at least one metal selected from a group consisting of Nb, Zr, Ta, Hf, Cr, W and Mo; N is nitrogen; and x, y and z are atomic percentages holding 65.ltoreq.x.ltoreq.94, 5.ltoreq.y.ltoreq.25, 0<z.ltoreq.20 and x+y+z=100. The head includes an oxygen diffusion prevention part of a higher concentration of nitrogen than included in the whole magnetic alloy film which is provided at the magnetic alloy film at an interfacial part to the ferrite core.

Abstract: In a magnetic head including, a pair of magnetic cores, one of the magnetic cores including a first corner portion, a second corner portion and an end portion between the first and second corner portions, and another one of the magnetic cores including a third corner portion, a fourth corner portion and another end portion between the third and fourth corner portions, the first and third corner portions being opposite to each other, the second and fourth corner portions being opposite to each other, the end portion and the another end portion being opposite to each other, and high-saturation-magnetic-flux-density layers, one of the high-saturation-magnetic-flux-density layers covering the end portion and another one of the high-saturation-magnetic-flux-density layers covering the another end portion, wherein a thickness of the high-saturation-magnetic-flux-density layer on at least one of the first, second, third and fourth corner portions within an important area for preventing a false magnetic head is preve

Abstract: A scanning exposure apparatus includes a first movable stage being movable while carrying a first object thereon, a second movable stage being movable while carrying a second object thereon, a projection optical system for projecting a pattern, a control system serviceable to scan the first and second movable stages in a timed relation and relative to the projection optical system and to project a pattern of the first object onto the second object through the projection optical system, a first reference plate fixedly mounted on the first movable stage, a second reference plate fixedly mounted on the second movable stage, and a detecting system serviceable to scan at least one of the first and second movable stages to detect a relative positional relationship between alignment marks of the first and second reference plates to thereby determine a scan direction of one of the first and second movable stages.

Abstract: An alignment method and apparatus is disclosed wherein, in one exposure process, alignment of a semiconductor substrate may be performed and, while moving the semiconductor substrate in a step-and-repeat manner in relation to shot positions on the semiconductor substrate, a pattern of an original may be printed on the semiconductor substrate at the respective shot position, wherein the one exposure process may be performed while using a plurality of placement data each specifying positions with respect to which the semiconductor substrate is to be positioned during the step-and-repeat motion.

Abstract: A projection exposure apparatus is disclosed for exposing a semiconductor wafer to a pattern, formed on a reticle, by projection using a projection lens system. The apparatus includes an alignment optical system disposed at a side of the wafer remote from the projection lens system. The alignment optical system is used to detect an alignment mark provided on the wafer, from the back of the wafer. In accordance with the detection, the wafer is moved so that its alignment mark is brought into a predetermined positional relation with the alignment optical system, whereby the reticle and the wafer are relatively aligned. With this arrangement, the wafer alignment mark can be detected without being adversely affected by a resist layer applied to the wafer surface. Thus, the reticle and the wafer can be aligned very accurately.

Abstract: A projection exposure apparatus for projecting a pattern of a reticle upon a wafer by use of a projection lens system, is disclosed. The apparatus is arranged so that a mark illuminating light is projected upon the wafer from between the projection lens system and the wafer and not by way of the projection lens system. The light diffracted by an edge of a wafer alignment mark is photoelectrically detected by way of the projection lens system, whereby an electrical signal corresponding to an image of the alignment mark is obtained. On the basis of the detected signal, the wafer is aligned with the reticle. This arrangement allows detection of the alignment mark without being affected by a photoresist applied to the wafer surface. Thus, the reticle-to-wafer alignment can be made accurately. Also, a novel and unique alignment method is disclosed. The disclosed method assures high-accuracy reticle-to-wafer alignment.