Abstract: A display apparatus includes: a display; a display driver that drives the display such that the display displays in accordance with display data; and a host controller that transfers update display data of one screen to the display driver. The display driver includes a light-emission controller that causes a self-luminous elements to emit light, and a memory that stores the update display data of the one screen. The display driver reads the update display data on the memory after an elapse of a predetermined period of time from a drive end time at which the display controller finishes driving in accordance with the update display data and drives the screen by using the read update display data. The display driver drives the self-luminous elements once or more at a timing when the update display data from the host controller to the display driver is not updated.

Abstract: The cleaning agent composition for hard surface contains (A) at least one kind of carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and any neutralized salt of these, (B) an alkanolamine compound, and (C) a hydroxyl group-containing compound having from 8 to 50 carbon atoms.

Abstract: A metal cleanser composition includes: (A) at least one carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and a neutral salts thereof; (B) a specific oxyalkylene group-containing compound; and (C) at least one compound selected from the group consisting of a specific organic phosphonic acid and a salt thereof, and a specific nitrogen-containing heterocycle-containing compound.

Abstract: The cleaning agent composition for hard surface contains at least one kind of carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and any neutralized salt of these, a specific first alkyleneoxy group-containing compound, a specific second alkyleneoxy group-containing compound, and a specific oxypropylene group-containing compound.

Abstract: The cleaning agent composition for hard surface contains (A) at least one kind of carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and any neutralized salt of these, (B) an alkanolamine compound, and (C) a hydroxyl group-containing compound having from 8 to 50 carbon atoms.

Abstract: The cleaning agent composition for hard surface contains at least one kind of carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and any neutralized salt of these, a specific first alkyleneoxy group-containing compound, a specific second alkyleneoxy group-containing compound, and a specific oxypropylene group-containing compound.

Abstract: By almost completely removing foreign matter adhering to the wafer holding unit of a polishing head in a CMP process, a wafer yield is improved. An apparatus for polishing a semiconductor wafer is provided with a wafer holder to which the wafer is attached, a polishing unit which polishes the wafer with a polishing slurry supplied to the wafer, a wafer attaching and detaching unit at which the wafer is attached to or detached from the wafer holder, and a washing unit which washes the wafer holder. The wafer holder has a wafer contact surface, which contacts the backside of the wafer, and a supporting unit which prevents the jump out of the wafer. The washing unit has nozzles which supply a washing solution to the wafer contact surface and the supporting unit, and the nozzles are composed of a plurality of outlets capable of supplying at least two different liquids. As a result, it is possible to almost completely remove the foreign matter adhering to the wafer holder to always keep the wafer holder clean.

Abstract: By almost completely removing foreign matter adhering to the wafer holding unit of a polishing head in a CMP process, a wafer yield is improved. An apparatus for polishing a semiconductor wafer is provided with a wafer holder to which the wafer is attached, a polishing unit which polishes the wafer with a polishing slurry supplied to the wafer, a wafer attaching and detaching unit at which the wafer is attached to or detached from the wafer holder, and a washing unit which washes the wafer holder. The wafer holder has a wafer contact surface, which contacts the backside of the wafer, and a supporting unit which prevents the jump out of the wafer. The washing unit has nozzles which supply a washing solution to the wafer contact surface and the supporting unit, and the nozzles are composed of a plurality of outlets capable of supplying at least two different liquids. As a result, it is possible to almost completely remove the foreign matter adhering to the wafer holder to always keep the wafer holder clean.

Abstract: This invention provides the compounds of formula (I): or its a pharmaceutically acceptable ester or amide of such compound, or a pharmaceutically acceptable salt thereof, wherein X1 is NH; R1, R2, R4 through R6 and R7 through R11 are all hydrogen; R3 is hydroxy; X2 and X3 are methylene; X4 is a bond; and X5 is a carbon atom, and the like. These compounds have ORL1-receptor antagonist activity; and therefore, are useful to treat diseases or conditions such as pain, various CNS diseases etc.

Abstract: A compound of the formula: or a pharmaceutically acceptable salt, ester or ether thereof, wherein R1 through R12 are independently hydrogen or the like; X1 and X2 are independently CH2 or the like; R13 is hydrogen or the like; or R12 and R13 taken together with three ring atoms of the quinoline ring separating said substituents form a heterocyclic ring; R14 and R15 are hydrogen or the like or these groups taken together form oxo; and the dotted line represents a single or double bond. These compounds are ligands for ORL-1 receptor and especially are antagonists for said receptor.

Abstract: A compound of the formula: or a pharmaceutically acceptable salt thereof, wherein R1 is unsubstituted, mono-, di- or tri-substituted (C3-C11)cycloalkyl or (C3-C11)cycloalkenyl or the like, A is unsubstituted (C1-C7)alkyl or (C2-C5)alkenyl, hydroxy-(C1-C4)alkyl, (C1-C4)alkoxy-(C?O), or unsubstituted, mono-, di- or tri-substituted aryl, or aromatic-heterocyclic or the like, M is a covalent bond O, S, NH or the like, Y is 4- to 12-membered bicyclic-carbocyclic rings or 4- to 12-membered bicyclic-heterocyclic rings, or 5- to 17 membered spirocarbocyclic rings or 5- to 17-membered spiroheterocyclic rings or the like, Z1, Z2, Z3 and Z4 are hydrogen or the like, is disclosed. These compounds have ORL1-receptor agonist activity, and are thus useful as analgesics or the like in mammalian subjects.

Abstract: A compound of the formula (I) or a salt, prodrug or solvate thereof, wherein R1 and R2 groups are all hydrogen; A is a benzofuzed azahetero ring; W1—W2 is CH2—CH2; X1—X1 is CH2—CH2; and Z is methylene or carbonyl; or the like, is a ligand for ORL1-receptor and are useful for treating or preventing pain, a CNS disorder or the like in mammalian subjects.

Abstract: A method for fabricating a semiconductor device, which includes the process step of polishing a substrate using CMP. To suppress the generation of scars and scratches on a wafer surface, in the polishing process, a tube-type slurry supply pump 15 is used to supply slurry. Then, in the tube-type slurry supply pump 15, a vinyl chloride type tube is used as a tube 12 for supplying a slurry.

Abstract: On the surface of a belt-type surface plate wound around two rollers whose rotation axes are arranged in parallel with each other, four or other number of sheet-shaped polishing pads of polyurethane are stuck. Each of the polishing pads has grooves extending in the same direction as the drive direction of the surface plate. Moreover, the polishing pads adjacently arranged in the drive direction of the surface plate are stuck apart in such a manner that the grooves of one polishing pad are spaced not to align with the respective grooves of the other polishing pad.

Abstract: A process of preparing compounds having the formula I: or an optical isomer or racemic or optically active mixture thereof, which are useful as selective kappa-receptor agonists.

Abstract: A compound of the formula: 1

Abstract: A compound of the formula: 1

Abstract: A compound of the formula: 1

Abstract: A compound of the formula: 1

Abstract: A process of preparing compounds having the formula I: 1