Abstract: The present application provides a chassis, a vehicle, a device for manufacturing a vehicle and a method for manufacturing a vehicle. The chassis includes at least two movable bodies that are continuously arranged along a first preset direction, and by adjusting a position of at least one movable body in the first preset direction, a length of the chassis in the first preset direction can be changed so as to enable the chassis to adapt to the vehicle body of a different length. Since each movable body is provided at an adjacent movable body thereof with a position adjustable in a preset direction, the chassis is made into a telescopic structure that is adjustable in length. The length of the chassis can be adjusted according to the requirements to enable the chassis to adapt to the vehicle body of a different length.

Abstract: Disclosed is a wafer backside cleaning method, comprising: using a wafer clamping part to hold a wafer, a gap being formed between the wafer clamping part and the wafer; injecting a protective gas into the gap at a first flow rate; adjusting the flow rate of the protective gas from the first flow rate to a second flow rate, and rotating the wafer under the drive of the first rotational speed of the wafer clamping part to clean the backside of the wafer; adjusting the rotational speed of the wafer clamping part from the first rotational speed to a second rotational speed, so that the wafer is driven by the wafer clamping part to rotate for the drying process; stopping rotating the wafer, adjusting the flow rate of the protective gas to the first flow rate again from the second flow rate, and then taking out the wafer; and stopping injecting the protective gas after the wafer is taken out.

Abstract: A rotary platform device comprises a rotatable platform; a rotatable annular base disposed at the bottom of the platform. A top surface of the platform has a plane for placing objects, and the platform has an annular first groove; the annular base is disposed inside the annular first groove and is capable of rotating circumferentially along the annular first groove; a plurality of first balls is rotatably arranged at regular intervals on the annular base circumferentially along the annular base, a top portion of each first ball attaches to a top wall of the annular first groove and a side portion of each first ball attaches at least one of two side walls of the annular first groove. The rotary platform device of the present invention enables synchronous guiding and driving of the platform, such that the platform can rotate relative to the annular base more smoothly and stably.

Abstract: A method for cleaning substrates includes rotating a substrate; delivering deionized water on a surface of the substrate for pre wetting the surface of the substrate; delivering chemical solution with high temperature on the surface of the substrate for cleaning the surface of the substrate; changing the rotation speed of the substrate to a low rotation speed, and moving a ultra/mega sonic device. The method further includes turning on the ultra/mega sonic device and supplying a constant or pulse working power in a first cleaning cycle; turning off the ultra/mega sonic device, and delivering a high temperature chemical solution or deionized water. The method further includes turning on the ultra/mega sonic device and supplying a constant or pulse working power in a second cleaning cycle; turning off the ultra/mega sonic device, and delivering rinse chemical solution or deionized water on the surface of the substrate; and drying the substrate.

Abstract: A high-precision positioning system for a monorail hoist in a mine includes two gear carriers symmetrically arranged on both sides of an I-beam track. Each of the gear carriers includes a positioning wheel and a plurality of travelling wheels. The travelling wheels are travelling on an upper end face of a bottom plate of the I-beam track, and the positioning wheel is in engagement transmission with a rack at a lower end of the bottom plate of the I-beam track. The gear carriers include an installation bracket and a connecting seat configured to connect the monorail hoist. The installation bracket includes an inertial measuring unit and a single-chip microcomputer that are electrically connected with each other. The positioning wheel includes a rotation angle sensor and the rotation angle sensor is electrically connected to the single-chip microcomputer. A headstock at both ends of the monorail hoist includes a coordinate updating unit.

Abstract: A substrate processing apparatus includes a clamp mechanism, a spray head mechanism, a rotary drive mechanism, a heating mechanism, and a control mechanism. The heating mechanism includes a heating plate arranged below a substrate, wherein the heating plate is provided with at least two cavities in a radial direction, and the cavities are distributed at different radii. During the process of the liquid nozzle moving from the center of the substrate to the edge of the substrate along the radial direction of the substrate, when the liquid nozzle moves to a certain area above the substrate, the control mechanism controls the thermal energy of fluid in the cavity located at the corresponding radius of the area.

Abstract: A seal stamping machine has two pressing plates disposed face to face, each plate being capable of compressing a stamp, and a stamping carrier is located between the plates. The first plate has a plurality of positioning holes and the second plate has a corresponding plurality of elastic positioning mechanisms, each elastic positioning mechanism corresponding to one of the plurality of positioning holes; when the plates are pressed together, the elastic positioning mechanisms urge the first plate away from the second plate. The plates are aligned by the positioning holes and the elastic positioning mechanisms in order to align the stamping carrier and avoid displacement. A seal is thus uniformly stamped.

Abstract: A drying apparatus is based on supercritical fluid. The drying apparatus includes: an upper cover; a base, arranged below the upper cover and the base and the upper cover; a substrate tray, arranged on the base; a first fluid supply tube, arranged on the top wall of the upper cover; a fluid disturbance plate, arranged below the first fluid supply tube; a second fluid supply tube, arranged on a first side wall of the upper cover; and a fluid discharge tube, arranged on a second side wall of the upper cover. The inner space of the closed chamber can be minimized by using the drying apparatus, thereby saving the usage amount of the supercritical fluid, and reducing the usage costs.

Abstract: An apparatus for cleaning semiconductor wafers includes a plurality of load ports; at least one first tank, containing cleaning chemical, configured to implement batch cleaning process; one or more second tanks, containing cleaning liquid, configured to implement batch cleaning process; and one or more single wafer cleaning modules. The apparatus further includes: a first turnover device, configured to rotate the one or more wafers from horizontal plane to vertical plane so that the one or more wafers can be vertically transferred to the at least one first tank; and a second turnover device, configured to rotate the one or more wafers from vertical plane to horizontal plane so that the one or more wafers can be horizontally transferred to the one or more single wafer cleaning modules.

Abstract: Provided are a floor brush assembly for a vacuum cleaner and the vacuum cleaner. The floor brush assembly includes a roller brush component and a driving mechanism. The roller brush component includes a sleeve and a roller brush body rotatably mounted in the sleeve. The roller brush body is provided with bristles. The driving mechanism includes a power source and a transmission component. The transmission component includes a first driving member, a second driving member, and a driving wheel connected to the power source. The driving wheel is connected to the first driving member through a transmission shaft to drive the roller brush body to rotate. The driving wheel is connected to the second driving member through a linkage structure to drive the sleeve to rotate. The first driving member and the second driving member are eccentrically arranged to allow the bristles to be selectively extended out of or retracted into the sleeve.

Abstract: The present invention belongs to the technical field of audio equipment, and particularly relates to a wireless microphone device and a use method therefor. In the wireless microphone device, a main control unit controls a transmitter working mode in which an input unit, an output unit, a time code unit, a conversion modulation unit, a storage unit and a radio-frequency unit work together; or a receiver working mode in which the input unit, the output unit, the time code unit, the conversion modulation unit and the radio frequency unit work together; or a time code generator working mode in which the output unit and the time code unit work together; or a sound recorder working mode in which the input unit, the time code unit, the conversion modulation unit and the storage unit work together.

Abstract: A coater with automatic cleaning function and a coater automatic cleaning method. The coater (100,200,300,400,500,600,700,800) includes a coater chamber (101,201,301,401,501,601,701,801) capable of being filled up with cleaning solution, a substrate chuck (102,202,302,402,502,602,702,802) holding and positioning a substrate (103,203,303,403,503,603,703,803), and at least one shroud (108,208,308,408,508) capable of moving up for preventing photoresist from splashing out of the coater chamber (101,201,301,401,501,601,701,801), or moving down and immersing into the cleaning solution for cleaning.

Abstract: A method for cleaning a substrate with pattern structures comprises the following steps: using gas-liquid atomization to clean a substrate surface (601); using TEBO megasonic to clean the substrate surface (602); and drying the substrate (603). The TEBO megasonic cleaning is used to remove small size particles on the substrate and the gas-liquid atomization cleaning is used to remove large size particles on the substrate. The method enables achieving an effect of cleaning the substrate without or with less device damage. A substrate cleaning apparatus is also provided.

Abstract: The invention provides an apparatus for cleaning semiconductor wafers. The apparatus includes at least one first tank, containing cleaning chemical, configured to implement batch cleaning process; one or more second tanks, containing cleaning liquid, configured to implement batch cleaning process; one or more single wafer cleaning modules, configured to implement single wafer cleaning and drying processes; a plurality of robots, configured to transfer one or more wafers to the at least one first tank and the one or more second tanks successively, and then to the one or more single wafer cleaning modules; and a controller, configured to control the plurality of robots to transfer the one or more wafers to the at least one first tank and the one or more second tanks successively, and then to the one or more single wafer cleaning modules.

Abstract: Related to is a method for cleaning an in-process wafer. The method includes causing the in-process wafer to be rotated, causing function water to be applied to a surface of the rotated in-process wafer to generate a flowing function water film on the rotated in-process wafer, causing the surface of the in-process wafer to be cleaned by a sonic device for a first period, causing the sonic device to be lifted and/or rotation speed of the rotated in-process wafer to be accelerated to separate the sonic device from the flowing function water film, causing the function water to be applied to the surface of the rotated in-process wafer for a second period after separating the sonic device from the function water film, and causing the surface of the in-process wafer to be dried.

Abstract: The present invention relates to a rotating mechanism for annular pattern stamping and stamping machine thereof. The rotating mechanism comprises a base (4), a rotating unit (5) rotatably disposed on the base, an operating unit (6) detachably disposed on the rotating unit; wherein, a clamping space is defined between the rotating unit and the operating unit for clamping a stamping carrier; the operating unit is capable of rotating together with the rotating unit and the stamping carrier in the clamping space relative to the base. Compared with the manual mode, the rotating mechanism for annular pattern stamping of the present invention can realize the automatic rotation of the stamping carrier by the operating unit, so it is convenient to operate.

Abstract: Provided is a floor brush assembly for a vacuum cleaner. The floor brush assembly includes a roller brush component and a driving mechanism. A roller brush body of the roller brush component is rotatably mounted in a sleeve. The roller brush body is provided with bristles arranged in an elongated shape to form a bristle portion. The sleeve of the roller brush component has an avoidance opening of an elongated shape, and the bristle portion and the avoidance opening are arranged to directly face towards each other in a radial direction of the roller brush body. A first driving member of the driving mechanism is configured to drive the roller brush body to rotate, and a second driving member is configured to drive the sleeve to rotate. The first driving member and the second driving member are eccentrically arranged to allow the bristle portion to be selectively extended or retracted through the avoidance opening.

Abstract: Provided are a cutting apparatus, a cleaning device, a cleaning base station, a cleaning system, and a method. The cutting apparatus includes a housing, N groups of blades, and a drive mechanism. The housing has an opening. N groups of blades each include a fixed blade and a movable blade. N fixed blades are located in the housing and arranged linearly. N movable blades are located in the housing and arranged linearly. Each of the N movable blades corresponds to one of the N fixed blades. Each of the N fixed blades and each of the N movable blades have a toothed edge protruding from the opening towards an outer side of the housing, and the toothed edge of the fixed blade is tightly fitted to the toothed edge of the movable blade.

Abstract: A core material for a shock insulation support, comprising, in parts by weight: steel shot of 150-300 parts, zirconia particles of 50-150 parts and rubber particles of 50-100 parts. Further provided are a shock insulation support comprising the core material, and a preparation method for the shock insulation support. The core material for a shock insulation support, and the shock insulation support dissipates earthquake energy by means of a dry friction energy dissipation mechanism, having high damping and excellent shock insulation performance.

Abstract: The present invention relates to a novel method of producing a compound of Formula (I) from a compound of formula (II) by a novel cyclisation process, as well as a method of producing an acid adduct of the compound of Formula (I) wherein L represents a leaving group, and R represents hydrogen, a substituted or unsubstituted linear, branched and/or cyclic alkyl group that may contain one or more hetero atoms in the linear, branched and/or cyclic alkyl chain, a substituted or unsubstituted aromatic or heteroaromatic group, a substituted or unsubstituted linear, branched and/or cyclic aralkyl or heteroaromatic alkyl group that may contain one or more hetero atoms in the linear, branched and/or cyclic alkanediyl chain, or a substituted or unsubstituted alkylaryl or alkyl heteroaromatic group with at least one linear, branched and/or cyclic alkyl residue that may contain one or more hetero atoms in the linear, branched and/or cyclic alkyl chain.