Abstract: An optical component including a first layer, a second layer and a bulk sandwiched between the first and second layers, where the bulk is formed by a composition containing a liquid crystal material which is in a blue phase. At least one of the first and second layers has, toward the bulk, an alignment layer. The blue phase of the liquid crystal material exhibits a uniform organization in three directions (Ox, Oy, Oz) in at least 80% of the volume of the bulk, the liquid crystal material being stabilized in the blue phase at least over the temperatures ranging from 10° C. to 35° C.

Abstract: The invention relates to an optical component (1) comprising a first layer (10), a second layer (20) and a bulk (50) sandwiched between said first and second layers, wherein —the bulk is formed by a composition comprising a liquid crystal material (55) which is in a blue phase (56), —at least one of the first and second layers has, toward the bulk, an alignment layer (15, 25), and —the blue phase of the liquid crystal material exhibits a uniform organization in three directions (Ox, Oy, Oz) in at least 80% of the volume of the bulk, said liquid crystal material being stabilized in said blue phase at least over the temperatures ranging from 10° C. to 35° C.

Abstract: An interferometric measurement system capable of measuring tilt of a reflecting surface with respect to a vertical axis. The system preferably includes four laser beams spaced at predetermined distances to measure distances between the measurement system and four locations on the reflecting surface. A controller is also provided for receiving inputs from the measuring laser beams to mathematically determine a tilt of the location being measured.

Abstract: This invention relates to an apparatus and method for positioning dual stages during semiconductor wafer processing. More particularly, the invention facilitates the use of interferometers to determine the positions of both wafer stages at all times during processing. While the movement of a typical twin stage apparatus causes one of the stages to eclipse the other and requires the addition of a significant number of additional interferometers, this invention minimizes the number of interferometers necessary through dimensioning the stages so that one stage never totally eclipses the other.

Abstract: Correlation values between a plurality of templates prepared beforehand and a picture-element data distribution as a pick-up result of an image are calculated, and the position of a maximum template whose correlation value is the maximum of the calculated correlation values is obtained. Subsequently, a curved surface function is calculated which fits the distribution of calculated correlation-values in positions near the maximum template's position, and the position of the picked-up image is calculated based on the curved surface function. As a result, the number of templates prepared beforehand to achieve desired accuracy in detecting a position and the number of times of calculating correlation-values can be reduced, and the image position can be quickly and accurately detected.

Abstract: An optical characteristic measuring method with which to measure an optical characteristic of an optical system to be examined. The optical characteristic measuring method includes detecting positions of a plurality of features in a picked-up image by repeating a calculating step of image information, a calculating step of comparison feature positions, and a correcting and updating step of current estimated feature positions, until the differences between an initial estimated feature positions and the comparison feature positions become at or below a permissible limit, and calculating an optical characteristic of the optical system to be examined based on the detected positions of the plurality of features.

Abstract: An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.

Abstract: The method for positioning two stages during semiconductor wafer processing facilitates the use of two stages to improve system throughput by decreasing the rest-time of certain system components. While a typical single-stage apparatus requires that each step in the process be performed serially, this invention allows an amount of parallel processing with each stage at different steps of the process, and thus improves system throughput.

Abstract: This invention relates to a method for positioning two stages during semiconductor wafer processing. More particularly, the invention facilitates the use of two stages to improve system throughput by decreasing the rest-time of certain system components. While a typical single-stage apparatus requires that each step in the process be performed serially, this invention allows an amount of parallel processing with each stage at different steps of the process, and thus improves system throughput.

Abstract: This invention relates to an apparatus and method for positioning dual stages during semiconductor wafer processing. More particularly, the invention facilitates the use of interferometers to determine the positions of both wafer stages at all times during processing. While the movement of a typical twin stage apparatus causes one of the stages to eclipse the other and requires the addition of a significant number of additional interferometers, this invention minimizes the number of interferometers necessary through dimensioning the stages so that one stage never totally eclipses the other.

Abstract: An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.

Abstract: An interferometric measurement system capable of measuring tilt of a reflecting surface with respect to a vertical axis. The system preferably includes four laser beams spaced at predetermined distances to measure distances between the measurement system and four locations on the reflecting surface. A controller is also provided for receiving inputs from the measuring laser beams to mathematically determine a tilt of the location being measured.

Abstract: An interferometric measurement system capable of measuring tilt of a reflecting surface with respect to a vertical axis. The system preferably includes four laser beams spaced at predetermined distances to measure distances between the measurement system and four locations on the reflecting surface. A controller is also provided for receiving inputs from the measuring laser beams to mathematically determine a tilt of the location being measured.

Abstract: An interferometric measuring system including a movable member having a measurement reflector attached thereto, a stationary member having a reference reflector attached thereto, a light source for providing a light beam, and an optical support block having first and second beam splitters mounted thereon. The first beam splitter is operable to convert the light beam into a first pair of orthogonally polarized beams and arranged to direct one of the first pair of beams along a reference path to the reference reflector and the other of the first pair of beams along a measurement path to the measurement reflector to create a measurement interference pattern between the first pair of beams for determining a position of the movable member. The second beam splitter is operable to form a second pair of orthogonally polarized beams and arranged to direct the second pair of beams along support block measurement paths to the reference reflector.

Abstract: An interferometric measuring system including a movable member having a measurement reflector attached thereto, a stationary member having a reference reflector attached thereto, a light source for providing a light beam, and an optical support block having first and second beam splitters mounted thereon. The first beam splitter is operable to convert the light beam into a first pair of orthogonally polarized beams and arranged to direct one of the first pair of beams along a reference path to the reference reflector and the other of the first pair of beams along a measurement path to the measurement reflector to create a measurement interference pattern between the first pair of beams for determining a position of the movable member. The second beam splitter is operable to form a second pair of orthogonally polarized beams and arranged to direct the second pair of beams along support block measurement paths to the reference reflector.

Abstract: First, the wave-front aberration in an optical system PL subject to measurement is measured using a measuring system 70 according to a usual method. After that, by using calculated correction information for aberration components of a second set of order terms based on a model for the measuring system 70 and aberration components of a first set of order terms measured before, the result of measuring aberration components of the second set of order terms is corrected. As a result, aberration components of the second set of order terms can be accurately obtained, so that the wave-front aberration in the optical system subject to measurement is accurately obtained.

Abstract: Initial estimated feature positions on an image plane are calculated using a specific algorism based on an image-pick-up result; the whole image data on the image plane is calculated assuming that real features are present in current estimated feature positions, and comparison feature positions are calculated based on the whole image data using the specific algorism. And when all differences between the initial estimated feature positions and the comparison feature positions do not lie within a permissible range, the current estimated feature positions are corrected according to the respective differences. By repeating recursively such update of the current estimated feature positions, the accuracy of estimating the real feature positions is improved.

Abstract: Correlation values between a plurality of templates prepared beforehand and a picture-element data distribution as a pick-up result of an image are calculated, and the position of a maximum template whose correlation value is the maximum of the calculated correlation values is obtained. Subsequently, a curved surface function is calculated which fits the distribution of calculated correlation-values in positions near the maximum template's position, and the position of the picked-up image is calculated based on the curved surface function. As a result, the number of templates prepared beforehand to achieve desired accuracy in detecting a position and the number of times of calculating correlation-values can be reduced, and the image position can be quickly and accurately detected.

Abstract: An autofocus system for use for instance in a photolithography machine (but not so limited) uses oblique incident optics which transform a defocus of the plane of the wafer whose location is being detected to a lateral shear of the beam. A common path interferometer measures the lateral shear. The common path interferometer is for instance a triangular path interferometer. Since both the signal (object) light beam and the reference light beams transverse almost exactly the same optical path, the system is thereby independent of mechanical vibration or other environmental influence such as temperature variations. Compensation is provided for refractive effects caused by local atmospheric heating immediately above the wafer surface.

Abstract: A step-and-scan exposure method and a scanning exposure apparatus in which a mask has a plurality of patterns and the number of patterns to be transferred to each shot area of a photosensitive substrate varies. The scanning and stepping movements are controlled in accordance with the number of patterns transferred, and dimensions of a pattern illumination area are varied in accordance with the patterns to be transferred. Transfer of a pattern to a shot area is omitted when an image of the pattern on the shot area would extend beyond the photosensitive substrate. Elimination of exposure scanning movements for patterns that are not to be transferred permits rapid movements of the mask and the substrate to scanning start positions.