Patents by Inventor Fuyuhiko Inoue

Fuyuhiko Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6160628
    Abstract: A projection exposure apparatus and method aligns a substrate with an optical axis of a lens column using one or more interferometers, mirrors, and a control device. The lens column projects a pattern from a mask onto the substrate. The optical axis of the lens column is perpendicular to the substrate. To ensure precise alignment of the lens column and the substrate, the one or more interferometers use a plurality of beams having respective paths, the lengths of which change in response to movement of the optical axis. In response to the detected changes of the interferometer beams, a control device adjusts the position of the stage so that the substrate is aligned with the optical axis of the lens column.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: December 12, 2000
    Assignee: Nikon Corporation
    Inventor: Fuyuhiko Inoue
  • Patent number: 5617182
    Abstract: A step-and-scan exposure method in which a mask has a plurality of patterns and the number of patterns to be transferred to each shot area of a photosensitive substrate varies. The scanning and stepping movements are controlled in accordance with the number of patterns transferred, and dimensions of a pattern illumination area are varied in accordance with the patterns to be transferred. Transfer of a pattern to a shot area is omitted when an image of the pattern on the shot area would extend beyond the photosensitive substrate. Elimination of exposure scanning movements for patterns that are not to be transferred permits rapid movements of the mask and the substrate to scanning start positions.
    Type: Grant
    Filed: November 21, 1994
    Date of Patent: April 1, 1997
    Assignee: Nikon Corporation
    Inventors: Shinji Wakamoto, Hidemi Kawai, Fuyuhiko Inoue
  • Patent number: 4971413
    Abstract: A laser beam depicting apparatus adapted to depict a raster image by modulating a laser beam by image data and raster-scanning the laser beam by the reflecting surfaces of a rotational polygonal mirror comprises a laser source for producing a laser beam by oscillating light components of plural wavelengths at the same time, a light modulator for modulating the laser beam without causing color dispersion, a light deflector for correcting any deviation in a direction orthogonal to the deflection of the laser beam caused by the tilting error of each reflecting surface of the rotational polygonal mirror without causing color dispersion, and an f.theta. lens having its chromatic aberration corrected for condensing the laser beam deflected by the rotational polygonal mirror in order to raster-scan an object to be depicted.
    Type: Grant
    Filed: November 30, 1988
    Date of Patent: November 20, 1990
    Assignee: Nikon Corporation
    Inventor: Fuyuhiko Inoue
  • Patent number: 4761561
    Abstract: In a pattern generating system for scanning a pattern on a surface of a workpiece with a laser beam modulated by drawing data so as to form a pattern corresponding to design pattern data, a plurality of through holes are formed at predetermined positions of the workpiece. Beams transmitted through the through holes are directed to a sensor for generating a detection output representing positions of the transmitted beams. A computer generates position data of the through holes on the basis of the detection output and calculates a positional error and a deformation amount of the workpiece. A correcting device corrects the drawing on the basis of the positional error and the deformation amount.
    Type: Grant
    Filed: November 21, 1986
    Date of Patent: August 2, 1988
    Assignee: Nippon Kogaku K.K.
    Inventors: Yoshihisa Fujiwara, Akikazu Tanimoto, Hisakazu Kato, Manabu Hosoya, Shinji Miura, Fuyuhiko Inoue, Yuichi Aoki