Abstract: An imaging apparatus which can be mounted with a first battery and a second battery includes: a load circuit configured to operate the imaging apparatus; and a control circuit configured to control power supply to the load circuit based on a first battery voltage in the first battery and a second battery voltage in the second battery. In a high-load mode, the control circuit selects any one of the first battery, the second battery, and a combination of the first and second batteries in accordance with the first and second battery voltages, to supply power to the load circuit. In a low-load mode, the control circuit selects either one of the first battery and the second battery in accordance with the first and second battery voltages without selecting the combination of the first and second batteries, to supply power to the load circuit.

Abstract: An imaging apparatus which can be mounted with a first battery and a second battery includes: a load circuit configured to operate the imaging apparatus; and a control circuit configured to control power supply to the load circuit based on a first battery voltage in the first battery and a second battery voltage in the second battery. In a high-load mode, the control circuit selects any one of the first battery, the second battery, and a combination of the first and second batteries in accordance with the first and second battery voltages, to supply power to the load circuit. In a low-load mode, the control circuit selects either one of the first battery and the second battery in accordance with the first and second battery voltages without selecting the combination of the first and second batteries, to supply power to the load circuit.

Abstract: The imaging apparatus includes a first display device, a second display device, an eyepiece sensor that detects that an object approaches the first display device, and a controller that switches the eyepiece sensor to be valid and invalid. The controller sets the eyepiece sensor to be invalid when the first display device is not inclined while the second display device is inclined. The controller sets the eyepiece sensor to be valid when the first and second display devices are inclined.

Abstract: The imaging apparatus includes a first display device, a second display device, an eyepiece sensor that detects that an object approaches the first display device, and a controller that switches the eyepiece sensor to be valid and invalid. The controller sets the eyepiece sensor to be invalid when the first display device is not inclined while the second display device is inclined. The controller sets the eyepiece sensor to be valid when the first and second display devices are inclined.

Abstract: The rotary dial apparatus of the present disclosure includes: a housing; a dial being rotatably held relative to the housing; a magnet rotating in accordance with rotation of the dial; and a magnetic sensor disposed in the housing and detecting rotation of the magnet. The magnet and the magnetic sensor are disposed in different regions from each other with a wall being interposed between the magnet and the magnetic sensor.

Abstract: Provided is an imaging apparatus that can shoot at a specified frame speed during continuous shooting. The imaging apparatus in the present disclosure is an imaging apparatus for performing continuous shooting at a specified frame speed, the imaging apparatus including an imaging element configured to generate image data by imaging an object image, a mechanical shutter configured to control an exposure for the imaging element, a frame speed detector configured to detect a frame speed of the continuous shooting, and a control section configured to perform a read operation of the image data and control of the mechanical shutter. The control section adjusts the frame speed of the continuous shooting when a difference between the specified frame speed and the frame speed of the continuous shooting exceeds a predetermined range.

Abstract: The imaging apparatus has a single shooting mode and a continuous shooting mode, and includes: an imaging element configured to generate image data; a mechanical shutter configured to control exposure of the imaging element; a charge block including a driving mechanism configured to drive the mechanical shutter and a motor configured to provide a driving force for the driving mechanism, and a control section configured to control the charge block. The control section performs a charging operation for charging the driving mechanism by causing the motor to rotate in a capturing operation, performs the charging operation in a first time period in a case where the imaging apparatus is in the continuous shooting mode, and performs the charging operation in a second time period which is longer than the first time period in a case where the imaging apparatus is in the single shooting mode.

Abstract: The rotary dial apparatus of the present disclosure includes: a housing; a dial being rotatably held relative to the housing; a magnet rotating in accordance with rotation of the dial; and a magnetic sensor disposed in the housing and detecting rotation of the magnet. The magnet and the magnetic sensor are disposed in different regions from each other with a wall being interposed between the magnet and the magnetic sensor.

Abstract: The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle.

Abstract: The imaging apparatus has a single shooting mode and a continuous shooting mode, and includes: an imaging element configured to generate image data; a mechanical shutter configured to control exposure of the imaging element; a charge block including a driving mechanism configured to drive the mechanical shutter and a motor configured to provide a driving force for the driving mechanism, and a control section configured to control the charge block. The control section performs a charging operation for charging the driving mechanism by causing the motor to rotate in a capturing operation, performs the charging operation in a first time period in a case where the imaging apparatus is in the continuous shooting mode, and performs the charging operation in a second time period which is longer than the first time period in a case where the imaging apparatus is in the single shooting mode.

Abstract: Provided is an imaging apparatus that can shoot at a specified frame speed during continuous shooting. The imaging apparatus in the present disclosure is an imaging apparatus for performing continuous shooting at a specified frame speed, the imaging apparatus including an imaging element configured to generate image data by imaging an object image, a mechanical shutter configured to control an exposure for the imaging element, a frame speed detector configured to detect a frame speed of the continuous shooting, and a control section configured to perform a read operation of the image data and control of the mechanical shutter. The control section adjusts the frame speed of the continuous shooting when a difference between the specified frame speed and the frame speed of the continuous shooting exceeds a predetermined range.

Abstract: A method of manufacturing a microneedle including forming a plurality of first linear grooves on a substrate in parallel to one another along a first direction using grinding and forming a plurality of second linear grooves on the substrate in parallel to one another in a second direction intersecting the first direction using grinding. At least one of the forming of a plurality of first linear grooves and the forming of a plurality of second linear grooves includes forming first stage grooves using a first dicing blade; and processing the first stage grooves by tracing the first stage grooves using a second dicing blade having a side surface different from that of the first dicing blade to thereby form second stage grooves.

Abstract: The present disclosure provides a method of performing circuit simulation of electrical characteristics of a transistor formed on a semiconductor substrate using calculators, each of which includes a memory. A first calculator receives mask layout data and distance-dependent data indicating a distance from the target transistor. Then, a second calculator calculates an area ratio of a layout pattern of a predetermined mask from the received mask layout data, and calculates a parameter ? based on the area ratio and the distance-dependent data. Then, the second calculator B calculates a change ?P in the electrical characteristics of the transistor based on the parameter ?. This configuration provides highly accurate circuit simulation of the electrical characteristics of the transistor, which depend on variations in temperature distribution of the semiconductor substrate during heat treatment due to the mask layout pattern around the transistor.

Abstract: The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle.

Abstract: A method of manufacturing a microneedle including the steps of forming a plurality of first linear grooves on a substrate in parallel to one another along a first direction using grinding, and forming a plurality of second linear grooves on the substrate in parallel to one another in a second direction intersecting the first direction using grinding.

Abstract: The present disclosure provides a method of performing circuit simulation of electrical characteristics of a transistor formed on a semiconductor substrate using calculators, each of which includes a memory. A first calculator receives mask layout data and distance-dependent data indicating a distance from the target transistor. Then, a second calculator calculates an area ratio of a layout pattern of a predetermined mask from the received mask layout data, and calculates a parameter ? based on the area ratio and the distance-dependent data. Then, the second calculator B calculates a change ?P in the electrical characteristics of the transistor based on the parameter ?. This configuration provides highly accurate circuit simulation of the electrical characteristics of the transistor, which depend on variations in temperature distribution of the semiconductor substrate during heat treatment due to the mask layout pattern around the transistor.

Abstract: A method of manufacturing a microneedle including the steps of forming a plurality of first linear grooves on a substrate in parallel to one another along a first direction using grinding, and forming a plurality of second linear grooves on the substrate in parallel to one another in a second direction intersecting the first direction using grinding.

Abstract: A method of manufacturing a microneedle including the steps of forming a plurality of first linear grooves on a substrate in parallel to one another along a first direction using grinding, and forming a plurality of second linear grooves on the substrate in parallel to one another in a second direction intersecting the first direction using grinding.

Abstract: The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle.

Abstract: One embodiment of the present invention is a pattern forming method for forming a fine three-dimensional structural pattern, including: forming a resist material film on a substrate having a projecting pattern on a step in such a manner as to cover at least a marginal portion of the projecting pattern such that the resist material film is heaped on the projecting pattern in conformity with the step; reducing the heaped resist material film formed by first etching until the marginal portion of the projecting pattern is exposed from an edge of the heaped resist material film; and forming an upper projecting pattern according to the projecting pattern in a self-aligning manner by second etching on the marginal portion of the exposed projecting pattern by using the reduced resist material film as a mask.