Patents by Inventor Gaku Suzuki
Gaku Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240275231Abstract: A cooling member for a rotating electrical machine includes: a first portion forming a cooling medium inlet hole; a second portion forming a cooling medium outlet hole; and a third portion forming a cooling medium passage that connects the cooling medium inlet hole and the cooling medium outlet hole without communicating with outside. The third portion includes, in the cooling medium passage, a plurality of first pillar portions each standing in a first direction perpendicular to a flow of a cooling medium, and a plurality of protruding portions each protruding in the first direction. The cooling medium is in contact with surfaces of the plurality of first pillar portions and surfaces of the protruding portions that are exposed to the cooling medium passage.Type: ApplicationFiled: July 6, 2022Publication date: August 15, 2024Applicants: AISIN CORPORATION, ART METAL MFG. CO., LTD.Inventors: Yasuhiro TAKI, Masaki IKEDA, Gaku SUZUKI
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Patent number: 11108956Abstract: An imaging apparatus which can be mounted with a first battery and a second battery includes: a load circuit configured to operate the imaging apparatus; and a control circuit configured to control power supply to the load circuit based on a first battery voltage in the first battery and a second battery voltage in the second battery. In a high-load mode, the control circuit selects any one of the first battery, the second battery, and a combination of the first and second batteries in accordance with the first and second battery voltages, to supply power to the load circuit. In a low-load mode, the control circuit selects either one of the first battery and the second battery in accordance with the first and second battery voltages without selecting the combination of the first and second batteries, to supply power to the load circuit.Type: GrantFiled: March 16, 2020Date of Patent: August 31, 2021Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Gaku Suzuki, Kazuyuki Ohashi
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Publication number: 20200304711Abstract: An imaging apparatus which can be mounted with a first battery and a second battery includes: a load circuit configured to operate the imaging apparatus; and a control circuit configured to control power supply to the load circuit based on a first battery voltage in the first battery and a second battery voltage in the second battery. In a high-load mode, the control circuit selects any one of the first battery, the second battery, and a combination of the first and second batteries in accordance with the first and second battery voltages, to supply power to the load circuit. In a low-load mode, the control circuit selects either one of the first battery and the second battery in accordance with the first and second battery voltages without selecting the combination of the first and second batteries, to supply power to the load circuit.Type: ApplicationFiled: March 16, 2020Publication date: September 24, 2020Inventors: Gaku SUZUKI, Kazuyuki OHASHI
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Patent number: 10623616Abstract: The imaging apparatus includes a first display device, a second display device, an eyepiece sensor that detects that an object approaches the first display device, and a controller that switches the eyepiece sensor to be valid and invalid. The controller sets the eyepiece sensor to be invalid when the first display device is not inclined while the second display device is inclined. The controller sets the eyepiece sensor to be valid when the first and second display devices are inclined.Type: GrantFiled: November 15, 2018Date of Patent: April 14, 2020Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventor: Gaku Suzuki
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Publication number: 20190166290Abstract: The imaging apparatus includes a first display device, a second display device, an eyepiece sensor that detects that an object approaches the first display device, and a controller that switches the eyepiece sensor to be valid and invalid. The controller sets the eyepiece sensor to be invalid when the first display device is not inclined while the second display device is inclined. The controller sets the eyepiece sensor to be valid when the first and second display devices are inclined.Type: ApplicationFiled: November 15, 2018Publication date: May 30, 2019Inventor: Gaku SUZUKI
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Patent number: 9544478Abstract: The rotary dial apparatus of the present disclosure includes: a housing; a dial being rotatably held relative to the housing; a magnet rotating in accordance with rotation of the dial; and a magnetic sensor disposed in the housing and detecting rotation of the magnet. The magnet and the magnetic sensor are disposed in different regions from each other with a wall being interposed between the magnet and the magnetic sensor.Type: GrantFiled: August 12, 2015Date of Patent: January 10, 2017Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Hiroshi Yamaura, Koji Yasuda, Gaku Suzuki
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Patent number: 9473685Abstract: Provided is an imaging apparatus that can shoot at a specified frame speed during continuous shooting. The imaging apparatus in the present disclosure is an imaging apparatus for performing continuous shooting at a specified frame speed, the imaging apparatus including an imaging element configured to generate image data by imaging an object image, a mechanical shutter configured to control an exposure for the imaging element, a frame speed detector configured to detect a frame speed of the continuous shooting, and a control section configured to perform a read operation of the image data and control of the mechanical shutter. The control section adjusts the frame speed of the continuous shooting when a difference between the specified frame speed and the frame speed of the continuous shooting exceeds a predetermined range.Type: GrantFiled: February 4, 2015Date of Patent: October 18, 2016Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Gaku Suzuki, Yasuhiro Nakagai, Jin Korekuni
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Patent number: 9300870Abstract: The imaging apparatus has a single shooting mode and a continuous shooting mode, and includes: an imaging element configured to generate image data; a mechanical shutter configured to control exposure of the imaging element; a charge block including a driving mechanism configured to drive the mechanical shutter and a motor configured to provide a driving force for the driving mechanism, and a control section configured to control the charge block. The control section performs a charging operation for charging the driving mechanism by causing the motor to rotate in a capturing operation, performs the charging operation in a first time period in a case where the imaging apparatus is in the continuous shooting mode, and performs the charging operation in a second time period which is longer than the first time period in a case where the imaging apparatus is in the single shooting mode.Type: GrantFiled: February 18, 2015Date of Patent: March 29, 2016Assignee: Panasonic Intellectual Property Management Co., LTD.Inventors: Hiroki Aono, Gaku Suzuki, Yasuhiro Nakagai
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Publication number: 20160057321Abstract: The rotary dial apparatus of the present disclosure includes: a housing; a dial being rotatably held relative to the housing; a magnet rotating in accordance with rotation of the dial; and a magnetic sensor disposed in the housing and detecting rotation of the magnet. The magnet and the magnetic sensor are disposed in different regions from each other with a wall being interposed between the magnet and the magnetic sensor.Type: ApplicationFiled: August 12, 2015Publication date: February 25, 2016Inventors: HIROSHI YAMAURA, KOJI YASUDA, GAKU SUZUKI
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Patent number: 9238384Abstract: The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle.Type: GrantFiled: January 29, 2013Date of Patent: January 19, 2016Assignee: TOPPAN PRINTING CO., LTD.Inventors: Kazuhiko Shiomitsu, Hiroshi Sugimura, Toshiaki Kurosu, Gaku Suzuki, Takao Tomono
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Publication number: 20150256751Abstract: The imaging apparatus has a single shooting mode and a continuous shooting mode, and includes: an imaging element configured to generate image data; a mechanical shutter configured to control exposure of the imaging element; a charge block including a driving mechanism configured to drive the mechanical shutter and a motor configured to provide a driving force for the driving mechanism, and a control section configured to control the charge block. The control section performs a charging operation for charging the driving mechanism by causing the motor to rotate in a capturing operation, performs the charging operation in a first time period in a case where the imaging apparatus is in the continuous shooting mode, and performs the charging operation in a second time period which is longer than the first time period in a case where the imaging apparatus is in the single shooting mode.Type: ApplicationFiled: February 18, 2015Publication date: September 10, 2015Inventors: Hiroki AONO, Gaku SUZUKI, Yasuhiro NAKAGAI
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Publication number: 20150222824Abstract: Provided is an imaging apparatus that can shoot at a specified frame speed during continuous shooting. The imaging apparatus in the present disclosure is an imaging apparatus for performing continuous shooting at a specified frame speed, the imaging apparatus including an imaging element configured to generate image data by imaging an object image, a mechanical shutter configured to control an exposure for the imaging element, a frame speed detector configured to detect a frame speed of the continuous shooting, and a control section configured to perform a read operation of the image data and control of the mechanical shutter. The control section adjusts the frame speed of the continuous shooting when a difference between the specified frame speed and the frame speed of the continuous shooting exceeds a predetermined range.Type: ApplicationFiled: February 4, 2015Publication date: August 6, 2015Inventors: Gaku SUZUKI, Yasuhiro NAKAGAI, Jin KOREKUNI
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Patent number: 8876575Abstract: A method of manufacturing a microneedle including forming a plurality of first linear grooves on a substrate in parallel to one another along a first direction using grinding and forming a plurality of second linear grooves on the substrate in parallel to one another in a second direction intersecting the first direction using grinding. At least one of the forming of a plurality of first linear grooves and the forming of a plurality of second linear grooves includes forming first stage grooves using a first dicing blade; and processing the first stage grooves by tracing the first stage grooves using a second dicing blade having a side surface different from that of the first dicing blade to thereby form second stage grooves.Type: GrantFiled: October 11, 2012Date of Patent: November 4, 2014Assignees: Toppan Printing Co., Ltd., Hisamitsu Pharmaceutical Co., Inc.Inventors: Hiroshi Sugimura, Gaku Suzuki, Masahiro Ueno, Yoshihiro Kodama, Takao Tomono
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Patent number: 8555224Abstract: The present disclosure provides a method of performing circuit simulation of electrical characteristics of a transistor formed on a semiconductor substrate using calculators, each of which includes a memory. A first calculator receives mask layout data and distance-dependent data indicating a distance from the target transistor. Then, a second calculator calculates an area ratio of a layout pattern of a predetermined mask from the received mask layout data, and calculates a parameter ? based on the area ratio and the distance-dependent data. Then, the second calculator B calculates a change ?P in the electrical characteristics of the transistor based on the parameter ?. This configuration provides highly accurate circuit simulation of the electrical characteristics of the transistor, which depend on variations in temperature distribution of the semiconductor substrate during heat treatment due to the mask layout pattern around the transistor.Type: GrantFiled: May 14, 2012Date of Patent: October 8, 2013Assignee: Panasonic CorporationInventors: Tomoyuki Ishizu, Kyouji Yamashita, Gaku Suzuki
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Patent number: 8377364Abstract: The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle.Type: GrantFiled: March 29, 2010Date of Patent: February 19, 2013Assignee: Toppan Printing Co., Ltd.Inventors: Kazuhiko Shiomitsu, Hiroshi Sugimura, Toshiaki Kurosu, Gaku Suzuki, Takao Tomono
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Patent number: 8292696Abstract: A method of manufacturing a microneedle including the steps of forming a plurality of first linear grooves on a substrate in parallel to one another along a first direction using grinding, and forming a plurality of second linear grooves on the substrate in parallel to one another in a second direction intersecting the first direction using grinding.Type: GrantFiled: April 14, 2010Date of Patent: October 23, 2012Assignee: Hisamitsu Pharmaceutical Co., Inc.Inventors: Hiroshi Sugimura, Gaku Suzuki, Masahiro Ueno, Yoshihiro Kodama, Takao Tomono
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Publication number: 20120227016Abstract: The present disclosure provides a method of performing circuit simulation of electrical characteristics of a transistor formed on a semiconductor substrate using calculators, each of which includes a memory. A first calculator receives mask layout data and distance-dependent data indicating a distance from the target transistor. Then, a second calculator calculates an area ratio of a layout pattern of a predetermined mask from the received mask layout data, and calculates a parameter ? based on the area ratio and the distance-dependent data. Then, the second calculator B calculates a change ?P in the electrical characteristics of the transistor based on the parameter ?. This configuration provides highly accurate circuit simulation of the electrical characteristics of the transistor, which depend on variations in temperature distribution of the semiconductor substrate during heat treatment due to the mask layout pattern around the transistor.Type: ApplicationFiled: May 14, 2012Publication date: September 6, 2012Applicant: PANASONIC CORPORATIONInventors: Tomoyuki ISHIZU, Kyouji YAMASHITA, Gaku SUZUKI
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Patent number: 7789733Abstract: A method of manufacturing a microneedle including the steps of forming a plurality of first linear grooves on a substrate in parallel to one another along a first direction using grinding, and forming a plurality of second linear grooves on the substrate in parallel to one another in a second direction intersecting the first direction using grinding.Type: GrantFiled: January 27, 2009Date of Patent: September 7, 2010Assignees: Toppan Printing Co., Ltd., Hisamitsu Pharmaceutical Co., Inc.Inventors: Hiroshi Sugimura, Gaku Suzuki, Masahiro Ueno, Yoshihiro Kodama, Takao Tomono
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Publication number: 20100198169Abstract: A method of manufacturing a microneedle including the steps of forming a plurality of first linear grooves on a substrate in parallel to one another along a first direction using grinding, and forming a plurality of second linear grooves on the substrate in parallel to one another in a second direction intersecting the first direction using grinding.Type: ApplicationFiled: April 14, 2010Publication date: August 5, 2010Applicant: TOPPAN PRINTING CO., LTD.Inventors: Hiroshi Sugimura, Gaku Suzuki, Masahiro Ueno, Yoshihiro Kodama, Takao Tomono
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Publication number: 20100185162Abstract: The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle.Type: ApplicationFiled: March 29, 2010Publication date: July 22, 2010Applicant: Toppan Printing Co., Ltd.Inventors: Kazuhiko SHIOMITSU, Hiroshi Sugimura, Toshiaki Kurosu, Gaku Suzuki, Takao Tomono