Abstract: DNA constructs comprising a first DNA segment that corresponds to at least a portion of a gene in the monolignol biosynthetic pathway, a spacer DNA segment, and a second DNA segment that is complementary to the first DNA segment can be used to reduce or modulate the lignin content in plants. In some embodiments, DNA constructs comprise at least a portion of a gene for 4CL, C3H, CCR, C4H or CCoAOMT. Vascular-preferred and constitutive promoters can be used to drive expression of the constructs.

Abstract: Semiconductor devices and fabrication methods are provided, in which gate defects associated with photoresist stress after plasma trim/etch are substantially reduced. The method comprises forming a gate dielectric layer above a semiconductor body substrate; coating the gate dielectric layer with a photoresist coating; exposing and developing the photoresist coating; performing a resist annealing; and trimming and etching the photoresist coating.

Abstract: DNA constructs comprising a first DNA segment that corresponds to at least a portion of a gene in the monolignol biosynthetic pathway, a spacer DNA segment, and a second DNA segment that is complementary to the first DNA segment can be used to reduce or modulate the lignin content in plants. In some embodiments, DNA constructs comprise at least a portion of a gene for 4CL, C3H, CCR, C4H or CCoAOMT. Vascular-preferred and constitutive promoters can be used to drive expression of the constructs.

Abstract: DNA constructs comprising a first DNA segment that corresponds to at least a portion of a gene in the monolignol biosynthetic pathway, a spacer DNA segment, and a second DNA segment that is complementary to the first DNA segment can be used to reduce or modulate the lignin content in plants. In some embodiments, DNA constructs comprise at a least a portion of a gene for 4CL, C3H, CCR, C4H, Cald5H, 5AD or CCoAOMT. Vascular-preferred and constitutive promoters can be used to drive expression of the constructs.

Abstract: According to one embodiment of the invention, a method for enhancing multiple feature lithography is provided. The method includes generating a plurality of maps each associated with a particular one of a plurality of circuit features. Each map maps an illumination field comprising a plurality of point sources and indicates, in terms of a process metric and for each point source, a level of feature quality that will result from using the each point source to image the each circuit feature. The method also includes identifying, based on the maps, a group of one or more of the point sources that, if used to image the circuit features onto a target surface, will result in an overall feature quality level equal to or greater than a predetermined quality threshold.

Abstract: DNA constructs comprising a first DNA segment that corresponds to at least a portion of a gene in the monolignol biosynthetic pathway, a spacer DNA segment, and a second DNA segment that is complementary to the first DNA segment can be used to reduce or modulate the lignin content in plants. In some embodiments, DNA constructs comprise at a least a portion of a gene for 4CL, C3H, CCR, C4H or CCoAOMT. Vascular-preferred and constitutive promoters can be used to drive expression of the constructs.