Patents by Inventor Gayatri V. Dadheech

Gayatri V. Dadheech has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190369389
    Abstract: A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from a fluorinated material, and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the regions includes a photocatalytic material. The system may include a wave guide disposed adjacent the substrate. The wave guide includes a first light source configured for emitting a first portion of electromagnetic radiation towards the film having an ultraviolet wavelength of from 10 nm to 400 nm, and a second light source configured for emitting a second portion of electromagnetic radiation towards the film having an infrared wavelength of from 700 nm to 1 mm. A method of forming a self-cleaning film system configured for reducing a visibility of a contaminant is disclosed.
    Type: Application
    Filed: August 19, 2019
    Publication date: December 5, 2019
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: James A. CARPENTER, Thomas A. SEDER, Gayatri V. DADHEECH
  • Publication number: 20190336946
    Abstract: A self-cleaning film system includes a substrate and a self-cleaning film disposed on the substrate. The self-cleaning film includes a monolayer formed from an oleophobic material, and a first plurality of regions disposed within the monolayer in a non-periodic pattern such that each of the first plurality of regions abuts and is surrounded by the oleophobic material. Each of the first plurality of regions includes a photocatalytic material.
    Type: Application
    Filed: May 7, 2018
    Publication date: November 7, 2019
    Applicant: GM Global Technology Operations LLC
    Inventors: Gayatri V. Dadheech, Thomas A. Seder, James A. Carpenter
  • Publication number: 20190337013
    Abstract: A method of forming a self-cleaning film system includes ink jet printing a composition onto a substrate. The composition includes an oleophobic material and a photocatalytic material. The method further includes curing the composition to form a self-cleaning film disposed on the substrate and thereby form the self-cleaning film system. The self-cleaning film includes a first plurality of regions including the photocatalytic material and disposed within the oleophobic material such that each of the first plurality of regions abuts and is surrounded by the oleophobic material.
    Type: Application
    Filed: May 7, 2018
    Publication date: November 7, 2019
    Applicant: GM Global Technology Operations LLC
    Inventors: Gayatri V. Dadheech, Thomas A. Seder, James A. Carpenter
  • Publication number: 20190342985
    Abstract: Systems and apparatuses for applying a plasma actuator system for reducing aerodynamic drag of a vehicle by discharging plasma is provided. The system includes: at least one pair of thin films configured to integrate into a pair of electrodes wherein each of the thin films of the pair of thin films is composed of a thin film piezo-electric material; a dielectric configured as an insulator region to separate each electrode integrated with the thin film piezo-electric material; and a power supply to deliver alternating current to each electrode to provide a high voltage output obtained by the thin film piezo-electric material integrated with the pair of electrodes wherein the high voltage output is about 10 kV.
    Type: Application
    Filed: May 3, 2018
    Publication date: November 7, 2019
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Gayatri V. Dadheech, Bahram Khalighi, Taeyoung Han
  • Publication number: 20190335572
    Abstract: An apparatus configured to induce airflow over a sensor lens is provide. The apparatus includes a sensor lens; and a plasma actuator. The plasma actuator may include a dielectric element, a first electrode disposed under the dielectric element, a second electrode disposed on the dielectric element such that the second electrode is exposed, and a plasma layer disposed in between the first electrode and the second electrode. The plasma actuator may be disposed at a periphery of the sensor lens.
    Type: Application
    Filed: April 30, 2018
    Publication date: October 31, 2019
    Inventors: Taeyoung Han, Bahram Khalighi, Paul E. Krajewski, Gayatri V. Dadheech
  • Publication number: 20190319242
    Abstract: A modified separator for a high-energy lithium metal-based electrochemical cell and methods of formation relating thereto are provided. The modified separator includes a substrate including a dopant and a coating layer disposed on the doped substrate. The dopant and compound comprising the coating layer are independently selected from the group consisting of: aluminum oxide (Al2O3), titanium dioxide (TiO2), zirconium dioxide (ZrO2), zinc oxide (ZnO), iron oxide (Fe2O3), tin oxide (SnO), silicon oxide (SiO2), tantalum oxide (Ta2O5), lanthanum oxide (La2O3), hydrofluoroolefin (HfO), cerium oxide (CeO2), and combinations thereof.
    Type: Application
    Filed: April 13, 2018
    Publication date: October 17, 2019
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Gayatri V. DADHEECH, Li YANG, Mei CAI, Biqiong WANG
  • Patent number: 10429641
    Abstract: A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from a fluorinated material, and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the regions includes a photocatalytic material. The system also includes a wave guide disposed adjacent the substrate. The wave guide includes a first light source configured for emitting a first portion of electromagnetic radiation towards the film having an ultraviolet wavelength of from 10 nm to 400 nm, and a second light source configured for emitting a second portion of electromagnetic radiation towards the film having an infrared wavelength of from 700 nm to 1 mm. A method of forming a self-cleaning film system configured for reducing a visibility of a contaminant is disclosed.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: October 1, 2019
    Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: James A. Carpenter, Thomas A. Seder, Gayatri V. Dadheech
  • Publication number: 20190237758
    Abstract: Methods of forming a lithium-based negative electrode assembly are provided. A surface of a metal current collector is treated with a reducing plasma gas so that after the treating, a treated surface of the metal current collector is formed that has a contact angle of less than or equal to about 10° and has less than or equal to about 5% metal oxides. The metal current collector may include a metal, such as copper, nickel, and iron. A lithium metal is applied to the treated surface of the metal current collector in an environment substantially free from oxidizing species. Lithium metal flows over and adheres to the treated surface to form a layer of lithium. The layer of lithium may be a thin layer having a thickness of ?about 1 ?m to ?about 75 ?m thus forming the lithium metal negative electrode assembly.
    Type: Application
    Filed: February 1, 2018
    Publication date: August 1, 2019
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Gayatri V. Dadheech, Li Yang, Mark W. Verbrugge
  • Patent number: 10274647
    Abstract: A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a plurality of regions disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material. The system includes an adhesive layer adhered to the substrate and a release liner affixed to and removable from the adhesive layer.
    Type: Grant
    Filed: May 18, 2017
    Date of Patent: April 30, 2019
    Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Thomas A. Seder, James A. Carpenter, Gayatri V. Dadheech
  • Patent number: 10224571
    Abstract: The performance and durability of an electrochemical cell using a lithium metal based anode and a compatible lithium-accepting cathode are improved by the use of a suitable lithium electrolyte salt and a new liquid co-solvent mixture for the electrolyte. The co-solvent mixture comprises a non-aqueous ionic liquid, conductive of lithium ions, and a liquid fluorinated organic ether.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: March 5, 2019
    Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Li Yang, Mei Cai, Fang Dai, Gayatri V. Dadheech
  • Publication number: 20180348509
    Abstract: A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from a fluorinated material, and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the regions includes a photocatalytic material. The system also includes a wave guide disposed adjacent the substrate. The wave guide includes a first light source configured for emitting a first portion of electromagnetic radiation towards the film having an ultraviolet wavelength of from 10 nm to 400 nm, and a second light source configured for emitting a second portion of electromagnetic radiation towards the film having an infrared wavelength of from 700 nm to 1 mm. A method of forming a self-cleaning film system configured for reducing a visibility of a contaminant is disclosed.
    Type: Application
    Filed: May 31, 2017
    Publication date: December 6, 2018
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: James A. Carpenter, Thomas A. Seder, Gayatri V. Dadheech
  • Publication number: 20180333710
    Abstract: A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from fluorinated material and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the first plurality of regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the first regions includes a photocatalytic material. A method of forming a self-cleaning film system includes depositing a monolayer formed from fluorinated material onto a substrate. After depositing, the method includes ablating the monolayer to define a first plurality of cavities therein, wherein each of the first cavities is spaced apart from an adjacent one of the first cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the first plurality of cavities to form a film on the substrate and thereby form the film system.
    Type: Application
    Filed: May 18, 2017
    Publication date: November 22, 2018
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Gayatri V. Dadheech, Thomas A. Seder, James A. Carpenter
  • Publication number: 20180334742
    Abstract: A method of forming a self-cleaning film system includes depositing a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof onto a substrate to form a first layer. The method includes removing a plurality of portions of the first layer to define a plurality of cavities in the first layer and form a plurality of projections that protrude from the substrate. The method includes depositing a photocatalytic material onto the plurality of projections and into the plurality of cavities to form a second layer comprising: a plurality of bonded portions disposed in the plurality of cavities and in contact with the substrate, and a non-bonded portion disposed on the plurality of projections and spaced apart from the substrate. The method also includes, after depositing the photocatalytic material, removing the non-bonded portion to thereby form the self-cleaning film system.
    Type: Application
    Filed: May 18, 2017
    Publication date: November 22, 2018
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Gayatri V. Dadheech, Thomas A. Seder, James A. Carpenter
  • Publication number: 20180333711
    Abstract: A method of forming a film system includes depositing a monolayer formed from a fluorocarbon onto a substrate. After depositing, the method includes ablating the monolayer to define a plurality of cavities therein, wherein each of the plurality of cavities is spaced apart from an adjacent one of the plurality of cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the plurality of cavities to form a film on the substrate and thereby form the film system. The film system includes a plurality of regions including the photocatalytic material and disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorocarbon.
    Type: Application
    Filed: April 4, 2018
    Publication date: November 22, 2018
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Gayatri V. Dadheech, Thomas A. Seder, James A. Carpenter
  • Publication number: 20180333709
    Abstract: A self-cleaning film system configured for reducing a visibility of a contaminant includes a substrate and a film. The film includes a monolayer defining a plurality of cavities and formed from a first material having a first surface energy, and a plurality of patches disposed within the plurality of cavities. Each of the patches is formed from a photocatalytic material having a second surface energy that is higher than the first. The film has a touchpoint area having a first use frequency, and a second area having a second use frequency that is less than the first. The patches are present in the touchpoint area in a first concentration and are configured to direct the contaminant towards the second area. The patches are present in the second area in a second concentration that is higher than the first and are configured to reduce the visibility of the contaminant.
    Type: Application
    Filed: May 18, 2017
    Publication date: November 22, 2018
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Thomas A. Seder, James A. Carpenter, Gayatri V. Dadheech
  • Publication number: 20180333756
    Abstract: A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a first plurality of regions disposed within the monolayer such that each of the first plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material.
    Type: Application
    Filed: May 18, 2017
    Publication date: November 22, 2018
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Thomas A. Seder, James A. Carpenter, Gayatri V. Dadheech
  • Publication number: 20180335548
    Abstract: A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a plurality of regions disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material. The system includes an adhesive layer adhered to the substrate and a release liner affixed to and removable from the adhesive layer.
    Type: Application
    Filed: May 18, 2017
    Publication date: November 22, 2018
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Thomas A. Seder, James A. Carpenter, Gayatri V. Dadheech
  • Publication number: 20180320023
    Abstract: A method of forming a self-cleaning film system includes depositing a photocatalytic material onto a substrate to form a first layer. The method also includes disposing a photoresist onto the first layer and then exposing the photoresist to light so that the photoresist has a developed portion and an undeveloped portion. The method includes removing the undeveloped portion so that the developed portion protrudes from the first layer. After removing, the method includes depositing a perfluorocarbon siloxane polymer onto the first layer to surround and contact the developed portion. After depositing the perfluorocarbon siloxane polymer, the method includes removing the developed portion to thereby form the self-cleaning film system.
    Type: Application
    Filed: July 12, 2018
    Publication date: November 8, 2018
    Applicant: GM Global Technology Operations LLC
    Inventors: Gayatri V. Dadheech, Thomas A. Seder, James A. Carpenter
  • Publication number: 20180248182
    Abstract: In an example of a method for making a sulfur-based positive electrode active material, a carbon layer is formed on a sacrificial nanomaterial. The carbon layer is coated with titanium dioxide to form a titanium dioxide layer. The sacrificial nanomaterial is removed to form a hollow material including a hollow core surrounded by a carbon and titanium dioxide double shell. Sulfur is impregnated into the hollow core.
    Type: Application
    Filed: April 27, 2018
    Publication date: August 30, 2018
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Gayatri V. DADHEECH, Xingcheng XIAO, Mei CAI
  • Patent number: 10052622
    Abstract: A method of forming a self-cleaning film system includes depositing a perfluorocarbon siloxane polymer onto a substrate to form a first layer. The method includes removing a plurality of portions of the first layer to define a plurality of cavities in the first layer and form a plurality of projections that protrude from the substrate. The method includes depositing a photocatalytic material onto the plurality of projections and into the plurality of cavities to form a second layer comprising: a bonded portion disposed in the plurality of cavities and in contact with the substrate, and a non-bonded portion disposed on the plurality of projections and spaced apart from the substrate. The method also includes, after depositing the photocatalytic material, removing the non-bonded portion to thereby form the self-cleaning film system.
    Type: Grant
    Filed: February 10, 2017
    Date of Patent: August 21, 2018
    Assignee: GM Global Technology Operations LLC
    Inventors: Gayatri V. Dadheech, Thomas A. Seder, James A. Carpenter