Abstract: Methods of forming a lithium-based negative electrode assembly are provided. A surface of a metal current collector is treated with a reducing plasma gas so that after the treating, a treated surface of the metal current collector is formed that has a contact angle of less than or equal to about 10° and has less than or equal to about 5% metal oxides. The metal current collector may include a metal, such as copper, nickel, and iron. A lithium metal is applied to the treated surface of the metal current collector in an environment substantially free from oxidizing species. Lithium metal flows over and adheres to the treated surface to form a layer of lithium. The layer of lithium may be a thin layer having a thickness of ?about 1 ?m to ?about 75 ?m thus forming the lithium metal negative electrode assembly.

Abstract: A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a plurality of regions disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material. The system includes an adhesive layer adhered to the substrate and a release liner affixed to and removable from the adhesive layer.

Abstract: The performance and durability of an electrochemical cell using a lithium metal based anode and a compatible lithium-accepting cathode are improved by the use of a suitable lithium electrolyte salt and a new liquid co-solvent mixture for the electrolyte. The co-solvent mixture comprises a non-aqueous ionic liquid, conductive of lithium ions, and a liquid fluorinated organic ether.

Abstract: A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from a fluorinated material, and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the regions includes a photocatalytic material. The system also includes a wave guide disposed adjacent the substrate. The wave guide includes a first light source configured for emitting a first portion of electromagnetic radiation towards the film having an ultraviolet wavelength of from 10 nm to 400 nm, and a second light source configured for emitting a second portion of electromagnetic radiation towards the film having an infrared wavelength of from 700 nm to 1 mm. A method of forming a self-cleaning film system configured for reducing a visibility of a contaminant is disclosed.

Abstract: A self-cleaning film system configured for reducing a visibility of a contaminant includes a substrate and a film. The film includes a monolayer defining a plurality of cavities and formed from a first material having a first surface energy, and a plurality of patches disposed within the plurality of cavities. Each of the patches is formed from a photocatalytic material having a second surface energy that is higher than the first. The film has a touchpoint area having a first use frequency, and a second area having a second use frequency that is less than the first. The patches are present in the touchpoint area in a first concentration and are configured to direct the contaminant towards the second area. The patches are present in the second area in a second concentration that is higher than the first and are configured to reduce the visibility of the contaminant.

Abstract: A self-cleaning film system includes a substrate and a film. The film includes a monolayer formed from fluorinated material and a first plurality of regions disposed within the monolayer and spaced apart from one another such that each of the first plurality of regions abuts, is surrounded by, and is not covered by the fluorinated material. Each of the first regions includes a photocatalytic material. A method of forming a self-cleaning film system includes depositing a monolayer formed from fluorinated material onto a substrate. After depositing, the method includes ablating the monolayer to define a first plurality of cavities therein, wherein each of the first cavities is spaced apart from an adjacent one of the first cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the first plurality of cavities to form a film on the substrate and thereby form the film system.

Abstract: A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a plurality of regions disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material. The system includes an adhesive layer adhered to the substrate and a release liner affixed to and removable from the adhesive layer.

Abstract: A method of forming a film system includes depositing a monolayer formed from a fluorocarbon onto a substrate. After depositing, the method includes ablating the monolayer to define a plurality of cavities therein, wherein each of the plurality of cavities is spaced apart from an adjacent one of the plurality of cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the plurality of cavities to form a film on the substrate and thereby form the film system. The film system includes a plurality of regions including the photocatalytic material and disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorocarbon.

Abstract: A method of forming a self-cleaning film system includes depositing a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof onto a substrate to form a first layer. The method includes removing a plurality of portions of the first layer to define a plurality of cavities in the first layer and form a plurality of projections that protrude from the substrate. The method includes depositing a photocatalytic material onto the plurality of projections and into the plurality of cavities to form a second layer comprising: a plurality of bonded portions disposed in the plurality of cavities and in contact with the substrate, and a non-bonded portion disposed on the plurality of projections and spaced apart from the substrate. The method also includes, after depositing the photocatalytic material, removing the non-bonded portion to thereby form the self-cleaning film system.

Abstract: A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a first plurality of regions disposed within the monolayer such that each of the first plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material.

Abstract: A method of forming a self-cleaning film system includes depositing a photocatalytic material onto a substrate to form a first layer. The method also includes disposing a photoresist onto the first layer and then exposing the photoresist to light so that the photoresist has a developed portion and an undeveloped portion. The method includes removing the undeveloped portion so that the developed portion protrudes from the first layer. After removing, the method includes depositing a perfluorocarbon siloxane polymer onto the first layer to surround and contact the developed portion. After depositing the perfluorocarbon siloxane polymer, the method includes removing the developed portion to thereby form the self-cleaning film system.

Abstract: In an example of a method for making a sulfur-based positive electrode active material, a carbon layer is formed on a sacrificial nanomaterial. The carbon layer is coated with titanium dioxide to form a titanium dioxide layer. The sacrificial nanomaterial is removed to form a hollow material including a hollow core surrounded by a carbon and titanium dioxide double shell. Sulfur is impregnated into the hollow core.

Abstract: A method of forming a self-cleaning film system includes depositing a perfluorocarbon siloxane polymer onto a substrate to form a first layer. The method includes removing a plurality of portions of the first layer to define a plurality of cavities in the first layer and form a plurality of projections that protrude from the substrate. The method includes depositing a photocatalytic material onto the plurality of projections and into the plurality of cavities to form a second layer comprising: a bonded portion disposed in the plurality of cavities and in contact with the substrate, and a non-bonded portion disposed on the plurality of projections and spaced apart from the substrate. The method also includes, after depositing the photocatalytic material, removing the non-bonded portion to thereby form the self-cleaning film system.

Abstract: An example of a negative electrode includes a lithium metal active material and a coating disposed on the lithium metal active material. The coating consists of one of: (i) a polymeric ionic liquid; or (ii) a VEC polymer formed from vinyl ethylene carbonate; or (iii) a homo-polymer formed from ethylene glycol methyl ether methacrylate, triethylene glycol methyl ether methacrylate, or polyethylene glycol methyl ether methacrylate; or (iv) a combination of any two or more of (i), (ii), and (iii).

Abstract: In an example of a method for making a sulfur-based positive electrode active material, a carbon layer is formed on a sacrificial nanomaterial. The carbon layer is coated with titanium dioxide to form a titanium dioxide layer. The sacrificial nanomaterial is removed to form a hollow material including a hollow core surrounded by a carbon and titanium dioxide double shell. Sulfur is impregnated into the hollow core.

Abstract: The performance and durability of an electrochemical cell using a lithium metal based anode and a compatible lithium-accepting cathode are improved by the use of a suitable lithium electrolyte salt and a new liquid co-solvent mixture for the electrolyte. The co-solvent mixture comprises a non-aqueous ionic liquid, conductive of lithium ions, and a liquid fluorinated organic ether.

Abstract: In an example of a method for making an electrode active material, a sacrificial layer is formed on a nanomaterial. Carbon is coated on the sacrificial layer to form a carbon layer. Titanium dioxide is coated on the carbon layer to form a titanium dioxide layer. The sacrificial layer is removed to form a void between the nanomaterial and the carbon layer.

Abstract: A powder coating apparatus reactor includes a loading port for a powder material, an inlet for one or more coating precursors, and a reaction chamber having an inner surface and a plurality of axial baffles. Each axial baffle extends inwardly from the inner surface of the reaction chamber of the rotary vessel. The plurality of axial baffles is configured to keep the powder material flowing within the reaction chamber during rotation of the rotary vessel to facilitate contact between the powder material and the one or more coating precursors. The powder coating apparatus further includes a rotary vacuum seal located at the loading port. The powder coating apparatus also includes a motor capable of actuating the rotary vessel about a center axis for rotation during reaction of the powder material with the coating precursors in the reaction chamber. Methods for coating powder materials with such a reactor are also provided.

Abstract: A film system includes a substrate and a film disposed on the substrate. The film includes a monolayer formed from a fluorocarbon and a plurality of regions disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorocarbon. Each of the plurality of regions includes a photocatalytic material. A method of forming a film system includes depositing a monolayer formed from a fluorocarbon onto a substrate. After depositing, the method includes ablating the monolayer to define a plurality of cavities therein, wherein each of the plurality of cavities is spaced apart from an adjacent one of the plurality of cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the plurality of cavities to form a film on the substrate and thereby form the film system.

Abstract: A powder coating apparatus reactor includes a loading port for a powder material, an inlet for one or more coating precursors, and a reaction chamber having an inner surface and a plurality of axial baffles. Each axial baffle extends inwardly from the inner surface of the reaction chamber of the rotary vessel. The plurality of axial baffles is configured to keep the powder material flowing within the reaction chamber during rotation of the rotary vessel to facilitate contact between the powder material and the one or more coating precursors. The powder coating apparatus further includes a rotary vacuum seal located at the loading port. The powder coating apparatus also includes a motor capable of actuating the rotary vessel about a center axis for rotation during reaction of the powder material with the coating precursors in the reaction chamber. Methods for coating powder materials with such a reactor are also provided.