Abstract: A liquid crystal display (LCD) device and a method for fabricating the same is disclosed, to obtain high aperture ratio and to solve the problem due to the force of gravity, which includes first and second substrates facing each other at a predetermined distance; gate and data lines crossing each other on the first substrate, to define a pixel region; a first common line substantially parallel to the gate line; a thin film transistor where the gate and data lines cross; a first insulating interlayer on an entire surface of the first substrate including the thin film transistor; an insulating layer having walls above the gate and data lines; a second common line and a common electrode in the pixel region extending in one direction, and overlapping with the gate line, the data line and the thin film transistor; and a pixel electrode in contact with a drain electrode of the thin film transistor and between the common electrodes of the pixel region at fixed intervals.

Abstract: A liquid crystal display device includes a substrate, a gate line and a data line intersected with each other to define a pixel region on the substrate, a thin film transistor having a nanowire channel layer in an intersection region of the gate line and the data line, and a pixel electrode formed in the pixel region.

Abstract: An organic electro-luminescence display device includes at least one light emission device, the organic light emission device having a first electrode; at least one thin film transistor for driving the light emission device, a pixel electrode being connected to the at least one thin film transistor; a conductive layer formed of a conductive polymer material to electrically connect the light emission device and the pixel electrode.

Abstract: A thin film transistor array substrate is provided. The thin film transistor array substrate includes a substrate; a gate pattern of a gate electrode and a gate line connected to the gate electrode on the substrate; a main gate insulating film formed of an organic material to cover the gate pattern; a semiconductor pattern overlapping the gate line such that the main gate insulating film is disposed between semiconductor patter and the gate line; a source/drain pattern on the semiconductor pattern. The source/drain pattern has a data line crossing the gate line with the main gate insulating film therebetween, a source electrode and a drain electrode, Here, the source electrode, the drain electrode and the semiconductor pattern define a thin film transistor disposed at the intersection between the gate line and the data line.

Abstract: Provided are a method of fabricating a stamp, a thin film transistor and a liquid crystal display device using the same. The stamp has an improved contact property with respect to a substrate. A charged zone is formed on the substrate using the stamp, and nano material charged with opposite charges to those of the charged zone is coated or plated to form a self-assembled monolayer (SAM). Therefore, the thin film transistor and the liquid crystal display device can have precise nano patterns, thereby improving the performance of the device.

Abstract: A method of fabricating a liquid crystal display device includes, according to an embodiment of the present invention, forming a gate electrode on a substrate, forming a gate insulating layer over the gate electrode and on the substrate, forming a first metal layer on the first semiconductor layer and a second metal layer over the first metal layer, forming source and chain electrode by patterning a separation region in the first and second metal layers, and patterning the first metal layer and the first semiconductor layer in the same pattern.

Abstract: A gate electrode (wiring) (40) having a Cu layer (40a) surrounded by a coating film (40b) made of titanium or titanium oxide; a TFT substrate (31) comprising the gate electrode (wiring) (40) and a LCD comprising a pair of opposing substrates and a liquid crystal disposed between the opposing substrates, wherein one of the pair of opposing substrates is a TFT substrate (31), are disclosed.

Abstract: A method for arraying nano material includes preparing a substrate coated with a dispersion solution where nano materials are dispersed and arraying the nano materials in the dispersion solution, in a uniform direction using a charged body.

Abstract: An array substrate for an LCD includes a substrate, a gate line, a data line, a gate electrode extending from the gate line formed on the substrate, a gate insulating layer covering the gate electrode and the substrate, a semiconductor layer formed over the gate insulating layer, a source electrode formed on the semiconductor layer extending from the data line, a drain electrode formed on the semiconductor layer facing the source electrode, a passivation layer covering the substrate including a resultant structure obtained after the source electrode and the drain electrode are formed, and a pixel electrode contacting the drain electrode through a contact hole passing through the passivation layer, wherein a portion of the gate insulating layer in a region where the gate electrode is formed is thinner than a portion of the gate insulating layer in a region where the gate line and the data line intersect with each other.

Abstract: An LCD device and a method for fabricating the same are disclosed. The LCD device includes a substrate having a pixel region. A gate electrode is formed in the pixel region. A gate insulating film is formed on the substrate including the gate electrode. A conducting layer is formed on the substrate including the gate insulating film. A semiconductor layer containing a nanosemiconductor material is formed on the conducting layer above the gate electrode. Source and drain electrodes overlap opposing sides of the semiconductor layer. A passivation layer is formed on the substrate including the source and drain electrodes. A first contact hole in the passivation layer exposes the drain electrode. A pixel electrode in the pixel region is connected to the drain electrode through the first contact hole.

Abstract: A backlight unit includes a light guide plate, at least one lamp provided at one or both sides of the light guide plate, a lamp housing surrounding the lamp, a lamp reflection plate positioned under the light guide plate to reflect light emitted from the lamp towards the light guide plate, and a polarization layer on an upper surface of the light guide plate and having an embossed pattern of protrusions and grooves on an upper surface thereof. A method for forming the backlight unit and a liquid crystal display device comprising the same are also disclosed.

Abstract: A soft mold includes a polymer layer having a printing pattern on at least a first surface thereof; and a back-plane attached to a second surface of the polymer layer.

Abstract: A soft mold and a method for fabricating the same are disclosed. A master mold that has a pattern on a substrate is first formed. A first liquid high polymer precursor is formed on the master mold and then partially cured. A support film having high UV transmittance is attached to the partially cured high polymer. The attached support film and the partially cured high polymer are treated with a coupling agent and a second liquid high polymer precursor is formed on the partially cured high polymer and the support film. The second liquid high polymer precursor and the partially cured high polymer are then fully cured to form a mold. The fully cured mold is stripped from the master mold to form a soft mold having a predetermined shape on one surface.

Abstract: A thin film transistor substrate and its fabrication method are discussed. According to an embodiment, the fabricating method of a thin film transistor substrate includes forming a gate electrode on a substrate; forming a gate insulating film on the gate electrode, the gate insulating film having a groove in an area corresponding to an area where an active layer of a thin film transistor is to be formed; forming the active layer of the thin film transistor by use of a nanowire in the groove of the gate insulating film; and forming a source electrode and a drain electrode on the active layer.

Abstract: A fabricating method for a flat panel display device having a thin film pattern over a substrate is disclosed. The fabricating method includes depositing a hydrophilic resin over a substrate and patterning the hydrophilic resin to form hydrophilic resin patterns over areas outside where thin film patterns are to be formed over the substrate. The fabricating method also includes depositing a hydrophobic nano powder thin film material over the substrate and between the hydrophilic resin patterns and removing the hydrophilic resin patterns to form hydrophobic nano powder thin film patterns over the substrate. Moreover, the fabricating method includes treating the hydrophobic nano powder thin film patterns to form the thin film pattern.

Abstract: The patterning method includes forming a synthetic resin layer on a substrate, providing a mold in which a predetermined pattern is formed and metal particles are distributed on the surface of the mold, contacting the mold having the predetermined pattern with the synthetic resin layer, transferring the pattern of the mold onto the synthetic resin layer to form a patterned synthetic resin layer, and forming an organic layer on the patterned synthetic resin layer.

Abstract: An LCD device and a method for fabricating the same is disclosed that improves a yield by decreasing processing time. The LCD device includes gate and data lines formed substantially perpendicular to each other on a substrate and defining a unit pixel region; a thin film transistor formed at a crossing of the gate and data lines; an active layer formed over the gate line, the data line, and the thin film transistor; an organic resin formed on a portion of a gate insulating layer not including the gate line, the data line, and the thin film transistor; a passivation layer formed on an entire surface of the substrate including the thin film transistor; and a pixel electrode, formed in the unit pixel region, the pixel electrode being connected with a drain electrode of the thin film transistor.

Abstract: The present invention discloses an etchant for etching at least two different metal layers, the etchant comprising hydrogen peroxide (H2O2) and one of carboxylic acid, carboxylate salt, and acetyl group (CH3CO—).

Abstract: An electro-luminescent device includes a transparent substrate, a black matrix on the transparent substrate defining a plurality of spaces, a plurality of color representing layers each arranged in respective ones of the spaces, an overcoat layer on the black matrix and the color representing layers, a plurality of first electrodes disposed on the overcoat layer in a first direction with respect to the color representing layers, a phosphor layer formed on the plurality of first electrodes, an insulating film on the phosphor layer, and a plurality of second electrodes disposed on the insulating film in a second direction perpendicular to the first direction.

Abstract: An array substrate of a liquid crystal display device, wherein picture quality is improved without decreasing aperture ratio by providing a storage capacitor of a large capacity. The array substrate of a liquid crystal display device includes a gate line formed on an array substrate and a gate electrode diverged from the gate line. A common line composed of substantially the same material as the gate line of an opaque metal is arranged parallel to the gate line. A first electrode of a storage capacitor composed of a transparent conductive material is formed on the common line. A gate insulating film covers the gate line, the gate electrode, and the first electrode of a storage capacitor. A semiconductor layer is formed to overlap the gate electrode on the gate insulating film. A source electrode and a drain electrode are arranged with a constant interval on the semiconductor layer. A data line is connected to the source electrode and is arranged perpendicularly to the gate line.