Abstract: The problem to be solved by the present invention is to provide a coating composition that can reduce the heating temperature and shorten the heating time in the coating process, and that has excellent scratch resistance and weather resistance. The present invention provides a coating composition comprising a radically polymerizable unsaturated group-containing compound (A) and a hydroxyl-containing resin (B), the compound (A) being obtained by reacting a caprolactone-modified hydroxyalkyl (meth)acrylate with a polyisocyanate compound, and having an isocyanate equivalent of 300 to 3,800.

Abstract: A process for producing a polymer, characterized in that a polymer having juts is produced by carrying out photopolymerization of at least one photopolymerizable polymerization precursor containing a photocurable compound having two or more unsaturated bonds by irradiation with active energy ray, optionally in the presence of at least one additive component for adding a polymer function, in a supercritical fluid or subcritical fluid; and a polymer having juts of 10 nm or more height, which height is 0.1-fold or more of the diameter of the juts, produced by the above process.

Abstract: A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.

Abstract: The present invention provides a specific polyepoxy compound having at least two olefin oxide groups and at least one tertiary ester group per molecule, a method for producing the compound, a thermosetting resin composition containing the compound, a cured product of the composition, and a method for removing the cured product.

Abstract: Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.

Abstract: A process for producing a polymer, characterized in that a polymer having juts is produced by carrying out photopolymerization of at least one photopolymerizable polymerization precursor containing a photocurable compound having two or more unsaturated bonds by irradiation with active energy ray, optionally in the presence of at least one additive component for adding a polymer function, in a supercritical fluid or subcritical fluid; and a polymer having juts of 10 nm or more height, which height is 0.1-fold or more of the diameter of the juts, produced by the above process.

Abstract: Disclosed is an optical waveguide-forming curable resin composition and optical waveguide-forming curable dry film which are capable of forming cured resin articles that have high heat resistance, excellent mechanical strength and high transparency, and possess properties required for forming optical waveguides, such as low thermal expansion, low transmission loss, etc. The present invention provides a curable resin composition for forming an optical waveguide, the composition comprising a hydrolyzable silyl-containing silane-modified epoxy resin (A) having an average of at least one hydrolyzable silyl group and an average of at least one epoxy group per molecule; and a resin (B) having, per molecule, an average of at least one functional group that is reactive with an epoxy group; and an optical waveguide-forming curable dry film formed using the resin composition.

Abstract: There is provided a process for purification treatment of wastewater containing an organic substance. There is provided a process for purification treatment of wastewater containing an organic substance by carrying out supercritical treatment or subcritical treatment, which comprises subjecting the wastewater to at least one solid-liquid separation pretreatment selected from separation treatment with a flocculant, sedimentation treatment, flotation treatment and filtration treatment; and then subjecting the wastewater to primary treatment as biological treatment; and subsequently purifying the wastewater by treatment including secondary treatment as supercritical treatment or subcritical treatment.

Abstract: Disclosed is an optical waveguide-forming curable resin composition and optical waveguide-forming curable dry film which are capable of forming cured resin articles that have high heat resistance, excellent mechanical strength and high transparency, and possess properties required for forming optical waveguides, such as low thermal expansion, low transmission loss, etc. The present invention provides a curable resin composition for forming an optical waveguide, the composition comprising a hydrolyzable silyl-containing silane-modified epoxy resin (A) having an average of at least one hydrolyzable silyl group and an average of at least one epoxy group per molecule; and a resin (B) having, per molecule, an average of at least one functional group that is reactive with an epoxy group; and an optical waveguide-forming curable dry film formed using the resin composition.

Abstract: A polymerization reaction apparatus is used for producing a polymer by photo-polymerizing a polymerization precursor by irradiation with an active energy ray in a supercritical fluid or subcritical fluid. The apparatus includes a reaction vessel (3), active energy ray irradiation means (6, 5), a fluid feeding means of feeding a fluid into the reaction vessel, and a fluid discharging means of discharging the fluid. The apparatus further includes [1] polymerization precursor storage parts (11, 11?) for accommodating a polymerization precursor and/or addition components to be contained in the polymer and feeding the polymerization precursor and/or addition components to a reaction field, or [2] a polymerization precursor feeding means capable of feeding a polymerization precursor and/or addition components into the reaction vessel.

Abstract: A method of fabricating an optical waveguide which comprises forming a core layer (c) on surface of a peelable substrate (a), then forming a clad layer (d) on the surface of the core layer (c) and the surface of the substrate (a), and then peeling the substrate (a) off from the core layer (c) and the clad layer (d) to fabricate an optical waveguide of which the top face (e) or the bottom face of the core layer (c) is not covered by the clad layer (d).

Abstract: There is provided a process for purification treatment of wastewater containing an organic substance. There is provided a process for purification treatment of wastewater containing an organic substance by carrying out supercritical treatment or subcritical treatment, which comprises subjecting the wastewater to at least one solid-liquid separation pretreatment selected from separation treatment with a flocculant, sedimentation treatment, flotation treatment and filtration treatment; and then subjecting the wastewater to primary treatment as biological treatment; and subsequently purifying the wastewater by treatment including secondary treatment as supercritical treatment or subcritical treatment.

Abstract: A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.

Abstract: The present invention provides a photocurable resin composition for forming an optical waveguide, the composition comprising (A) a carboxy-containing unsaturated polyurethane resin obtained by reacting a polyisocyanate compound (a), a carboxy-containing polyol (b) and a hydroxy-containing unsaturated compound (c), and (B) a solvent; a photocurable dry film for forming an optical waveguide; and an optical waveguide.

Abstract: A curable resin composition for optical waveguide comprising, as essential components, a copolymer (A) of a radical-polymerizable compound (a) having an acid anhydrous group and/or an acidic group carrying a blocked acid group, and a radical-polymerizable unsaturated group in the molecule, with other radical-polymerizable compound (b), a polymerizable unsaturated compound (B), and a polymerization initiator (C); a curable dry film for optical waveguide composed of this composition; and an optical waveguide in which at least one of a lower clad layer 13, a core part 15 and a upper clad layer 17 is formed using the same.

Abstract: Disclosed are an active energy ray-curable resin composition, wherein when the active energy ray-curable resin composition is coated onto a substrate and made into a resist film with a predetermined thickness, a ratio (Y/X) of a quantity of a transmitted active energy ray (Y) after transmission through the resist film to a quantity of an initial active energy ray (X) on the surface of the resist film is 10% or less in a spectral sensitivity wavelength range of the resist film; and a method for forming a resist pattern by using this composition.

Abstract: A method of producing a polymer according to the present invention is characterized by comprising a step of photopolymerizing one or more photopolymerizable polymerization precursors by irradiation with an activation energy ray in a supercritical fluid or in a subcritical fluid.

Abstract: A composition for activation energy rays comprising a specific vinyl ether group-containing compound (A) in which a vinyl ether group is bonded to a secondary or tertiary carbon atom, a polymer (B) having a carboxyl group and/or a hydroxyphenyl group, and a photo-acid generator compound (C) can form a resist pattern having an excellent sensitivity without carrying out any heat treatment at a temperature of 60° C. or more after irradiation.

Abstract: A method of fabricating an optical waveguide which comprises forming a core layer (c) on surface of a peelable substrate (a), then forming a clad layer (d) on the surface of the core layer (c) and the surface of the substrate (a), and then peeling the substrate (a) off from the core layer (c) and the clad layer (d) to fabricate an optical waveguide of which the top face (e) or the bottom face of the core layer (c) is not covered by the clad layer (d).

Abstract: A polymerization reaction apparatus used for producing a polymer by photo-polymerizing a polymerization precursor by irradiation with an active energy ray in a supercritical fluid or subcritical fluid, wherein the apparatus has a reaction vessel (3) allowing photo-polymerization of the above-mentioned polymerization precursor and capable of maintaining a fluid under supercritical condition or under subcritical condition, active energy ray irradiation means (6, 5) of irradiating the inside of the above-mentioned reaction vessel with the above-mentioned active energy ray, a fluid feeding means of feeding the above-mentioned fluid into the above-mentioned reaction vessel, and a fluid discharging means of discharging the above-mentioned fluid in the above-mentioned reaction vessel, and [1] the apparatus is equipped with polymerization precursor storage parts (11, 11?) for accommodating a polymerization precursor and/or addition components to be contained in the polymer, and the above-mentioned polymerization prec