Abstract: A curable resin composition for optical waveguide comprising, as essential components, a carboxyl group-containing urethane compound (A), a polymerizable unsaturated compound (B), a compound (C) containing two or more ring-opening polymerizable functional groups in the molecule, and, a radiation polymerization initiator (D); and, a method for forming an optical waveguide comprising, laminating a dry film composed of a thermosetting resin composition on the surface of a lower clad layer (I) and a core part (II) by heating, and curing this to form an upper clad layer (III), wherein Tg of the dry film is lower by 10° C. or more than Tg of the cured resin forming the core part (II), and the laminating temperature of the dry film is higher by 10° C. or more than Tg of the dry film, are disclosed.

Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): where R1 and R3 are each independently hydrogen or methyl and R2 is C1-C6 straight or branched unsubstituted alkyl or C1-C6 straight or branched substituted alkyl, wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.

Abstract: The present invention provides a negative photosensitive resin composition comprising (A) a photocurable resin having a photosensitive group or groups crosslinkable by light irradiation, (B) a photoacid generator and (C) a photosensitizer which is a benzopyran condensed ring compound capable of increasing photosensitivity to visible light with a wavelength of 480 nm or more, a negative photosensitive dry film prepared by applying the photosensitive resin composition to a surface of support film, followed by drying, to form a photosensitive resin layer, and a method of forming a pattern using the resin composition or the dry film.

Abstract: A method of producing a polymer according to the present invention is characterized by comprising a step of photopolymerizing one or more photopolymerizable polymerization precursors by irradiation with an activation energy ray in a supercritical fluid or in a subcritical fluid.

Abstract: A method of forming a resist pattern film. A positive type actinic ray decomposing and developing dry film is applied onto a surface of a coating substrate so that the surface of the coating substrate may face to the urethane resin layer of the dry film. Then, the dry film may be heat treated. The non-actinic ray-curable substrate of the dry film, then, is optionally stripped, and is heat treated if it has not already been heat treated. Then, an actinic ray is irradiated through a mask or directly onto the surface of the dry film so as to obtain an intended pattern and is optionally heat treated. The non-actinic ray-curable substrate which was not previously stripped is, then, stripped. Then, the positive type actinic ray-curable urethane resin layer is subjected to a developing treatment. Finally, an unnecessary area of the urethane resin layer to form a resist pattern film is removed.

Abstract: The present invention provides a positive photosensitive resin composition comprising (A) a positive photosensitive resin, (B) a photoacid generator and (C) a photosensitizer which is a benzopyran condensed ring compound capable of increasing photosensitivity to visible light with a wavelength of 480 nm or more; a positive photosensitive dry film prepared by applying the photosensitive resin composition to a surface of support film, followed by drying, to form a photosensitive resin layer; and a method of forming a pattern using the resin composition or the dry film.

Abstract: The present invention relates to fabricating an optimal sheet material for optical waveguide use. In this optical waveguide sheet material, optical waveguide fibers that are constituted by cores and cladding in a plastic sheet base material pass through the sheet material in the direction of thickness of the sheet material, and moreover, a plurality of optical waveguide fibers are arranged parallel to each other. The method of fabricating this sheet material includes steps of forming a plurality of optical waveguide fibers as a bundle by fusion-bonding or pressure-bonding using a plastic base material, and then forming a sheet by cutting this bundle of optical waveguide fibers such that the surface of the sheet is orthogonal to the fiber direction of the optical waveguide fibers.

Abstract: A composition for activation energy rays comprising a specific vinyl ether group-containing compound (A) in which a vinyl ether group is bonded to a secondary or tertiary carbon atom, a polymer (B) having a carboxyl group and/or a hydroxyphenyl group, and a photo-acid generator compound (C) can form a resist pattern having an excellent sensitivity without carrying out any heat treatment at a temperature of 60° C. or more after irradiation.

Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): 1

Abstract: A liquid or a solid positive type photosensitive resin composition is herein disclosed which is used under the irradiation circumstance of a safelight having a maximum wavelength within the range of 500 to 620 nm, wherein an absorbancy of an unexposed film formed from this composition is 0.

Abstract: A positive type actinic ray-curable (dry film having, on the surface of a non-actinic ray-curable substrate, a solid positive type actinic ray-curable urethane resin layer formed from (1) a resin composition containing, as essential components, (A1) an ether linkage-containing olefinicaly unsaturated compound, (B1), an acid group-containing urethane resin having a weight average molecular weight of 1,000 to 200,000 and an acid group content in the range of 0.

Abstract: A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern. (3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer, (4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.

Abstract: The present invention provides a method of forming a conductive pattern, comprising the steps of: (1) depositing a conductive coating-forming resin layer and an energy beam-sensitive coating layer on a substrate in this order; (2) irradiating a surface of the energy beam-sensitive coating layer with an active energy beam or heat rays directly or through a mask, so as to obtain a desired pattern; (3) developing the energy beam-sensitive coating layer to form a resist pattern coating from the energy beam-sensitive coating layer; and (4) removing revealed portions of the conductive coating-forming resin layer by development. The present invention also provides a method of forming a conductive pattern, comprising the step (1), the step (2), and the step of: (3′) developing the energy beam-sensitive coating layer and the conductive coating-forming resin layer simultaneously.

Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): where R1 and R3 are each independently hydrogen or methyl and R2 is C1-C6 straight or branched unsubstituted alkyl or C1-C6 straight or branched substituted alkyl, wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.

Abstract: A method of forming a resist pattern film. A positive type actinic ray decomposing and developing dry film is applied onto a surface of a coating substrate so that the surface of the coating substrate may face to the urethane resin layer of the dry film. Then, the dry film may be heat treated. The non-actinic ray-curable substrate of the dry film, then, is optionally stripped, and is heat treated if it has not already been heat treated. Then, an actinic ray is irradiated through a mask or directly onto the surface of the dry film so as to obtain an intended pattern and is optionally heat treated. The non-actinic ray-curable substrate which was not previously stripped is, then, stripped. Then, the positive type actinic ray-curable urethane resin layer is subjected to a developing treatment. Finally, an unnecessary area of the urethane resin layer to form a resist pattern film is removed.

Abstract: A positive type actinic ray-developable dry film having, on the surface of a nonactinic ray-developable substrate, a solid positive type actinic ray-developable urethane resin layer formed by coating and heat-crosslinking (1) a resin composition containing (A1) an unsaturated compound, (B1) an acid group-containing urethane resin and (C) a photo-acid generator, (2) a resin composition containing (A2) an unsaturated urethane based compound, (B2) at least one resin selected from the group consisting of (a) a carboxyl group and hydroxyphenyl group-containing polymer, (b) a carboxyl group-containing polymer and (c) a hydroxyphenyl group-containing polymer, and (C) a photo-acid generator, or (3) a resin composition containing (A2) an unsaturated urethane based compound, (B1) an acid group-containing urethane resin, and (C) a photo-acid generator. A method of forming a pattern therefrom.

Abstract: A negative actinic ray-sensitive paste prepared by adding a conductive powder and optionally a heat-fusable inorganic powder to a negative actinic ray-sensitive composition; and

Abstract: The present invention provides a method of forming a conductive pattern, comprising the steps of: (1) applying a positive, energy-sensitive paste composition containing a conductive powder to a substrate, followed by drying, to form a positive, energy-sensitive coating, (2) irradiating the coating with active energy rays or heat rays directly or through a mask so as to obtain a desired pattern, and (3) removing the irradiated part of the coating by development to form a conductive pattern coating; and a method of forming a conductive pattern, wherein the above paste composition is applied to a release film and dried, and using the resulting dry film, a conductive pattern coating is formed in a manner similar to the above.

Abstract: A liquid or a solid positive type photosensitive resin composition is herein disclosed which is used under the irradiation circumstance of a safelight having a maximum wavelength within the range of 500 to 620 nm, wherein an absorbancy of an unexposed film formed from this composition is 0.

Abstract: A liquid photocurable composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other, and optionally containing a photopolymerizable compound other than the photopolymerizable polyurethane co