Abstract: Methods and systems for ranking analysis results based on user perceived problems of a database system are described. During operation, an embodiment may receive a designation of a perceived database system performance problem from a user, wherein the problem is associated with one or more database system metrics. Next, the embodiment may determine a set of recommendations for alleviating the perceived database system performance problem. The embodiment may then analyze the set of recommendations to determine, for each recommendation in the set of recommendations, an impact the recommendation is expected to have on the one or more database system metrics. Finally, the embodiment may rank the set of recommendations according to the impact each recommendation is expected to have on the perceived database performance problem.

Abstract: Methods and systems for collecting database performance data. During operation a database server can receive a set of T-SQL statements, wherein the database server executes on a computer system and provides access to a database. Next, the database server can execute the set of T-SQL statements, thereby causing the database server to: (1) create an external script which, when executed by the computer system, collects performance data in a file; (2) execute the external script on the computer system; (3) wait for the external script to complete execution; and (4) load the performance data from the file into a table in the database.

Abstract: Methods and systems for adjusting trace filters in a database system are described. During operation, an embodiment may receive, from a user, an indication of a performance problem. Next, the embodiment may determine settings of one or more trace filters based on the indication of the performance problem. The embodiment may then collect trace data based on the one or more trace filters. While the trace data is being collected, the embodiment may perform the following set of operations one or more times: (1) obtain database system performance metrics, (2) analyze the trace data to obtain an analysis result, and (3) adjust the settings of the one or more trace filters based on the database system performance metrics and the analysis result.

Abstract: Methods and systems for identifying one or more indexes are described. A system can collect a set of database operations that were performed during a given time window. Next, the system can partition the set of database operations based on a set of database tables that were accessed by the set of database operations. Then, for each database table in the set of database tables, the system can determine a set of indexes that are candidates for improving database system performance. Next, based on the candidate indexes, the system can identify one or more indexes, one or more combinations of indexes, and/or a consolidated index that improve overall database system performance.

Abstract: Methods and systems for adjusting trace filters in a database system are described. During operation, an embodiment may receive, from a user, an indication of a performance problem. Next, the embodiment may determine settings of one or more trace filters based on the indication of the performance problem. The embodiment may then collect trace data based on the one or more trace filters. While the trace data is being collected, the embodiment may perform the following set of operations one or more times: (1) obtain database system performance metrics, (2) analyze the trace data to obtain an analysis result, and (3) adjust the settings of the one or more trace filters based on the database system performance metrics and the analysis result.

Abstract: Methods and systems for collecting performance data are described. During operation a database server can receive a set of T-SQL statements, wherein the database server executes on a computer system and provides access to a database. Next, the database server can execute the set of T-SQL statements, thereby causing the database server to: (1) create an external script which, when executed by the computer system, collects performance data in a file; (2) execute the external script on the computer system; (3) wait for the external script to complete execution; and (4) load the performance data from the file into a table in the database.

Abstract: Methods and systems for identifying one or more indexes are described. A system can collect a set of database operations that were performed during a given time window. Next, the system can partition the set of database operations based on a set of database tables that were accessed by the set of database operations. Then, for each database table in the set of database tables, the system can determine a set of indexes that are candidates for improving database system performance. Next, based on the candidate indexes, the system can identify one or more indexes, one or more combinations of indexes, and/or a consolidated index that improve overall database system performance.

Abstract: Methods and systems for ranking analysis results based on user perceived problems of a database system are described. During operation, an embodiment may receive a designation of a perceived database system performance problem from a user, wherein the problem is associated with one or more database system metrics. Next, the embodiment may determine a set of recommendations for alleviating the perceived database system performance problem. The embodiment may then analyze the set of recommendations to determine, for each recommendation in the set of recommendations, an impact the recommendation is expected to have on the one or more database system metrics. Finally, the embodiment may rank the set of recommendations according to the impact each recommendation is expected to have on the perceived database performance problem.

Abstract: A ring seal includes an annular body having a first side surface, a second side surface opposite the first side surface, a top surface, and a bottom surface opposite the top surface. A coating of silica particles is disposed on at least one of the first side surface, the second side surface, the top surface, and the bottom surface of the annular body. The coating of silica particles includes a composition comprising diatomaceous earth.

Abstract: Provided are systems and methods for overcoming optical errors occurring from reticle and other hardware usage in a semiconductor fabrication apparatus. The systems and methods minimize optical errors, such as those resulting from gravitational sag on a reticle or mask, for a pattern being projected onto a wafer. The reduced errors allow larger reticles and masks to be used—while maintaining optical accuracy; and also improve optical budget management.

Abstract: Provided are systems and methods for overcoming optical errors occurring from reticle and other hardware usage in a semiconductor fabrication apparatus. The systems and methods minimize optical errors, such as those resulting from gravitational sag on a reticle or mask, for a pattern being projected onto a wafer. The reduced errors allow larger reticles and masks to be used—while maintaining optical accuracy; and also improve optical budget management.

Abstract: A dual exposure source lithography system forms a first and a second portion of a pattern on a wafer. An optical lithography module forms the first portion of the pattern. A non-optical lithography module forms the second portion of the pattern using a non-optical lithography exposure source. The non-optical exposure source is an electron beam lithography source, an EUV source, an x-ray source, or another next generation lithography system exposure source. A mask design file is decomposed into separate design files reflecting critical and non-critical components of the pattern to be formed on the wafer.

Abstract: A photolithographic mask for receiving light at a wavelength, phase, and intensity and printing a desired image on a substrate with an optical system. The mask is formed on an optically transmissive substrate, called a mask blank. The mask blank is preferably one hundred percent transmissive of the light intensity at the wavelength. At least one layer of an attenuated material that is at least partially transmissive to the wavelength of the light is formed on the optically transmissive substrate. The at least one layer of the attenuated material preferably blocks from about fifty percent to about ninety-four percent of the intensity of the light at the wavelength, whereas the prior art masks use materials that block about six percent of the intensity of the light at the wavelength. The attenuated material defines three feature types on the mask, including a primary image having edges, a scattering bar disposed near the edges of the primary image, and a background region.

Abstract: A method of detecting contamination on a backside of a semiconductor wafer includes the steps of positioning the backside of the wafer in contact with a detection surface of a contaminant sensor, and detecting deformation of the detection surface of the contaminant sensor. The contaminant sensor may be incorporated into a fabrication device such as a wafer handling device, or can be utilized in the construction of a stand-alone device. An apparatus for detecting contamination on the backside of a semiconductor wafer is also disclosed.

Abstract: A dual exposure source lithography system forms a first and a second portion of a pattern on a wafer. An optical lithography module forms the first portion of the pattern. A non-optical lithography module forms the second portion of the pattern using a non-optical lithography exposure source. The non-optical exposure source is an electron beam lithography source, an EUV source, an x-ray source, or another next generation lithography system exposure source. A mask design file is decomposed into separate design files reflecting critical and non-critical components of the pattern to be formed on the wafer.

Abstract: Provided are systems and methods for overcoming optical errors occurring from reticle and other hardware usage in a semiconductor fabrication apparatus. The systems and methods minimize optical errors, such as those resulting from gravitational sag on a reticle or mask, for a pattern being projected onto a wafer. The reduced errors allow larger reticles and masks to be used—while maintaining optical accuracy; and also improve optical budget management.

Abstract: A photolithographic mask for receiving light at a wavelength, phase, and intensity and printing a desired image on a substrate with an optical system. The mask is formed on an optically transmissive substrate, called a mask blank. The mask blank is preferably one hundred percent transmissive of the light intensity at the wavelength. At least one layer of an attenuated material that is at least partially transmissive to the wavelength of the light is formed on the optically transmissive substrate. The at least one layer of the attenuated material preferably blocks from about fifty percent to about ninety-four percent of the intensity of the light at the wavelength, whereas the prior art masks use materials that block about six percent of the intensity of the light at the wavelength. The attenuated material defines three feature types on the mask, including a primary image having edges, a scattering bar disposed near the edges of the primary image, and a background region.

Abstract: A method to improve the resolution of a photolithography system by using one or more coupling layers between a photo resist and an anti-reflective coating. The coupling layer(s) compensate for a mis-match in indexes of reflection between the photo resist and anti-reflective coating and minimize the amount of energy which is reflected back into the photo resist, thereby improving the quality of the resulting image which is formed on the photo resist during the process.

Abstract: A method of detecting contamination on a backside of a semiconductor wafer includes the steps of positioning the backside of the wafer in contact with a detection surface of a contaminant sensor, and detecting deformation of the detection surface of the contaminant sensor. The contaminant sensor may be incorporated into a fabrication device such as a wafer handling device, or can be utilized in the construction of a stand-alone device. An apparatus for detecting contamination on the backside of a semiconductor wafer is also disclosed.

Abstract: A mask for use in a photolithographic process. The mask includes a plate or substrate having first and second opposite surfaces, a first image on the first surface of the substrate and a second image on the second surface of the substrate. When the mask is used in a photolithographic process, energy is reflected by the first image prior to entering the substrate and energy is reflected by the second image after passing through the substrate.