Abstract: A system and method for processing a surface of a semiconductor workpiece. The system comprises a workpiece surface influencing device, a workpiece carrier, and an electrode. The workpiece surface influencing device has an abrasive processing surface and is magnetically biased toward the workpiece surface to be processed. The workpiece surface influencing device has a plurality of openings through which process solution may flow to wet the surface of a workpiece to be processed. Conductive material may be either deposited on the workpiece surface or removed from the workpiece surface. The system may include an electrical contact touching the workpiece and an electrode immersed in processing solution for electrochemically processing the workpiece surface.

Abstract: A graft system is provided that includes either a support ring or a support sleeve that is used in providing transitional support to either an end or a side of a graft or a host vessel. The support ring is provided with a generally cylindrical wall and defining a passageway that is adapted for receiving an end of a vein graft or an end of a host vessel. The support ring has a first end and a second end, with the thickness of the wall being greater at the first end than at the second end. The support sleeve is provided with a first side edge, a second side edge, and an opening. The support sleeve surrounds a side opening of a graft or host vessel so that the opening of the support sleeve is aligned with the side opening of the graft or host vessel. The thickness of the support sleeve is greater at the opening than at the first and second side edges.

Abstract: A suture ring for a rotatable artificial heart valve apparatus has a ring member covered by a fabric material. A portion of the fabric material covers a portion of the inner surface of the ring member. At least one protuberance is formed on the inner surface of the ring member so as to mitigate the frictional resistance to rotation which results from compression of the fabric between the suture ring and the heart valve. Thus, desirable rotation of the heart valve relative to the suture ring is assured over a range of thicknesses of the fabric material.

Abstract: A graft system is provided that includes either a support ring or a support sleeve that is used in providing transitional support to either an end or a side of a graft or a host vessel. The support ring is provided with a generally cylindrical wall and defining a passageway that is adapted for receiving an end of a vein graft or an end of a host vessel. The support ring has a first end and a second end, with the thickness of the wall being greater at the first end than at the second end. The support sleeve is provided with a first side edge, a second side edge, and an opening. The support sleeve surrounds a side opening of a graft or host vessel so that the opening of the support sleeve is aligned with the side opening of the graft or host vessel. The thickness of the support sleeve is greater at the opening than at the first and second side edges.

Abstract: A suture ring for a rotatable artificial heart valve apparatus has a ring member covered by a fabric material. A portion of the fabric material covers a portion of the inner surface of the ring member. At least one protuberance is formed on the inner surface of the ring member so as to mitigate the frictional resistance to rotation which results from compression of the fabric between the suture ring and the heart valve. Thus, desirable rotation of the heart valve relative to the suture ring is assured over a range of thicknesses of the fabric material.