Abstract: A composition is provided that is capable of forming an NZP or an NZP-type coating. The composition includes a first composition, a second composition, and a metal cation. The first composition and the second composition form a crystalline structure with three-dimensional network of octahedra and tetrahedra linked by one or more shared atoms. The first composition comprises one or more of Zr, V, Ta, Nb, Hf, Ti, Al, Cr, or a metal of the Lanthanide series. The second composition comprises at least one of phosphorus, silicon, boron, vanadium or aluminum. The one or more shared atoms comprise at least one of oxygen, nitrogen, or carbon. The first composition and the second composition are related as shown by the formula (first composition)2 (second composition)x (shared atom)12?x. The metal cation is disposed within an interstitial site defined by the crystalline structure.

Abstract: A method of forming a hydrogenated amorphous germanium carbon (?-GeCx:H) film on a surface of an infrared (IR) transmissive material such as a chalcogenide is provided. The method includes positioning an IR transmissive material in a reactor chamber of a parallel plate plasma reactor and thereafter depositing a hydrogenated amorphous germanium carbon (?-GeCx:H) film on a surface of the IR transmissive material. The depositing is performed at a substrate temperature of about 130° C. or less and in the presence of a plasma which is derived from a gas mixture including a source of germanium, an inert gas, and optionally hydrogen. Optical transmissive components, such as IR sensors and windows, that have improved abrasion-resistance are also provided.

Abstract: An all-optical switching array for switching a direction of optical signals is presented. The all-optical switching array includes a first substrate. Furthermore, the all-optical switching array includes a plurality of optical switches disposed on the first substrate, wherein each of the plurality of optical switches comprises a first state and a second state and is configured to change the direction of an optical signal, depending on whether the optical switch is in the first state or the second state. The transition of the switch between the first state and the second state is triggered by an ultra-fast laser beam.

Abstract: A method of forming a hydrogenated amorphous germanium carbon (a-GeCx:H) film on a surface of an infrared (IR) transmissive material such as a chalcogenide is provided. The method includes positioning an IR transmissive material in a reactor chamber of a parallel plate plasma reactor and thereafter depositing a hydrogenated amorphous germanium carbon (a-GeCx:H) film on a surface of the IR transmissive material. The depositing is performed at a substrate temperature of about 130° C. or less and in the presence of a plasma which is derived from a gas mixture including a source of germanium, an inert gas, and optionally hydrogen. Optical transmissive components, such as IR sensors and windows, that have improved abrasion-resistance are also provided.

Abstract: An optical monitoring system for a plasma enhanced chemical vapor deposition (PECVD) apparatus includes a light source for generating an input light beam, and a first port configured within the PECVD apparatus for receiving the input light beam from the light source. The first port is configured to direct the input beam upon a workpiece within the PECVD apparatus. A second port is configured within the PECVD apparatus for receiving an output light beam passed through the workpiece, and a comparing mechanism for comparing the output light beam with the input light beam is configured to determine a deposited layer thickness upon the workpiece.

Abstract: A method of forming a hydrogenated amorphous germanium carbon (a-Gecx:H) film on a surface of an infrared (IR) transmissive material such as a chalcogenide is provided. The method includes positioning an IR transmissive material in a reactor chamber of a parallel plate plasma reactor and thereafter depositing a hydrogenated amorphous germanium carbon (a-GeCx:H) film on a surface of the IR transmissive material. The depositing is performed at a substrate temperature of about 130 ° C. or less and in the presence of a plasma which is derived from a gas mixture including a source of germanium, an inert gas, and optionally hydrogen. Optical transmissive components, such as IR sensors and windows, that have improved abrasion-resistance are also provided.

Abstract: An optically coated article comprising a polymeric substrate, such as aromatic polycarbonate, and a plurality of optical coating layers comprising alternate layers of silicon dioxide and amorphous hydrogenated silicon or variations thereof, produced by plasma enhanced chemical vapor deposition. The article is characterized by essentially constant optical characteristics over a wide temperature range.

Abstract: A detector includes a filter for substantially blocking photons having wavelengths greater than about 250 nm. A photodiode has a low dark current less than about 0.4 pA/cm2. A current from the photodiode is proportional to a quantity of photons having wavelengths less than or equal to about 250 nm which pass through the filter and impinge the photodiode. A processor determines the quantity of photons impinging the photodiode as a function of the current. In a preferred embodiment, the photodiode is a SiC photodiode.

Abstract: An optically coated article comprising a polymeric substrate, such as aromatic polycarbonate, and a plurality of optical coating layers comprising alternate layers of silicon dioxide and amorphous hydrogenated silicon or variations thereof, produced by plasma enhanced chemical vapor deposition. The article is characterized by essentially constant optical characteristics over a wide temperature range.

Abstract: A method for forming coatings of constant thickness on sheets of dielectric substrate (10), which may be curved, includes the step of adhesively applying foil (12) to one side of the dielectric substrate. An electrode (16) is set at a constant distance (D) from the side (10fs) of the substrate to be coated. If the substrate is curved, the electrode is preferably also curved. The region to be coated is evacuated, gaseous precursor materials are infused into the gap, and voltage is applied between the foil (12) and the electrode (16) sufficient to ionize the precursors to a plasma state, whereupon the deposition occurs. The foil may be applied as an adhesive-backed foil. The adhesive may be electrically conductive.