Patents by Inventor George W. Orsula

George W. Orsula has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer having inert blocking groups
    Patent number: 5541263
    Abstract: An alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The polymer is used for the formulation of acid hardening photoresists and the presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
    Type: Grant
    Filed: March 16, 1995
    Date of Patent: July 30, 1996
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula, Mark D. Denison, Roger Sinta, Sheri L. Ablaza
  • Radiation sensitive composition comprising polymer having inert blocking groups
    Patent number: 5514520
    Abstract: A photoresist composition consisting of an acid or base generator, a crosslinking agent activated in the presence of an acid or base and an alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
    Type: Grant
    Filed: March 16, 1995
    Date of Patent: May 7, 1996
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula, Mark D. Denison, Roger Sinta, Sheri L. Ablaza
  • Method of forming relief image having line width less than 0.35 microns utilizing copolymer binder having phenolic and nonaromatic cyclic alcohol units
    Patent number: 5368993
    Abstract: The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.
    Type: Grant
    Filed: April 15, 1994
    Date of Patent: November 29, 1994
    Assignee: Shipley Company Inc.
    Inventors: James W. Thackeray, Mark Denison, George W. Orsula
  • Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent
    Patent number: 5340696
    Abstract: The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.
    Type: Grant
    Filed: January 29, 1993
    Date of Patent: August 23, 1994
    Assignee: Shipley Company Inc.
    Inventors: James W. Thackeray, Mark Denison, George W. Orsula
  • Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
    Patent number: 5210000
    Abstract: A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.
    Type: Grant
    Filed: February 6, 1992
    Date of Patent: May 11, 1993
    Assignee: Shipley Company Inc.
    Inventors: James Thackeray, George W. Orsula, Roger Sinta
  • Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
    Patent number: 5128232
    Abstract: A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.
    Type: Grant
    Filed: May 22, 1989
    Date of Patent: July 7, 1992
    Assignee: Shiply Company Inc.
    Inventors: James Thackeray, George W. Orsula, Roger Sinta