Patents by Inventor Gerard Nicolaas Anne van Veen
Gerard Nicolaas Anne van Veen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240242929Abstract: Improved detectors for microscopy are described herein. In one aspect, an apparatus can include: a plurality of electronic units arranged in an array; a plurality of pixels, each pixel of the plurality of pixels coupled to an associated electronic unit of the plurality of electronic units, wherein a first subset of pixels of the plurality of pixels is formed from a first material, and wherein a second subset of pixels of the plurality of pixels is formed from a second material, the first material being different than the second material, and a plurality of electrical connections disposed between the plurality of electronic units and the plurality of pixels, where each electrical connection connects respective electronic units with an associated pixel.Type: ApplicationFiled: December 21, 2023Publication date: July 18, 2024Inventors: Luigi Mele, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer
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Patent number: 10971326Abstract: A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.Type: GrantFiled: September 16, 2019Date of Patent: April 6, 2021Assignee: FEI CompanyInventors: Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer, Erik Rene Kieft, Gerard Nicolaas Anne van Veen
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Patent number: 10832901Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.Type: GrantFiled: May 28, 2019Date of Patent: November 10, 2020Assignee: FEI CompanyInventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
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Patent number: 10651005Abstract: A source assembly for ion beam production is disclosed herein. An example source assembly may include a pair of plates separated by a distance, with each plate having an aperture, and the respective apertures aligned, and an ionization space defined at least by the distance and the respective apertures, where a ratio of the distance to an ionic mean free path of a gas in the ionization space is greater than one.Type: GrantFiled: January 30, 2018Date of Patent: May 12, 2020Assignee: FEI CompanyInventors: Leon van Kouwen, Gerard Nicolaas Anne van Veen
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Publication number: 20200090899Abstract: A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.Type: ApplicationFiled: September 16, 2019Publication date: March 19, 2020Applicant: FEI CompanyInventors: Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer, Erik Rene Kieft, Gerard Nicolaas Anne van Veen
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Publication number: 20190341243Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.Type: ApplicationFiled: May 28, 2019Publication date: November 7, 2019Applicant: FEI CompanyInventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
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Patent number: 10453647Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles that is subject to beam current fluctuations; Employing a beam current sensor, located between said source and specimen holder, to intercept a part of the beam and produce an intercept signal proportional to a current of the intercepted part of the beam, the beam current sensor comprising a hole arranged to pass a beam probe with an associated probe current; Scanning said probe over the specimen, thereby irradiating the specimen with a specimen current, with a dwell time associated with each scanned location on the specimen; Using a detector to detect radiation emanating from the specimen in response to irradiation by said probe, and producing an associated detector signal; Using said intercept signal as input to a compensator to suppress an effect of said current fluctuations in said detector signal, wherein: The beam currentType: GrantFiled: February 16, 2017Date of Patent: October 22, 2019Assignee: FEI COMPANYInventors: Ali Mohammadi-Gheidari, Luigi Mele, Peter Christiaan Tiemeijer, Gerard Nicolaas Anne van Veen, Hendrik Nicolaas Slingerland
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Publication number: 20180233322Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles that is subject to beam current fluctuations; Employing a beam current sensor, located between said source and specimen holder, to intercept a part of the beam and produce an intercept signal proportional to a current of the intercepted part of the beam, the beam current sensor comprising a hole arranged to pass a beam probe with an associated probe current; Scanning said probe over the specimen, thereby irradiating the specimen with a specimen current, with a dwell time associated with each scanned location on the specimen; Using a detector to detect radiation emanating from the specimen in response to irradiation by said probe, and producing an associated detector signal; Using said intercept signal as input to a compensator to suppress an effect of said current fluctuations in said detector signal, wherein: The beam currentType: ApplicationFiled: February 16, 2017Publication date: August 16, 2018Applicant: FEI CompanyInventors: Ali Mohammadi Gheidari, Luigi Mele, Peter Christiaan Tiemeijer, Gerard Nicolaas Anne van Veen, Hendrik Nicolaas Slingerland
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Publication number: 20180218875Abstract: A source assembly for ion beam production is disclosed herein. An example source assembly may include a pair of plates separated by a distance, with each plate having an aperture, and the respective apertures aligned, and an ionization space defined at least by the distance and the respective apertures, where a ratio of the distance to an ionic mean free path of a gas in the ionization space is greater than one.Type: ApplicationFiled: January 30, 2018Publication date: August 2, 2018Applicant: FEI CompanyInventors: Leon van Kouwen, Gerard Nicolaas Anne van Veen
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Patent number: 9941094Abstract: A source assembly for producing an ion beam and comprising a collision ionization ion source having: A pair of stacked plates, sandwiched about an intervening gap; An ionization space between said plates, connected to a gas supply duct; An input zone, provided in a first of said plates, to admit an input beam of charged particles to said ionization space; An output aperture, located opposite said input zone and provided in the second of said plates, to allow emission of a flux of ions produced in said ionization space by said input beam, which source assembly comprises: A carrier provided with a plurality of different collision ionization ion sources that mutually differ in respect of a gap height d between said plates; A selecting device, which allows a given one of said ion sources to be individually selected for production of said ion beam.Type: GrantFiled: February 1, 2017Date of Patent: April 10, 2018Assignee: FEI CompanyInventors: Leon van Kouwen, Gerard Nicolaas Anne van Veen
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Patent number: 9812287Abstract: An improved spectroscopic analysis apparatus and method are disclosed, comprising directing a beam of radiation onto a measurement location on a specimen, thereby causing a flux of X-rays to emanate from this location; examining the X-ray flux using a detector arrangement, thus acquiring a spectrum; choosing a set of different measurement directions originating from the location; recording outputs from the detector arrangement for different measurement directions; adopting a spectral model that is a convoluted mix of terms B and Lp, where B is the Bremsstrahlung background spectrum and Lp comprises spectral lines corresponding to the specimen composition at the measurement location; and then automatically deconvolving the set of measurements on the basis of the spectral model to calculate Lp to determine the chemical composition of the specimen at the measurement location. The method includes corrections for differential X-ray absorption within the specimen along the different measurement directions.Type: GrantFiled: December 29, 2015Date of Patent: November 7, 2017Assignee: FEI CompanyInventors: Cornelis Sander Kooijman, Thijs Thomas Withaar, Gerard Nicolaas Anne van Veen
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Patent number: 9778377Abstract: A Transmission Charged-Particle Microscope comprises a source of charged particles which are then directed by an illuminator onto a specimen supported by a specimen holder. Charged particles transmitted through the specimen may undergo energy loss with a distribution of losses providing information about the specimen. A dispersing device disperses the transmitted charged particles into an energy-resolved array of spectral sub-beams distributed along a dispersion direction. The dispersed charged particles are detected by a detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.Type: GrantFiled: March 17, 2016Date of Patent: October 3, 2017Assignee: FEI CompanyInventors: Luigi Mele, Albertus Aemillius Seyno Sluijterman, Gerard Nicolaas Anne van Veen
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Patent number: 9741529Abstract: A micro-chamber for inspecting sample material can be filled with sample material immersed in a liquid without the need of applying vacuum tubing's to the micro-chamber. The micro-chamber includes an inspection volume for holding the sample material for observation. The inspection volume is defined by a first rigid layer, a second rigid layer spaced from the first rigid layer, and a hermetic seal between the first and the second rigid layers. One of the rigid layers includes thin part can be punctured. The liquid with immersed sample material, when placed upon the thin part, is sucked into the evacuated inspection volume when the thin part is punctured.Type: GrantFiled: July 27, 2016Date of Patent: August 22, 2017Assignee: FEI CompanyInventors: Luigi Mele, Pleun Dona, Gerard Nicolaas Anne van Veen
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Patent number: 9620330Abstract: A method and apparatus for imaging a specimen using a scanning-type microscope, by irradiating a specimen with a beam of radiation using a scanning motion, and detecting a flux of radiation emanating from the specimen in response to the irradiation, in the first sampling session {S1} of a set {Sn}, gathering data from a first collection of sparsely distributed sampling points {P1} of set {Pn}. A mathematical registration correction is made to compensate for drift mismatches between different members of the set {Pn}, and an image of the specimen is assembled using the set {Pn} as input to an integrative mathematical reconstruction procedure.Type: GrantFiled: June 18, 2015Date of Patent: April 11, 2017Assignee: FEI CompanyInventors: Pavel Poto{hacek over (c)}ek, Cornelis Sander Kooijman, Hendrik Nicolaas Slingerland, Gerard Nicolaas Anne van Veen, Faysal Boughorbel
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Publication number: 20170032928Abstract: A micro-chamber for inspecting a sample material immersed in a liquid and a method for filling such a chamber are described. The sample chamber includes an inspection volume for holding the sample material, the inspection volume defined by first and second rigid layers, with a hermetic seal between the layers. The inspection volume within the sample chamber is evacuated. Prior to filling the inspection volume, a thin part of at least one of the rigid layers separates the inspection volume from the outside, the thin part being equipped to be punctured. The liquid with immersed sample material is placed upon the thin part and the thin part is then punctured, resulting in sample material entering the inspection volume.Type: ApplicationFiled: July 27, 2016Publication date: February 2, 2017Applicant: FEI CompanyInventors: Luigi Mele, Pleun Dona, Gerard Nicolaas Anne van Veen
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Publication number: 20160276130Abstract: A Transmission Charged-Particle Microscope, comprising: A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a spectroscopic apparatus comprising: A dispersing device, for dispersing said flux into an energy-resolved array of spectral sub-beams distributed along a dispersion direction; A detector, said detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.Type: ApplicationFiled: March 17, 2016Publication date: September 22, 2016Applicant: FEI CompanyInventors: Luigi Mele, Albertus Aemillius Seyno Sluijterman, Gerard Nicolaas Anne van Veen
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Publication number: 20160189922Abstract: A spectroscopic analysis method, comprising: Directing a beam of radiation onto a location P on a specimen, thereby causing a flux of X-rays to emanate from said location; Examining said flux using a detector arrangement, thus accruing a measured spectrum; Choosing a set of mutually different measurement directions d={dn} that originate from P, where n is a member of an integer sequence; Recording an output On of said detector arrangement for different values of dn, thus compiling a measurement set M={(On, dn)}; Adopting a spectral model On? for On that is a convoluted mix of terms Band Lp, where: B is a substantially continuous spectral component associated with Bremsstrahlung; Lp is a substantially discrete spectral component associated with the specimen composition at location P; automatically deconvolving the measurement set Mon the basis of said spectral model On? and distill Lp therefrom.Type: ApplicationFiled: December 29, 2015Publication date: June 30, 2016Applicant: FEI CompanyInventors: Cornelis Sander Kooijman, Thijs Thomas Withaar, Gerard Nicolaas Anne Van Veen
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Publication number: 20160056015Abstract: A pixelated CMOS radiation sensor (e.g. in a 4T pinned photodiode device) that comprises a layered structure including: A p-type Si substrate; An n-doped region within said substrate; A p+-doped pinning layer that overlies said n-doped region; An SiOx layer that overlies said p+-doped pinning layer and serves as a Pre-Metal Dielectric or Inter-Metal Dielectric layer, in which a Boron film is deposited between said p+-doped pinning layer and said SiOx layer. Application of such a (pure) Boron film serves to reduce leakage current by one or more orders of magnitude. Even a relatively thin Boron film (e.g. thickness 1-2 nm) can produce this effect.Type: ApplicationFiled: August 24, 2015Publication date: February 25, 2016Applicant: FEI COMPANYInventors: Gerard Nicolaas Anne van Veen, Cornelis Sander Kooijman, Luc Roger Simonne Haspeslagh
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Patent number: 8450820Abstract: The invention discloses a process for manufacturing a radiation detector for detecting e.g. 200 eV electrons. This makes the detector suited for e.g. use in an Scanning Electron Microscope. The detector is a PIN photodiode with a thin layer of pure boron connected to the p+-diffusion layer. The boron layer is connected to an electrode with an aluminium grid to form a path of low electrical resistance between each given point of the boron layer and the electrode. The invention addresses forming the aluminium grid on the boron layer without damaging the boron layer.Type: GrantFiled: January 13, 2011Date of Patent: May 28, 2013Inventors: Lis Karen Nanver, Thomas Ludovicus Maria Scholtes, Agata {hacek over (S)}akić, Cornelis Sander Kooijman, Gerard Nicolaas Anne van Veen
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Publication number: 20110169116Abstract: The invention discloses a process for manufacturing a radiation detector for detecting e.g. 200 eV electrons. This makes the detector suited for e.g. use in an Scanning Electron Microscope. The detector is a PIN photodiode with a thin layer of pure boron connected to the p+-diffusion layer. The boron layer is connected to an electrode with an aluminium grid to form a path of low electrical resistance between each given point of the boron layer and the electrode. The invention addresses forming the aluminium grid on the boron layer without damaging the boron layer.Type: ApplicationFiled: January 13, 2011Publication date: July 14, 2011Applicant: FEI CompanyInventors: Lis Karen Nanver, Thomas Ludovicus Maria Scholtes, Agata Sakic, Cornelis Sander Kooijman, Gerard Nicolaas Anne van Veen