Patents by Inventor Gerard Nicolaas Anne van Veen

Gerard Nicolaas Anne van Veen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10971326
    Abstract: A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: April 6, 2021
    Assignee: FEI Company
    Inventors: Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer, Erik Rene Kieft, Gerard Nicolaas Anne van Veen
  • Patent number: 10832901
    Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: November 10, 2020
    Assignee: FEI Company
    Inventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
  • Patent number: 10651005
    Abstract: A source assembly for ion beam production is disclosed herein. An example source assembly may include a pair of plates separated by a distance, with each plate having an aperture, and the respective apertures aligned, and an ionization space defined at least by the distance and the respective apertures, where a ratio of the distance to an ionic mean free path of a gas in the ionization space is greater than one.
    Type: Grant
    Filed: January 30, 2018
    Date of Patent: May 12, 2020
    Assignee: FEI Company
    Inventors: Leon van Kouwen, Gerard Nicolaas Anne van Veen
  • Publication number: 20200090899
    Abstract: A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.
    Type: Application
    Filed: September 16, 2019
    Publication date: March 19, 2020
    Applicant: FEI Company
    Inventors: Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer, Erik Rene Kieft, Gerard Nicolaas Anne van Veen
  • Publication number: 20190341243
    Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.
    Type: Application
    Filed: May 28, 2019
    Publication date: November 7, 2019
    Applicant: FEI Company
    Inventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
  • Patent number: 10453647
    Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles that is subject to beam current fluctuations; Employing a beam current sensor, located between said source and specimen holder, to intercept a part of the beam and produce an intercept signal proportional to a current of the intercepted part of the beam, the beam current sensor comprising a hole arranged to pass a beam probe with an associated probe current; Scanning said probe over the specimen, thereby irradiating the specimen with a specimen current, with a dwell time associated with each scanned location on the specimen; Using a detector to detect radiation emanating from the specimen in response to irradiation by said probe, and producing an associated detector signal; Using said intercept signal as input to a compensator to suppress an effect of said current fluctuations in said detector signal, wherein: The beam current
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: October 22, 2019
    Assignee: FEI COMPANY
    Inventors: Ali Mohammadi-Gheidari, Luigi Mele, Peter Christiaan Tiemeijer, Gerard Nicolaas Anne van Veen, Hendrik Nicolaas Slingerland
  • Publication number: 20180233322
    Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles that is subject to beam current fluctuations; Employing a beam current sensor, located between said source and specimen holder, to intercept a part of the beam and produce an intercept signal proportional to a current of the intercepted part of the beam, the beam current sensor comprising a hole arranged to pass a beam probe with an associated probe current; Scanning said probe over the specimen, thereby irradiating the specimen with a specimen current, with a dwell time associated with each scanned location on the specimen; Using a detector to detect radiation emanating from the specimen in response to irradiation by said probe, and producing an associated detector signal; Using said intercept signal as input to a compensator to suppress an effect of said current fluctuations in said detector signal, wherein: The beam current
    Type: Application
    Filed: February 16, 2017
    Publication date: August 16, 2018
    Applicant: FEI Company
    Inventors: Ali Mohammadi Gheidari, Luigi Mele, Peter Christiaan Tiemeijer, Gerard Nicolaas Anne van Veen, Hendrik Nicolaas Slingerland
  • Publication number: 20180218875
    Abstract: A source assembly for ion beam production is disclosed herein. An example source assembly may include a pair of plates separated by a distance, with each plate having an aperture, and the respective apertures aligned, and an ionization space defined at least by the distance and the respective apertures, where a ratio of the distance to an ionic mean free path of a gas in the ionization space is greater than one.
    Type: Application
    Filed: January 30, 2018
    Publication date: August 2, 2018
    Applicant: FEI Company
    Inventors: Leon van Kouwen, Gerard Nicolaas Anne van Veen
  • Patent number: 9941094
    Abstract: A source assembly for producing an ion beam and comprising a collision ionization ion source having: A pair of stacked plates, sandwiched about an intervening gap; An ionization space between said plates, connected to a gas supply duct; An input zone, provided in a first of said plates, to admit an input beam of charged particles to said ionization space; An output aperture, located opposite said input zone and provided in the second of said plates, to allow emission of a flux of ions produced in said ionization space by said input beam, which source assembly comprises: A carrier provided with a plurality of different collision ionization ion sources that mutually differ in respect of a gap height d between said plates; A selecting device, which allows a given one of said ion sources to be individually selected for production of said ion beam.
    Type: Grant
    Filed: February 1, 2017
    Date of Patent: April 10, 2018
    Assignee: FEI Company
    Inventors: Leon van Kouwen, Gerard Nicolaas Anne van Veen
  • Patent number: 9812287
    Abstract: An improved spectroscopic analysis apparatus and method are disclosed, comprising directing a beam of radiation onto a measurement location on a specimen, thereby causing a flux of X-rays to emanate from this location; examining the X-ray flux using a detector arrangement, thus acquiring a spectrum; choosing a set of different measurement directions originating from the location; recording outputs from the detector arrangement for different measurement directions; adopting a spectral model that is a convoluted mix of terms B and Lp, where B is the Bremsstrahlung background spectrum and Lp comprises spectral lines corresponding to the specimen composition at the measurement location; and then automatically deconvolving the set of measurements on the basis of the spectral model to calculate Lp to determine the chemical composition of the specimen at the measurement location. The method includes corrections for differential X-ray absorption within the specimen along the different measurement directions.
    Type: Grant
    Filed: December 29, 2015
    Date of Patent: November 7, 2017
    Assignee: FEI Company
    Inventors: Cornelis Sander Kooijman, Thijs Thomas Withaar, Gerard Nicolaas Anne van Veen
  • Patent number: 9778377
    Abstract: A Transmission Charged-Particle Microscope comprises a source of charged particles which are then directed by an illuminator onto a specimen supported by a specimen holder. Charged particles transmitted through the specimen may undergo energy loss with a distribution of losses providing information about the specimen. A dispersing device disperses the transmitted charged particles into an energy-resolved array of spectral sub-beams distributed along a dispersion direction. The dispersed charged particles are detected by a detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.
    Type: Grant
    Filed: March 17, 2016
    Date of Patent: October 3, 2017
    Assignee: FEI Company
    Inventors: Luigi Mele, Albertus Aemillius Seyno Sluijterman, Gerard Nicolaas Anne van Veen
  • Patent number: 9741529
    Abstract: A micro-chamber for inspecting sample material can be filled with sample material immersed in a liquid without the need of applying vacuum tubing's to the micro-chamber. The micro-chamber includes an inspection volume for holding the sample material for observation. The inspection volume is defined by a first rigid layer, a second rigid layer spaced from the first rigid layer, and a hermetic seal between the first and the second rigid layers. One of the rigid layers includes thin part can be punctured. The liquid with immersed sample material, when placed upon the thin part, is sucked into the evacuated inspection volume when the thin part is punctured.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: August 22, 2017
    Assignee: FEI Company
    Inventors: Luigi Mele, Pleun Dona, Gerard Nicolaas Anne van Veen
  • Patent number: 9620330
    Abstract: A method and apparatus for imaging a specimen using a scanning-type microscope, by irradiating a specimen with a beam of radiation using a scanning motion, and detecting a flux of radiation emanating from the specimen in response to the irradiation, in the first sampling session {S1} of a set {Sn}, gathering data from a first collection of sparsely distributed sampling points {P1} of set {Pn}. A mathematical registration correction is made to compensate for drift mismatches between different members of the set {Pn}, and an image of the specimen is assembled using the set {Pn} as input to an integrative mathematical reconstruction procedure.
    Type: Grant
    Filed: June 18, 2015
    Date of Patent: April 11, 2017
    Assignee: FEI Company
    Inventors: Pavel Poto{hacek over (c)}ek, Cornelis Sander Kooijman, Hendrik Nicolaas Slingerland, Gerard Nicolaas Anne van Veen, Faysal Boughorbel
  • Publication number: 20170032928
    Abstract: A micro-chamber for inspecting a sample material immersed in a liquid and a method for filling such a chamber are described. The sample chamber includes an inspection volume for holding the sample material, the inspection volume defined by first and second rigid layers, with a hermetic seal between the layers. The inspection volume within the sample chamber is evacuated. Prior to filling the inspection volume, a thin part of at least one of the rigid layers separates the inspection volume from the outside, the thin part being equipped to be punctured. The liquid with immersed sample material is placed upon the thin part and the thin part is then punctured, resulting in sample material entering the inspection volume.
    Type: Application
    Filed: July 27, 2016
    Publication date: February 2, 2017
    Applicant: FEI Company
    Inventors: Luigi Mele, Pleun Dona, Gerard Nicolaas Anne van Veen
  • Publication number: 20160276130
    Abstract: A Transmission Charged-Particle Microscope, comprising: A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a spectroscopic apparatus comprising: A dispersing device, for dispersing said flux into an energy-resolved array of spectral sub-beams distributed along a dispersion direction; A detector, said detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.
    Type: Application
    Filed: March 17, 2016
    Publication date: September 22, 2016
    Applicant: FEI Company
    Inventors: Luigi Mele, Albertus Aemillius Seyno Sluijterman, Gerard Nicolaas Anne van Veen
  • Publication number: 20160189922
    Abstract: A spectroscopic analysis method, comprising: Directing a beam of radiation onto a location P on a specimen, thereby causing a flux of X-rays to emanate from said location; Examining said flux using a detector arrangement, thus accruing a measured spectrum; Choosing a set of mutually different measurement directions d={dn} that originate from P, where n is a member of an integer sequence; Recording an output On of said detector arrangement for different values of dn, thus compiling a measurement set M={(On, dn)}; Adopting a spectral model On? for On that is a convoluted mix of terms Band Lp, where: B is a substantially continuous spectral component associated with Bremsstrahlung; Lp is a substantially discrete spectral component associated with the specimen composition at location P; automatically deconvolving the measurement set Mon the basis of said spectral model On? and distill Lp therefrom.
    Type: Application
    Filed: December 29, 2015
    Publication date: June 30, 2016
    Applicant: FEI Company
    Inventors: Cornelis Sander Kooijman, Thijs Thomas Withaar, Gerard Nicolaas Anne Van Veen
  • Publication number: 20160056015
    Abstract: A pixelated CMOS radiation sensor (e.g. in a 4T pinned photodiode device) that comprises a layered structure including: A p-type Si substrate; An n-doped region within said substrate; A p+-doped pinning layer that overlies said n-doped region; An SiOx layer that overlies said p+-doped pinning layer and serves as a Pre-Metal Dielectric or Inter-Metal Dielectric layer, in which a Boron film is deposited between said p+-doped pinning layer and said SiOx layer. Application of such a (pure) Boron film serves to reduce leakage current by one or more orders of magnitude. Even a relatively thin Boron film (e.g. thickness 1-2 nm) can produce this effect.
    Type: Application
    Filed: August 24, 2015
    Publication date: February 25, 2016
    Applicant: FEI COMPANY
    Inventors: Gerard Nicolaas Anne van Veen, Cornelis Sander Kooijman, Luc Roger Simonne Haspeslagh
  • Patent number: 8450820
    Abstract: The invention discloses a process for manufacturing a radiation detector for detecting e.g. 200 eV electrons. This makes the detector suited for e.g. use in an Scanning Electron Microscope. The detector is a PIN photodiode with a thin layer of pure boron connected to the p+-diffusion layer. The boron layer is connected to an electrode with an aluminium grid to form a path of low electrical resistance between each given point of the boron layer and the electrode. The invention addresses forming the aluminium grid on the boron layer without damaging the boron layer.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: May 28, 2013
    Inventors: Lis Karen Nanver, Thomas Ludovicus Maria Scholtes, Agata {hacek over (S)}akić, Cornelis Sander Kooijman, Gerard Nicolaas Anne van Veen
  • Publication number: 20110169116
    Abstract: The invention discloses a process for manufacturing a radiation detector for detecting e.g. 200 eV electrons. This makes the detector suited for e.g. use in an Scanning Electron Microscope. The detector is a PIN photodiode with a thin layer of pure boron connected to the p+-diffusion layer. The boron layer is connected to an electrode with an aluminium grid to form a path of low electrical resistance between each given point of the boron layer and the electrode. The invention addresses forming the aluminium grid on the boron layer without damaging the boron layer.
    Type: Application
    Filed: January 13, 2011
    Publication date: July 14, 2011
    Applicant: FEI Company
    Inventors: Lis Karen Nanver, Thomas Ludovicus Maria Scholtes, Agata Sakic, Cornelis Sander Kooijman, Gerard Nicolaas Anne van Veen
  • Patent number: 7474419
    Abstract: A particle-optical apparatus comprising: A first source, for generating a first irradiating beam (E) along a first axis (A1); A second source, for generating a second irradiating beam (I) along a second axis (A2) that intersects the first axis at a beam intersection point, the first and second axes (A1, A2) defining a beam plane, A stage assembly (3) for positioning a sample in the vicinity of the beam intersection point, provided with: A sample table (21) to which the sample can be mounted; A set of actuators, arranged so as to effect translation of the sample table along directions substantially parallel to an X-axis perpendicular to the beam plane, a Y-axis parallel to the beam plane, and a Z-axis parallel to the beam plane, said X-axis, Y-axis and Z-axis being mutually orthogonal and passing through the beam intersection point, wherein the set of actuators is further arranged to effect: rotation of the sample table about a rotation axis (RA) substantially parallel to the Z-axis, and; rotation of the sa
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: January 6, 2009
    Assignee: FEI Company
    Inventors: Hendrik Gezinus Tappel, Ian Johannes Bernardus van Hees, Danny Lankers, Gerard Nicolaas Anne van Veen, Richard Young, Lucille Ann Giannuzzi