Abstract: A light-sensitive mixture is described which contains a water-insoluble resinous binder, which is soluble or swellable in aqueous-alkaline solutions, and a novel 1,2-naphthoquinone-2-diazide-sulfonic acid ester of a dihydroxyacylophenone or of a dihydroxybenzoic acid ester of the formula I ##STR1## in which R.sup.1 is an alkyl or alkoxy radical, the carbon chain of which can be interrupted by ether oxygen atoms, R.sup.2 is a hydrogen atom, an alkyl radical having 1-3 carbon atoms, or a chlorine or bromine atom and D is a 1,2-naphthoquinone-2-diazide-sulfonyl radical. The copying materials prepared from this mixture are particularly suitable for the preparation of printing plates which give long print runs and have a high light sensitivity. The compounds of the formula I are distinguished by good solubility in customary coating solvents.

Abstract: This invention relates to a developer mixture for washing out light-sensitive copying layers previously exposed in imagewise manner and containing a polymer of an N-vinyl amine, of vinyl alcohol or of a vinyl alcohol derivative, an alcohol being water-soluble in an amount less than 10% by weight, and water as the main constituent, the mixture containing as said polymer a copolymer which is water-soluble or which can be dispersed in water to form a stable dispersion, composed of (a) hydrophilic units of the formula I: ##STR1## wherein A is O-R or ##STR2## R is a hydrogen atom or a methyl group; R.sub.1 is a hydrogen atom, an alkyl group or an alkoxy alkyl group having 1 to 10 carbon atoms each or an aryl group with 6 to 10 carbon atoms; R.sub.

Abstract: A radiation-sensitive mixture is described which contains (a) a compound which forms an acid under the action of actinic radiation, and (b) a polymeric compound having recurrent orthocarboxylic acid ester groupings, and which comprises a polymeric compound which is built up from recurrent units of the formula I: ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl, cycloalkyl or aryl group, R.sup.2, R.sup.3 and R.sup.5 are identical or different and denote hydrogen atoms or alkyl or aryl groups, R.sup.4 denotes an alkylene group or --if a.sub.1 =a.sub.2 =1-- also an alkyleneoxy group, it being possible for the alkylene groups to be interrupted by hetero-atoms or by unsaturated or cyclic groups, R.sup.6 denotes a hydrogen atom or a methyl group, a.sub.1 and a.sub.2 each denote, 0, 1 or 2, a.sub.1 +a.sub.2 denotes 1 or 2 and m denotes a number from 3 to 200. The mixtures are suitable for the production of reprographic materials, in particular printing plates, of high photosensitivity.

Abstract: A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble binder, preferably a novolak, and an o-naphthoquinone diazide of the formula ##STR1## in which R.sub.1, R.sub.1 ', R.sub.2 and R.sub.2 ' are identical or different and represent hydrogen, chlorine or bromine atoms, alkyl, alkoxy or alkoxyalkyl groups having 1 to 6 carbon atoms or alkenyl groups having 2 to 6 carbon atoms, R.sub.3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sub.4 represents a hydrogen atom, an optionally substituted alkyl group, the carbon chain of which can be interrupted by ether oxygen atoms, an optionally substituted cycloalkyl group having 5 to 16 carbon atoms or an optionally substituted alkenyl group having 2 to 16 carbon atoms, n represents zero or an integer from 1 to 4 and D represents a 1,2-naphthoquinone-2-diazide-sulfonyl group.

Abstract: This invention relates to an improvement in a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable bond and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that the compound which is capable of being cleft by an acid contains at least one N-acyliminocarbonate group as the acid-cleavable group. The invention also relates to a process for producing relief images using the radiation-sensitive mixture.

Abstract: This invention relates to an improvement in a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable C--O--C group and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that the compound which is capable of being cleft by an acid contains at least one enol ether group as the acid-cleavable group. The invention also relates to a process for producing relief images using the radiation-sensitive mixture.

Abstract: This invention relates to a radiation-sensitive copying composition which comprises (a) a compound which forms an acid under the influence of actinic radiation, and (b) an organic polymeric compound which contains recurrent acetal or ketal groupings in its main chain and whose solubility in a liquid developer is increased by the action of an acid, each .alpha.-carbon atom of the alcoholic constituent of the acetal or ketal grouping of the organic polymeric compound being aliphatic. The invention also relates to a process for the production of relief images using a radiation-sensitive copying composition.

Abstract: This invention relates to a radiation sensitive composition which comprises, as the radiation sensitive compound, an s-triazine corresponding to Formula I ##STR1## wherein X is bromine or chlorine, and m and n are whole numbers from 0 to 3 which, taken together, do not exceed 5, and in which R is a substituted or unsubstituted bi- or polynuclear aromatic or heterocyclic aromatic group which may be partially hydrogenated and which is linked via an unsaturated nuclear carbon atom.

Abstract: This invention relates to a radiation-sensitive copying composition comprising a compound (1) which splits-off an acid upon irradiation and a compound (2) having at least one group selected from the group consisting of a carboxylic ortho acid ester group and a carboxylic acid amide acetal group, which composition, upon irradiation, forms an exposure product having a higher solubility in a liquid developer than the non-irradiated composition.

Abstract: Polymers capable of being cross-linked by light, which comprise units having lateral substituted 1-carbonyloxy-1H-naphthalene-2-one groups of the formula ##SPC1##Where R is hydrogen or methyl; R.sub.1 is a streight-chain or branched, saturated or unsaturated hydrocarbon radical having from 1 to 3 carbon atoms, in which a hydrogen atom may be substituted by cyano, (C.sub.1 to C.sub.2) alkoxy, carbo-(C.sub.1 to C.sub.2)-alkoxy, (C.sub.1 to C.sub.2)acyl or (C.sub.1 to C.sub.2)acyloxy and R.sub.2 and R.sub.3, independently, each are (C.sub.1 to C.sub.4)alkyl or chlorine; and R.sub.4 is (C.sub.1 to C.sub.4)alkyl, nitro, chlorine or bromine, are provided.