Abstract: A synthetic resin contains, as essential components,A) a crosslinkable binder selected from the group consisting of the polymers, polyadducts or polycondensates having reactive centers in the form of hydroxyl, thio or primary or secondary amino groups andB) a crosslinking agent based on at least one polyoxyalkylene polyisocyanate andC) a crosslinking agent which differs from (B) and is based on.gamma..sub.1) a polyfunctional isocyanate which differs from (B) or.gamma..sub.2) an organic compound which reacts at elevated temperatures with free amino groups of component (A) with amide formation or.gamma..sub.3) an organic compound which reacts at elevated temperatures with hydroxyl groups of component (A) with transesterification or.gamma..sub.4) a phenolic Mannich base ora mixture of two or more crosslinking agents (.gamma..sub.1) to (.gamma..sub.4).

Abstract: Structured layers of heat-resistant polycondensates are prepared by a process wherein ethylenically unsaturated tetracarboxylates or adducts or salts of tetracarboxylates, which still contain at least one unesterified carboxylic acid group, with ethylenically unsaturated amines, amides or onium compounds mixed with compounds which contain amino, isocyanate or blocked isocyanate groups and can be subjected to polycondensation with the tetracarboxylates are applied as a layer to a substrate, this layer is exposed through a negative, the unexposed, soluble parts are then removed and the insoluble parts are converted into the final polycondensate form at elevated temperatures.

Abstract: Polymeric reaction products are obtained by reactingI) prepolymers obtained fromA) polyoxyalkylenes which have an average molecular weight M.sub.n of from 140 to 10,000 and contain on average from 1.5 to 3.0a.sub.1) primary or secondary amino groups ora.sub.2) epoxy groups per molecule andB) polymers which are based on conjugated dienes, have an average molecular weight M.sub.n of from 250 to 50,000 and contain on average from 1.5 to 3.0b.sub.1) primary or secondary amino groups orb.sub.2) epoxy groups per molecule, the components (a.sub.1) and ( b.sub.2) or (a.sub.2) and (b.sub.1) being reacted with one another so that from at least an amino equivalent excess to 3 amino equivalents of component (a.sub.1) or (b.sub.1) are present per epoxide equivalent of component (a.sub.2) or (b.sub.2), withII) at least one compound which forms free radicals.

Abstract: A process for the production of microstructure elements having structure depths of from several .mu.m into the mm range by imagewise irradiation of polymers with X-rays and removal of the areas of the polymers which have been irradiated imagewise, comprises applying the polymers, before the imagewise irradiation, to an electroconductive substrate in a layer thickness of from several .mu.m into the mm range by melting under pressure, thus firmly anchoring the polymers.The process according to the invention is particularly suitable for the production of microstructure elements having structure depths of from 3 to 2000 .mu.m and lateral dimensions of less than 10 .mu.m.

Abstract: A process for the production of micromoldings having a high aspect ratio by imagewise irradiation of a polymer with high-energy, parallel radiation from an X-ray source employs, as the polymer, a copolymer comprising SO.sub.2 and one or more ethylenically unsaturated organic compounds.

Abstract: Cationic resins are obtainable by reaction ofA) a carboxyl-containing copolymer containing as comonomersa) 35-100 mol % of butadiene,b) 0-45 mol % of acrylonitrile, andc) 0-20 mol % of further comonomers, which has an average molecular weight of 500-50,000 and carries on average from 1.5 to 4 carboxyl groups per molecule, andB) a condensation product ofd) a polybasic aliphatic C.sub.10 -C.sub.100 -carboxylic acid, ande) an amine which is polyfunctional in respect of primary and secondary amino groups,the amount of e) having been determined in such a way that, arithmetically, there are from 1.05 to 4 amino groups for every carboxyl group of d),with the proviso that the amount of B) is chosen in such a way that there are from 1.05 to 4 mol of amino groups per mole of the carboxyl groups present in A).

Abstract: Polymeric reaction products useful as additions to electrocoating baths are obtainable fromA. a polyoxyalkylene which has an average molecular weight M.sub.n of from 140 to 10,000 and contains on average from 1.5 to 3.0 primary and/or secondary amino groups andB. a polymer which is based on a conjugated diene, has an average molecular weight M.sub.n of from 250 to 50,000, contains on average from 1.5 to 3.0 epoxy groups per molecule and is obtainable by reacting a hydroxyl- or carboxyl-containing polymer with a glycidyl compound.

Abstract: These photopolymerizable laminating materials consist of at least one film-forming polymer as a binder, at least one organic compound which is compatible with the binder, has at least two double bonds capable of addition polymerization and may be partially replaced by an organic compound having only one double bond capable of addition polymerization, a photoinitiator or photoinitiator system and an adhesion promoter, with or without conventional additives and assistants, the adhesion promoter used being a tricyclic heteroaromatic compound which is soluble in aqueous alkaline solutions.The said laminating materials are suitable for the production of printed circuits.

Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions,(b) a compound which upon irradiation forms a strong acid and(c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions,where the organic compound (c) is a malonic acid ester.This radiation-sensitive mixture may be used to prepare photoresists.

Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions,(b) a compound which upon irradiation forms a strong acid and(c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions,wherein the organic compound (c) is a .beta.-ketoacide ester.This radiation-sensitive mixture may be used to prepare photoresists.

Abstract: Mixtures which can be cross-linked by photopolymerization and are based on soluble elastomeric block copolymers, photopolymerizable monomers which are compatible with these, photoinitiators and plasticizers contain, as the plasticizer, a chlorolakane of 8 to 40 carbon atoms which has a chlorine content of from 30 to 73% by weight.

Abstract: Mixtures which can be cross-linked by photopolymerization and are based on soluble elastomeric block copolymers, photopolymerizable monomers which are compatible with these, photoinitiators and plasticizers contain, as the plasticizer, a chloroalkane of 8 to 40 carbon atoms which has a chlorine content of from 30 to 73% by weight.

Abstract: Mixtures which can be cross-linked by photopolymerization and are based on soluble elastomeric block copolymers, photopolymerizable monomers which are compatible with these, photoinitiators and plasticizers contain, as the plasticizer, a chloroalkane of 8 to 40 carbon atoms which has a chlorine content of from 30 to 73% by weight.

Abstract: Mixtures which can be crosslinked by photopolymerization and are based on binders, photopolymerizable monomers which are compatible with these, photoinitiators and thermal polymerization inhibitors contain, as the binder, polymers of the formula I ##STR1## where Pol is a radical of a block copolymer prepared by sequential anionic polymerization of conjugated dienes and vinyl aromatics,R.sup.1 is a vicinal alkanediyl group,R.sup.2 is a divalent hydrocarbon group of 2 to 20 carbon atoms,X.sup.- is an acid anion,M is a metal cation, a metal cation complex or cation of an amine, anda and n are each an integer from 1 to 10.

Abstract: In polymer ammonium salts which are formed from a copolymer (A) which can be modified by a polymer-analogous reaction and from one or more amines (B), the copolymer (A) is obtainable by copolymerization of a monomer mixture of(a.sub.1) ethylene,(a.sub.2) acrylic acid and/or methacrylic acid, and(a.sub.3) one or more further monomers from the group consisting of the vinyl esters, vinyl ethers, acrylates, methacrylates, acrylamides and methacrylamides, and the amines (B) are selected from the group consisting of the(b.sub.1) cyclic amines of the general formula I ##STR1## and/or from the group consisting of the (b.sub.2) open-chain amines of the general formula II ##STR2## and/or from the group consisting of (b.sub.3) 1,4-thiazine, N,N',N"-trisvinylmelamine and N,N',N"-triallylmelamine, Z, R.sup.1, R.sup.2 and R.sup.3 having the meanings stated in the description.

Abstract: Novel photopolymerizable recording materials, in particular for the production of printing plates and relief plates, can be developed with water or an aqueous alkaline solution and predominantly consist of a photoinitiator-containing mixture of (a) one or more low molecular weight compounds having one or more photopolymerizable olefinically unsaturated double bonds and (b) one or more organic polymeric binders and contain a bisacylphosphine oxide as the photoinitiator.These recording materials are useful for the production of printing plates and relief plates.

Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3).

Abstract: Relief plates and printing plates are produced by a positive-working process, using a photopolymerizable layer which contains one or more photopolymerizable, olefinically unsaturated compounds, one or more photoinitiators which can be activated by UV light, and a combination of a phenothiazinium, phenoxazinium, phenazinium or acridinium dye with a mild reducing agent which, on exposure to visible light, is capable of reducing the dye in the excited electronic state. The photopolymerizable layer is exposed imagewise to light having a wavelength longer than 450 nm, and simultaneously or subsequently exposed uniformly to light having a wavelength of from 300 to 420 nm, after which the unpolymerized areas of the layer are removed.

Abstract: Relief plates crosslinked by photopolymerization are produced by exposing layers which are crosslinkable by photopolymerization imagewise to actinic light and washing out the noncrosslinked parts of the layers with a developer, by a process in which the developer used contains, as an essential component, a branched or straight-chain, monoolefinically, diolefinically or triolefinically unsaturated acryclic or saturated or monoolefinically, diolefinically or triolefinically unsaturated cyclic aliphatic hydrocarbon, alcohol or ketone of 8 to 15 carbon atoms.