Patents by Inventor Gheorghe Tanasa
Gheorghe Tanasa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11860546Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: September 23, 2022Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
-
Publication number: 20230053840Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: September 23, 2022Publication date: February 23, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalena CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscus TEUNISSEN
-
Patent number: 11454892Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: May 10, 2021Date of Patent: September 27, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
-
Publication number: 20210263424Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: May 10, 2021Publication date: August 26, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalena CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscus TEUNISSEN
-
Patent number: 11086239Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.Type: GrantFiled: March 13, 2019Date of Patent: August 10, 2021Assignee: ASML Netherlands B.V.Inventors: Miao Yu, Petrus Martinus Gerardus Johannes Arts, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Maarten Holtrust, Han Henricus Aldegonda Lempens, Ferdy Migchelbrink, Theodorus Wilhelmus Polet, Gheorghe Tanasa
-
Patent number: 11029607Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: August 28, 2017Date of Patent: June 8, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
-
Publication number: 20210116824Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.Type: ApplicationFiled: March 13, 2019Publication date: April 22, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Miao YU, Petrus, Martinus, Gerardus, Jothannes ARTS, Erik, Henricus, Egidius, Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Maarten HOLTRUST, Han, Henricus, Aldegonda LEMPENS, Ferdy MIGCHELBRINK, Theodorus Wilhelmus POLET, Gheorghe TANASA
-
Publication number: 20200409270Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: August 28, 2017Publication date: December 31, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalen CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscu TEUNISSEN
-
Patent number: 10725390Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: January 16, 2019Date of Patent: July 28, 2020Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
-
Patent number: 10429741Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: GrantFiled: November 19, 2018Date of Patent: October 1, 2019Assignee: ASML Netherlands B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Publication number: 20190146352Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: ApplicationFiled: January 16, 2019Publication date: May 16, 2019Applicant: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
-
Publication number: 20190086814Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: ApplicationFiled: November 19, 2018Publication date: March 21, 2019Applicant: ASML Netherlands B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentinus Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Patent number: 10216100Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: June 16, 2016Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
-
Patent number: 10175585Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.Type: GrantFiled: August 29, 2014Date of Patent: January 8, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
-
Patent number: 10151984Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: GrantFiled: October 30, 2015Date of Patent: December 11, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Patent number: 10146139Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.Type: GrantFiled: June 14, 2017Date of Patent: December 4, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
-
Publication number: 20180181004Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.Type: ApplicationFiled: June 16, 2016Publication date: June 28, 2018Applicant: ASML Netherlands B.V.Inventors: Seerwan SAEED, Petrus Martinus Gerardus Johannes ARTS, Harold Sebastiaan BUDDENBERG, Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Floor Lodewijk KEUKENS, Ferdy MIGCHELBRINK, Jeroen Arnoldus Leonardus Johanne RAAYMAKERS, Arnoldus Johannes Martinus Jozeph RAS, Gheorghe TANASA, Jimmy Matheus Wilhelmus VAN DE WINKEL, Daan Daniel Johannes Antonius VAN SOMMEREN, Marijn WOUTERS, Miao YU
-
Publication number: 20170285487Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.Type: ApplicationFiled: June 14, 2017Publication date: October 5, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes THOMAS, Siebe LANDHEER, Arnout Johannes MEESTER, Marcio Alexandre Cano MIRANDA, Gheorghe TANASA
-
Patent number: 9709901Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.Type: GrantFiled: December 30, 2014Date of Patent: July 18, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
-
Patent number: 9438694Abstract: Systems and methods are disclosed which facilitate management and monitoring of page-level usage data. Specifically, a client computing device may retrieve content from a remote system for local display. A local interaction monitoring component may monitor local interaction with the content, and transmit local interaction information to the remote system. In one embodiment, interaction may be monitored with regard to predefined portions of the content. In another embodiment, interaction may be transmitted to the remote server for processing, in order to generate page-level usage data. In still more embodiments, page level-usage data may be processed or formatted in order to facilitate ease of retrieval and display. In yet more embodiments, the remote system may enable clients, such as administrators, to view aggregate page-level usage data why viewing a corresponding content.Type: GrantFiled: January 29, 2013Date of Patent: September 6, 2016Assignee: Amazon Technologies, Inc.Inventors: Andrei Ochesel, Andrei-Liviu Dumbrava, Marius Ioan Curelariu, Codrin Gheorghe Tanasa, Corneliu Alexandru Gabriel Rudeanu