Patents by Inventor Gheorghe Tanasa

Gheorghe Tanasa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20160124319
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Application
    Filed: October 30, 2015
    Publication date: May 5, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure
    Patent number: 9176371
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Grant
    Filed: September 15, 2009
    Date of Patent: November 3, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20150109592
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Application
    Filed: December 30, 2014
    Publication date: April 23, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ivo Adam Johannes THOMAS, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20150055102
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Application
    Filed: August 29, 2014
    Publication date: February 26, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Robert Douglas WATSO, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Lithographic apparatus and method of operating the apparatus
    Patent number: 8928857
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Grant
    Filed: April 29, 2010
    Date of Patent: January 6, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 8823918
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: September 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Anthonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure
    Patent number: 8730447
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.
    Type: Grant
    Filed: September 15, 2009
    Date of Patent: May 20, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • Lithographic apparatus and device manufacturing method
    Patent number: 8462313
    Abstract: An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.
    Type: Grant
    Filed: June 18, 2010
    Date of Patent: June 11, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Gerardus Adrianus Antonius Maria Kusters, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110007287
    Abstract: An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.
    Type: Application
    Filed: June 18, 2010
    Publication date: January 13, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Henricus Wilhelmus JACOBS, Hans Jansen, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Gerardus Adrianus Antonius Maria Kusters, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING THE APPARATUS
    Publication number: 20100296067
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Application
    Filed: April 29, 2010
    Publication date: November 25, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Ivo Adam Johannes THOMAS, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20100066987
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Application
    Filed: September 15, 2009
    Publication date: March 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes BRUIJSTENS, Richard Joseph BRULS, Hans JANSEN, Siebe LANDHEER, Laurentius Catrinus JORRITSMA, Arnout Johannes MEESTER, Bauke JANSEN, Ivo Adam Johannes Thomas, Marcio Alexandre Cano MIRANDA, Maurice Martinus Johannes VAN DER LEE, Gheorghe TANASA, Lambertus Dominicus NOORDAM
  • LITHOGRAPHIC APPARATUS AND METHOD OF GENERATING THE APPARATUS
    Publication number: 20100066988
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.
    Type: Application
    Filed: September 15, 2009
    Publication date: March 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTUIRNG METHOD
    Publication number: 20100060868
    Abstract: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.
    Type: Application
    Filed: August 31, 2009
    Publication date: March 11, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gheorghe Tanasa, Nicolaas Ten Kate, Johannes Petrus Martinus Bernardus Vermeulen, Danny Maria Hubertus Philips, Maikel Adrianus Cornelis Schepers, Laurentius Johannes Adrianus Van Bokhoven
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20090284715
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Application
    Filed: April 22, 2009
    Publication date: November 19, 2009
    Applicant: ASML NETHERLAND B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Anthonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa