Patents by Inventor Gijs Kramer
Gijs Kramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230360954Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: July 18, 2023Publication date: November 9, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Patent number: 11749556Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: GrantFiled: September 22, 2021Date of Patent: September 5, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
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Patent number: 11726411Abstract: A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.Type: GrantFiled: June 8, 2020Date of Patent: August 15, 2023Assignee: ASML NELHERLANDS B.V.Inventors: Gijs Kramer, Ringo Petrus Cornelis Van Dorst
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Publication number: 20230121922Abstract: A suction clamp for clamping an object. The suction clamp includes a base structure including a base and a connection area, and a first pad for receiving the object. The suction clamp further includes a resilient member connecting the first pad to the connection area of the base structure such that the first pad is moveable relative to the base between a receiving position for receiving the object and a clamping position for clamping the object, wherein the resilient member is adapted to bias the first pad to the receiving position. The suction clamp further includes a suction opening arranged in the base and adapted to be connected to a suction device for providing a suction force for clamping the object on the first pad.Type: ApplicationFiled: December 18, 2020Publication date: April 20, 2023Applicant: ASML NETHERLANDS B.V.Inventor: Gijs KRAMER
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Publication number: 20230075771Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.Type: ApplicationFiled: January 25, 2021Publication date: March 9, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Coen Hubertus Matheus BALTIS, Nicolaas TEN KATE, Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN, Siegfried Alexander TROMP, Frank Pieter Albert VAN DEN BERKMORTEL, Niek Jacobus Johannes ROSET, Gijs KRAMER, Nicolaas Petrus Marcus BRANTJES, Michiel Theodorus Jacobus FONTEYN
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Patent number: 11556064Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.Type: GrantFiled: July 22, 2019Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Theodorus Marcus Nagtegaal, André Schreuder, Anna Catharina Verkaik
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Publication number: 20220283505Abstract: A substrate holder for supporting a substrate, a lithographic apparatus having the substrate holder and a method of supporting the substrate. The substrate holder includes a main body, a plurality of supporting pins, and a plate. The plate is positioned between a surface of the main body and a support surface formed by the plurality of supporting pins. The plate is actuatable in a direction along the plurality of supporting pins between the surface of the main body and the support surface. The substrate holder may also include a main body, a flexible member and a fixed member protruding from a surface of the main body. The flexible member defines an enclosed cavity therein and configured to form a seal with the substrate supported on the substrate holder. The substrate holder is configured to reduce pressure in the enclosed cavity of the flexible member.Type: ApplicationFiled: July 7, 2020Publication date: September 8, 2022Applicant: ASML NETHERLANDS B.V.Inventors: André SCHREUDER, Gijs KRAMER, Ludolf POSTMA
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Publication number: 20220276565Abstract: A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.Type: ApplicationFiled: June 8, 2020Publication date: September 1, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Ringo Petrus Cornelis VAN DORST
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Patent number: 11385547Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: May 21, 2020Date of Patent: July 12, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Publication number: 20220051927Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: September 22, 2021Publication date: February 17, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Patent number: 11243476Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.Type: GrantFiled: March 27, 2019Date of Patent: February 8, 2022Assignee: ASML Netherlands B.V.Inventors: Ringo Petrus Cornelis Van Dorst, Gijs Kramer, Benjamin Cunnegonda Henricus Smeets, Mark Johannes Hermanus Frencken
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Publication number: 20210311403Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.Type: ApplicationFiled: July 22, 2019Publication date: October 7, 2021Applicant: ASML Netherlands B.V.Inventors: Gijs KRAMER, Theodorus marcus NAGTEGAAL, André SCHREUDER, Anna Catharina VERKAIK
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Patent number: 11139196Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: GrantFiled: September 19, 2018Date of Patent: October 5, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
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Publication number: 20210116820Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.Type: ApplicationFiled: March 27, 2019Publication date: April 22, 2021Applicant: ASML Netherlands B.V.Inventors: Ringo Petrus Cornelis VAN DORST, Gijs KRAMER, Benjamin Cunnegonda Henricus SMEETS, Mark Johannes Hermanus FRENCKEN
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Publication number: 20200294841Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: September 19, 2018Publication date: September 17, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Publication number: 20200285154Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: May 21, 2020Publication date: September 10, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Patent number: 10705426Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: April 5, 2017Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Patent number: 10578959Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: March 22, 2016Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Simon Karel Ravensbergen, Niek Jacobus Johannes Roset, Pieter Renaat Maria Hennus
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Publication number: 20190163066Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: April 5, 2017Publication date: May 30, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Publication number: 20180107107Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder, The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder.Type: ApplicationFiled: March 22, 2016Publication date: April 19, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Simon Karel RAVENSBERGEN, Niek Jacobus Johannes ROSET, Pieter Renaat Maria HENNUS