Patents by Inventor Gijs Kramer

Gijs Kramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11139196
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: October 5, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
  • Publication number: 20210116820
    Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.
    Type: Application
    Filed: March 27, 2019
    Publication date: April 22, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Ringo Petrus Cornelis VAN DORST, Gijs KRAMER, Benjamin Cunnegonda Henricus SMEETS, Mark Johannes Hermanus FRENCKEN
  • Publication number: 20200294841
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Application
    Filed: September 19, 2018
    Publication date: September 17, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
  • Publication number: 20200285154
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Application
    Filed: May 21, 2020
    Publication date: September 10, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
  • Patent number: 10705426
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
  • Patent number: 10578959
    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: March 3, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Gijs Kramer, Simon Karel Ravensbergen, Niek Jacobus Johannes Roset, Pieter Renaat Maria Hennus
  • Publication number: 20190163066
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Application
    Filed: April 5, 2017
    Publication date: May 30, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
  • Publication number: 20180107107
    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder, The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder.
    Type: Application
    Filed: March 22, 2016
    Publication date: April 19, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gijs KRAMER, Simon Karel RAVENSBERGEN, Niek Jacobus Johannes ROSET, Pieter Renaat Maria HENNUS
  • Patent number: 9377697
    Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: June 28, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Mark Johannes Hermanus Frencken, Andre Bernardus Jeunink, Frederikus Johannes Maria De Vreede, Gijs Kramer
  • Publication number: 20150309419
    Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table
    Type: Application
    Filed: December 20, 2013
    Publication date: October 29, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Mark Johannes Hermanus FRENCKEN, Andre Bernardus JEUNINK, Frederikus Johannes Maria DE VREEDE, Gijs KRAMER
  • Patent number: 8262166
    Abstract: An arm support, comprising an arm supporting element, connected via a connecting device with a lift device, wherein the arm supporting element has a longitudinal direction between a front end and a rear end and is connected via a tilting axis (E) with the connecting device, which tilting axis (E), in top plan view, is situated between the front end and the rear end, wherein the lift device comprises compensation means for bearing the weight of the arm support and a load borne thereon, in particular an arm of a user.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: September 11, 2012
    Assignee: Exact Dynamics B.V.
    Inventors: Henricus Johannes Adrianus Stuijt, Gijs Kramer, Gerardus Richardus Bernardus Engelina Römer
  • Patent number: 8113590
    Abstract: An arm support, comprising an arm supporting element, connected via a connecting device with a lift device, wherein the arm supporting element has a longitudinal direction between a front end and a rear end and is connected via a tilting axis (E) with the connecting device, which tilting axis (E), in top plan view, is situated between the front end and the rear end, wherein the lift device comprises compensation means for bearing the weight of the arm support and a load borne thereon, in particular an arm of a user.
    Type: Grant
    Filed: June 11, 2008
    Date of Patent: February 14, 2012
    Assignee: Exact Dynamics B.V.
    Inventors: Henricus Johannes Adrianus Stuijt, Gijs Kramer, Gerardus Richardus Bernardus Engelina Römer
  • Publication number: 20120007334
    Abstract: An arm support, comprising an arm supporting element, connected via a connecting device with a lift device, wherein the arm supporting element has a longitudinal direction between a front end and a rear end and is connected via a tilting axis (E) with the connecting device, which tilting axis (E), in top plan view, is situated between the front end and the rear end, wherein the lift device comprises compensation means for bearing the weight of the arm support and a load borne thereon, in particular an arm of a user.
    Type: Application
    Filed: September 23, 2011
    Publication date: January 12, 2012
    Applicant: Exact Dynamics B.V.
    Inventors: Henricus Johannes Adrianus Stuijt, Gijs Kramer, Gerardus Richardus Bernardus Engelina Römer
  • Publication number: 20090121111
    Abstract: An arm support, comprising an arm supporting element, connected via a connecting device with a lift device, wherein the arm supporting element has a longitudinal direction between a front end and a rear end and is connected via a tilting axis (E) with the connecting device, which tilting axis (E), in top plan view, is situated between the front end and the rear end, wherein the lift device comprises compensation means for bearing the weight of the arm support and a load borne thereon, in particular an arm of a user.
    Type: Application
    Filed: June 11, 2008
    Publication date: May 14, 2009
    Applicant: Exact Dynamics B.V.
    Inventors: Henricus Johannes Adrianus STUIJT, Gijs Kramer, Gerardus Richardus Bernardus Engelina Romer