Patents by Inventor Gijs Kramer
Gijs Kramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11139196Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: GrantFiled: September 19, 2018Date of Patent: October 5, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
-
Publication number: 20210116820Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.Type: ApplicationFiled: March 27, 2019Publication date: April 22, 2021Applicant: ASML Netherlands B.V.Inventors: Ringo Petrus Cornelis VAN DORST, Gijs KRAMER, Benjamin Cunnegonda Henricus SMEETS, Mark Johannes Hermanus FRENCKEN
-
Publication number: 20200294841Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: September 19, 2018Publication date: September 17, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
-
Publication number: 20200285154Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: May 21, 2020Publication date: September 10, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
-
Patent number: 10705426Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: April 5, 2017Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
-
Patent number: 10578959Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: March 22, 2016Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Simon Karel Ravensbergen, Niek Jacobus Johannes Roset, Pieter Renaat Maria Hennus
-
Publication number: 20190163066Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: April 5, 2017Publication date: May 30, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
-
Publication number: 20180107107Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder, The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder.Type: ApplicationFiled: March 22, 2016Publication date: April 19, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Simon Karel RAVENSBERGEN, Niek Jacobus Johannes ROSET, Pieter Renaat Maria HENNUS
-
Patent number: 9377697Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table.Type: GrantFiled: December 20, 2013Date of Patent: June 28, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Mark Johannes Hermanus Frencken, Andre Bernardus Jeunink, Frederikus Johannes Maria De Vreede, Gijs Kramer
-
Publication number: 20150309419Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first tableType: ApplicationFiled: December 20, 2013Publication date: October 29, 2015Applicant: ASML Netherlands B.V.Inventors: Mark Johannes Hermanus FRENCKEN, Andre Bernardus JEUNINK, Frederikus Johannes Maria DE VREEDE, Gijs KRAMER
-
Patent number: 8262166Abstract: An arm support, comprising an arm supporting element, connected via a connecting device with a lift device, wherein the arm supporting element has a longitudinal direction between a front end and a rear end and is connected via a tilting axis (E) with the connecting device, which tilting axis (E), in top plan view, is situated between the front end and the rear end, wherein the lift device comprises compensation means for bearing the weight of the arm support and a load borne thereon, in particular an arm of a user.Type: GrantFiled: September 23, 2011Date of Patent: September 11, 2012Assignee: Exact Dynamics B.V.Inventors: Henricus Johannes Adrianus Stuijt, Gijs Kramer, Gerardus Richardus Bernardus Engelina Römer
-
Patent number: 8113590Abstract: An arm support, comprising an arm supporting element, connected via a connecting device with a lift device, wherein the arm supporting element has a longitudinal direction between a front end and a rear end and is connected via a tilting axis (E) with the connecting device, which tilting axis (E), in top plan view, is situated between the front end and the rear end, wherein the lift device comprises compensation means for bearing the weight of the arm support and a load borne thereon, in particular an arm of a user.Type: GrantFiled: June 11, 2008Date of Patent: February 14, 2012Assignee: Exact Dynamics B.V.Inventors: Henricus Johannes Adrianus Stuijt, Gijs Kramer, Gerardus Richardus Bernardus Engelina Römer
-
Publication number: 20120007334Abstract: An arm support, comprising an arm supporting element, connected via a connecting device with a lift device, wherein the arm supporting element has a longitudinal direction between a front end and a rear end and is connected via a tilting axis (E) with the connecting device, which tilting axis (E), in top plan view, is situated between the front end and the rear end, wherein the lift device comprises compensation means for bearing the weight of the arm support and a load borne thereon, in particular an arm of a user.Type: ApplicationFiled: September 23, 2011Publication date: January 12, 2012Applicant: Exact Dynamics B.V.Inventors: Henricus Johannes Adrianus Stuijt, Gijs Kramer, Gerardus Richardus Bernardus Engelina Römer
-
Publication number: 20090121111Abstract: An arm support, comprising an arm supporting element, connected via a connecting device with a lift device, wherein the arm supporting element has a longitudinal direction between a front end and a rear end and is connected via a tilting axis (E) with the connecting device, which tilting axis (E), in top plan view, is situated between the front end and the rear end, wherein the lift device comprises compensation means for bearing the weight of the arm support and a load borne thereon, in particular an arm of a user.Type: ApplicationFiled: June 11, 2008Publication date: May 14, 2009Applicant: Exact Dynamics B.V.Inventors: Henricus Johannes Adrianus STUIJT, Gijs Kramer, Gerardus Richardus Bernardus Engelina Romer