Patents by Inventor Gisele Baudin

Gisele Baudin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220266621
    Abstract: It is disclosed a security element comprising a substantially flat substrate including first and second areas, wherein the first area displays a first motif and generates a first color movement effect to be seen in the first motif while the substrate gets tilted over a first angular tilting range, the second area displays a second motif and generates a second color effect to be seen in the second motif and within a second angular tilting range, the first and second angular tilting ranges are different, and the first area comprises either a micro-mirror structure or a print of magnetically oriented pigments and the second area comprises the other one of the micro-mirror structure and the print of magnetically oriented pigments.
    Type: Application
    Filed: July 14, 2020
    Publication date: August 25, 2022
    Inventors: Raphael Dehmel, Yana Kisselova-Weckerle, Christoph Mengel, Christian Fuhse, Pierre Degott, Claude-Alain Despland, Arnault Weber, Gisele Baudin, Andrea Callegari
  • Publication number: 20210323335
    Abstract: The present invention relates to the field of magnetic assemblies and processes for producing optical effect layers (OEL) comprising magnetically oriented non-spherical magnetic or magnetizable pigment particles on a substrate. In particular, the present invention relates magnetic assemblies and processes for producing said OELs as anti-counterfeit means on security documents or security articles or for decorative purposes.
    Type: Application
    Filed: August 5, 2019
    Publication date: October 21, 2021
    Inventors: Nathalie BENNINGER, Evgeny LOGINOV, Claude-Alain DESPLAND, Gisèle BAUDIN
  • Patent number: 9362510
    Abstract: This invention relates to electroluminescent metal complexes with benzotriazoles of the formula (I), a process for their preparation, electronic devices comprising the metal complexes and their use in electronic devices, especially organic light emitting diodes (OLEDs), as oxygen sensitive indicators, as phosphorescent indicators in bioassays, and as catalysts.
    Type: Grant
    Filed: February 13, 2008
    Date of Patent: June 7, 2016
    Assignee: BASF SE
    Inventors: Thomas Schäfer, Peter Murer, Gisèle Baudin, Manuela Kocher, François Maike, Stephan Allenbach, Rosemarie Sift, Beat Schmidhalter
  • Patent number: 8318830
    Abstract: The present invention provides organometallic latent catalyst compounds, which are suitable as catalysts in polyaddition or polycondensation reactions which are catalysed by a Lewis acid type catalyst, in particular for the crosslinking of a blocked or unblocked isocyanate or isothiocyanate component with a polyol or polythiolto form a polyurethane (PU).
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: November 27, 2012
    Assignee: BASF SE
    Inventors: Rachel Kohli Steck, Caroline Lordelot, Thomas Vogel, Gisele Baudin, Paul Brown, Kurt Dietliker, Rinaldo Huesler, Tunja Jung, Peter Simmendinger, Katia Studer, Antoine Carroy
  • Patent number: 8252784
    Abstract: Base-polymerizable or base-crosslinkable compositions comprising select bicyclic amines with benzylic substitution undergo photochemically induced, base-catalysed reactions upon photochemical conversion of the benzylically substituted amine to an amidine derivative.
    Type: Grant
    Filed: November 12, 2008
    Date of Patent: August 28, 2012
    Assignee: BASF SE
    Inventors: Gisèle Baudin, Kurt Dietliker, Tunja Jung
  • Publication number: 20100234485
    Abstract: The present invention provides organometallic latent catalyst compounds, which are suitable as catalysts in polyaddition or polycondensation reactions which are catalysed by a Lewis acid type catalyst, in particular for the crosslinking of a blocked or unblocked isocyanate or isothiocyanate component with a polyol or polythiolto form a polyurethane (PU).
    Type: Application
    Filed: October 10, 2008
    Publication date: September 16, 2010
    Applicant: BASF SE
    Inventors: Rachel Kohli Steck, Caroline Lordelot, Thomas Vogel, Gisele Baudin, Paul Brown, Kurt Dietliker, Rinaldo Huesler, Tunja Jung, Peter Simmendinger, Katia Studer, Antoine Carroy
  • Patent number: 7754863
    Abstract: The invention accordingly relates to an optical recording medium comprising a substrate, a reflecting layer and a recording layer, wherein the recording layer comprises a compound of formula (I) or a mesomeric or a tautomeric form thereof, wherein M1 is a metal cation in the oxidation state +3, a hydroxy or halogeno metal group wherein the metal is in the oxidation state +4, or an oxo metal group wherein the metal is in the oxidation state +5; (III) and (IV)are each independently of the other (V), (VI) or (VII); (VIII) is (IX), (X), (XI), (XII), (XIII), or (XIV); (XV) is (XVI) or C2-C8heteroaryl unsubstituted or mono- or poly-substituted by R10, R11, R12 and/or R13; Q1 is N or CR18, Q2 is N or CR19, Q3, Q5 and Q7 are each independently of the other CR20R21, O, S or NR22, Q4 is CR16 or N and Q6 is CR17 or N; and R2 and/or R6 are O, S or NR33. Please see the disclosure for the other substituents which are less relevant.
    Type: Grant
    Filed: July 6, 2005
    Date of Patent: July 13, 2010
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Jean-Pierre Bacher, Gisèle Baudin, Frédérique Wendeborn, Jean-Marie Adam, Urs Lehmann, Jean-Luc Birbaum
  • Publication number: 20100108994
    Abstract: This invention relates to electroluminescent metal complexes with benzotriazoles of the formula (I), a process for their preparation, electronic devices comprising the metal complexes and their use in electronic devices, especially organic light emitting diodes (OLEDs), as oxygen sensitive indicators, as phosphorescent indicators in bioassays, and as catalysts.
    Type: Application
    Filed: February 13, 2008
    Publication date: May 6, 2010
    Inventors: Thomas Schäfer, Peter Murer, Gisèle Baudin, Manuela Kocher, François Maike, Stephan Allenbach, Rosemarie Sift, Beat Schmidhalter
  • Patent number: 7538104
    Abstract: Compounds of the formula I R7?N—R6 RS—C,N—R4 H C, R?/I R, 3 R 2 (I) in which R, is an aromatic or heteroaromatic radical which is capable of absorbing light in the wave-length range from 200 nm to 650 nm and which is unsubstituted or substituted one or more times by C,—C,8alkyl, C2-C,ealkenyl, C2-C,8alkynyl, C,—C,ehaloalkyl, NO2, NR,OR, CN, OR,2, SR,2, C(O)R,3, C(O)OR,4, halogen or a radical of the formula II R˜—N? R6 1 R5-C,N.
    Type: Grant
    Filed: October 8, 2002
    Date of Patent: May 26, 2009
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Gisèle Baudin, Kurt Dietliker, Tunja Jung
  • Publication number: 20090076200
    Abstract: Base-polymerizable or base-crosslinkable compositions comprising select bicyclic amines with benzylic substitution undergo photochemically induced, base-catalysed reactions upon photochemical conversion of the benzylically substituted amine to an amidine derivative.
    Type: Application
    Filed: November 12, 2008
    Publication date: March 19, 2009
    Inventors: Gisele Baudin, Kurt Dietliker, Tunja Jung
  • Publication number: 20070248782
    Abstract: The invention relates to an optical recording medium comprising a substrate, a reflecting layer and a recording layer, wherein the recording layer comprises a compound of formula preferably a compound of formula or a mesomeric or tautomeric form thereof, wherein Ah+ is an organic cation having h quaternary ammonium or phosphonium groups; Q1 is N or CR15, Q2 is N or CR16, Q3, Q5 and Q7 are each independently of the other CR17R18, O, S or NR19, Q4 is CR13 or N and Q6 is CR14 or N; and one of R1 and R3 is OR17, OR20, SR17, SR20, NR17R18, NR18R20 or NR20R21, and the other of R1 and R3 is O?, S? or N?R22. The compounds of formula (I) and (II) are novel and also claimed, as well as mixtures thereof with metal complexes. The optical recording media are remarkably suitable for DVD±R (658 nm), especially at high recording speeds.
    Type: Application
    Filed: July 6, 2005
    Publication date: October 25, 2007
    Inventors: Jean-Pierre Bacher, Gisele Baudin, Frederique Wendeborn, Jean-Marie Adam, Urs Lehmann, Jean-Luc Birbaum
  • Patent number: 7279200
    Abstract: A process for producing stable, scratch-resistant coatings comprising the preparation of a photocurable formulation containing certain siloxane photoinitiators as surface-active initiators, application of the formulation to a substrate and the curing of the formulation by exposure to electromagnetic radiation with wavelengths from 200 nm into the IR region and prior, simultaneous or subsequent exposure to heat.
    Type: Grant
    Filed: August 7, 2001
    Date of Patent: October 9, 2007
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Gisèle Baudin, Tunja Jung
  • Publication number: 20070026509
    Abstract: Polymeric photoinitiators of the formula I or II wherein n and m independently of one another are 3-5; o is 10-16; p is 4-8; R is phenyl-CO—CO—O—; Y and Y? independently of one another are C1-C10alkylene or —[(CH2)a—O—(CH2)b]c— wherein a is 2-10, b is 0-10, c is 1-3; with the proviso that they are, however, at least 1 if the methylene group in question is between two oxygen atoms.
    Type: Application
    Filed: May 28, 2004
    Publication date: February 1, 2007
    Inventors: Jonathan Rogers, Gisele Baudin, Tunja Jung, Reinhold Ohrlein, Gabriele Baisch
  • Patent number: 7105582
    Abstract: Compounds of the formula I are suitable photoinitiators which accumulates at the surface of the formulation in which R is for example phenyl and A is a surface-active radical of the formula III Y is a divalent group C3–C12cycloalkylene, C6–C12bicycloalkylene; C1–C6alkylenen-C3–C12cycloalkylene, C1–C6alkylene- C6–C12bicycloalkylene or C1–C10alkylene interrupted by one or more non-consecutive C3–C12cycloalkylene, —U—C3–C12cycloalkylene, C6–C12bicycloalkylene or —U—C6–C12bicycloalkylene; C1–C10alkylene interrupted by one or more non-consecutive O and C3–C12cycloalkylene, —U—C3–C12cycloalkylene, C6–C12bicycloalkylene and/or —U—C6–C12bicycloalkylene; U is U? or U? U? is —(CH2)aCOO—; U? is —Si(CH3)(CH3)— or —(CH2)a—Si(CH3)(CH3)—, a is a number from 1 to 10; b is a number from 0 to 10; with the proviso that they are, however, at least 1 if the methylene group in question is between two oxygen atoms.
    Type: Grant
    Filed: January 28, 2003
    Date of Patent: September 12, 2006
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Gisèle Baudin, Tunja Jung
  • Patent number: 7005281
    Abstract: The invention relates to a process for preparing organosilicon group containing photoinitiators of the formula (I), wherein m is a number from 1 to 200; q is 0 or 1; A is IN-C(O)—O—CHR3—Y— or IN-C(O)—NH—CHR3—Y—; A? is A or R1?; R1 and R1?, R2 and R2? are C1–C18alkyl or phenyl, or —(O)q—SiR1R1?R2; R3 is hydrogen or C1–C6alkyl, Y is a divalent group selected from C1–C10alkeylene, C2–C10alkenylene or —(CH2)b—O—(CH2)a—; and b are each independently of the other a number of 1 to 6; IN is a photolabile functional moiety of the formula (II) or (III), wherein R4 is hydrogen or —C(O)—C(O)—OH or —C(O)—C(O)—OC1–C6alkyl and n is 1–3; R5 and R6 are C1–C12alkyl or together are cycloC5–C7alkyl; R7 is hydroxy, C1–C6alkoxy or morpholinyl; X is —(CH2)a—, —(CH2)b—O—(CH2)a— or —(CH2)b—O—CO—(CH2)a—; a and b are each independently of the other a number of 1 to 6; whereby the process is characterized in that a photolabile functional moiety containing a carboxy group (IN-COOH) or an alkoxycarbonyl group (IN-CO—OC1–C6alkyl) is reacte
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: February 28, 2006
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Reinhold Öhrlein, Kai-Uwe Schöning, Gabriele Baisch, Jemima Schmidt, Gisèle Baudin, Tunja Jung
  • Patent number: 7001644
    Abstract: A process for the production of coatings with scratch-resistant durable surfaces that comprise as photoinitiator (B) in a photocurable formulation at least one surface-active photoinitiator, concentrated at the surface of the formulation, of formula (Ia) or (Ib), wherein Ra is a radical of formula (IIa), Rb is a radical of formula (IIb)), or Ra and Rb are naphthyl, anthracyl, phenanthryl or a heterocyclic radical each of which is unsubstituted or substituted; R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 are, for example, each independently of the others hydrogen; A-Y; C1–C12alkyl, halogen or phenyl; R11 and R12 are, for example, C1–C12 alkyl; X is —OR20 or —N(R21)(R22); R20 is, for example, hydrogen or C1–C4alkyl; R21 and R22 are, for example, hydrogen or C1–C12 alkyl; X1 is, for example, —O—; Y is, for example, a single bond or —O—; Y1 is, for example, a single bond; and A is, for example, C6–C30alkyl.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: February 21, 2006
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Gisèle Baudin, Tunja Jung
  • Patent number: 6929828
    Abstract: A process for the production of coatings having scratch-resistant durable surfaces, in which there is used a photocurable formulation comprising a surface-active photoinitiator, concentrated at the surface of the formulation, of formula (Ia) or (Ib), wherein R and R3 are, for example, a radical of formula (II); R1 is, for example, hydrogen, A1-X1- or a radical of formula (II); R2 is, for example, unsubstituted or substituted C1-C12alkyl or A2-X2-; R4 is, for example, hydrogen or A4-X4-; R5 is, for example, hydrogen or A5-X5- or is a radical of formula (II); R6, R7, R8, R9 and R10 are each independently of the others, for example, hydrogen, A-X- , A3-X3- or C1-C12alkyl; A, A1, A2, A3, A4 and A5 are each independently of the others, for example, a surface-active radical of formula (III); n is a number from 1 to 1000, m is a number from 0 to 100; p is a number from 0 to 10 000; R18, R19, R20, R21, G1 and G2 are, for example, C1-C18alkyl; and X, X1, X2, X3, X4 and X5 are, for example, a single bond.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: August 16, 2005
    Inventors: Gisèle Baudin, Tunja Jung
  • Publication number: 20050129852
    Abstract: The invention provides photopolymerizable compositions comprising (A) at least one ethylenically unsaturated photopolymerizable fluocarbon compound selected from polyfluoroalkyl monoacrylates, polyfluoroalkyl monomethacrylatesor polyfluoroalkyldiacrylates and (B) at least one photoinitiator of the formula (I) R is a radical of the formula (II) s is a number of 1 to 4, r is a number of 1 to 2; Y is a single bond or is a divalent linker group A if s is 1, is a radical A0, where A0 is C1-C3oalkyl, C1-C30alkenyl, C1-C30alkynyl or C1-C30aralkyl the radicals being substituted by at least two fluorine atoms and optionally further substituted by OH—, C1-C4alkoxy-, phenyl-, naphthyl-, halogen-, CN—, SR7—, NR8R9— and/or —O(CO)R10—; and the radical A0 is uninterrupted or interrupted by one or more —O—, —S— or —NR12—; A if s is >1, is a radical A1; where A1 is C1-C30alkylene, C1-C3oalkenylene, C1-C3oalkynylene or C1-C30aralkylene, the radicals being substituted by at least two fluorine atoms and optionally further sub
    Type: Application
    Filed: January 28, 2003
    Publication date: June 16, 2005
    Inventors: Gisele Baudin, Tunja Jung
  • Patent number: 6906113
    Abstract: Compounds of formula Ia, Ib and Ic, (Ic), in which R, R1 and R2 are e.g. phenyl, naphthyl, anthracyl, phenanthryl or a heterocyclic radical, are suitable as photoinitiators which accumulate at the surface of coatings.
    Type: Grant
    Filed: August 7, 2001
    Date of Patent: June 14, 2005
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Gisèle Baudin, Tunja Jung
  • Publication number: 20050124820
    Abstract: The invention relates to a process for preparing organosilicon group containing photoinitiators of the formula (I), wherein m is a number from 1 to 200; q is 0 or 1; A is IN—C(O)—O—CHR3—Y— or IN—C(O)—NH—CHR3—Y—; A? is A or R1?; R1 and R1?, R2 and R2? are C1-C18alkyl or phenyl, or —(O)q—SiR1R1?R2; R3 is hydrogen or C1-C6alkyl, Y is a divalent group selected from C1-C10alkeylene, C2-C10alkenylene or —(CH2)b—O—(CH2)a—; and b are each independently of the other a number of 1 to 6; IN is a photolabile functional moiety of the formula (II) or (III), wherein R4 is hydrogen or —C(O)—C(O)—OH or —C(O)—C(O)—OC1-C6alkyl and n is 1-3; R5 and R6 are C1-C1-2alkyl or together are cycloC5-C7alkyl; R7 is hydroxy, C1-C6alkoxy or morpholinyl; X is —(CH2)a—, —(CH2)b—O—(CH2)a— or —(CH2)b—O—CO—(CH2)a—; a and b are each independently of the other a number of 1 to 6; whereby the process is characterized in that a photolabile functional moiety containing a carboxy group (IN—COOH) or an alkoxycarbonyl group (IN—CO—OC1-C6alkyl) is react
    Type: Application
    Filed: February 25, 2003
    Publication date: June 9, 2005
    Inventors: Reinhold Ohrlein, Kai-Uwe Schoning, Gabriele Baisch, Jemima Schmidt, Gisele Baudin, Tunja Jung