Abstract: A maintenance method for performing maintenance of an exposure apparatus including a liquid immersion space-forming member which forms a liquid-immersion area by supplying liquid in a space between an optical member and a substrate; a liquid supply mechanism which supplies the liquid to the liquid-immersion space; a substrate stage which moves the substrate; and a measuring stage on which a reference mark is formed. To clean the liquid-immersion space-forming member, a cleaning liquid is supplied to a space between the measuring stage and the liquid-immersion space-forming member. The exposure apparatus is provided with various types of cleaning mechanisms for cleaning the liquid-immersion space-forming member. The liquid-immersion exposure can be performed while efficiently performing maintenance of the exposure apparatus.

Abstract: A support apparatus, a stage apparatus, an exposure apparatus, etc. are proposed that can increase response of a relative movement between a piston and a cylinder, etc. are proposed. There is provided a support apparatus including: a cylinder portion; a piston portion that is provided inside the cylinder portion and is movable in a Z direction; a fluid bearing formed in at least a portion between an inner wall of the cylinder portion and an outer wall of the piston portion, the support apparatus supporting a supported member in the Z direction with respect to a support member by means of a biasing force generated by the cylinder portion and the piston portion, in which fluids are supplied independently inside the fluid bearing and the cylinder.