Patents by Inventor Gordon L. Cann
Gordon L. Cann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5976206Abstract: Diamond film with substantially no non-diamond carbon and a high thermal conductivity is deposited by means of a direct current arc jet apparatus with a substrate temperature below about 975 degrees Celsius, an arc power of between about 20 and 40 kw. A pressure of about 12 torr, and an enthalpy greater than 30 from a activated gas jet fed with hydrogen and methane, the methane being supplied at a concentration of less than 0.07%. The resulting material has a high transparency and thermal conductivity.Also disclosed is the use of the diamond material made by the present method for cutting tool applications, particularly milling.Type: GrantFiled: January 30, 1998Date of Patent: November 2, 1999Assignee: Saint-Gobain/Norton Industrial Ceramics CorporationInventors: Louis K. Bigelow, Kevin J. Gray, Grant Lu, Matthew A. Simpson, Gordon L. Cann
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Patent number: 5773830Abstract: The process is an arc jet CVD diamond deposition process with very low methane, less than 0.07%, and the addition of water. The resulting material has is characterized by a narrow Raman peak, a relatively large lattice constant, and a charge carrier collection distance of at least 25 microns.Type: GrantFiled: May 23, 1995Date of Patent: June 30, 1998Assignee: Saint-Gobain/Norton Industrial Ceramics Corp.Inventors: Grant Lu, Gordon L. Cann
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Patent number: 5736252Abstract: Diamond film with substantially no non-diamond carbon and a high thermal conductivity is deposited by means of a direct current arc jet apparatus with a substrate temperature below about 975 degrees Celsius, an arc power of between about 20 and 40 kw. a pressure of about 12 torr, and an enthalpy greater than 30 from a activated gas jet fed with hydrogen and methane, the methane being supplied at a concentration of less than 0.07%. The resulting material has a high transparency and thermal conductivity.Also disclosed is the use of the diamond material made by the present method for cutting tool applications, particularly milling.Type: GrantFiled: May 19, 1995Date of Patent: April 7, 1998Assignee: Saint-Gobain/Norton Industrial Ceramics Corp.Inventors: Louis K. Bigelow, Kevin J. Gray, Grant Lu, Matthew A. Simpson, Gordon L. Cann
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Patent number: 5672430Abstract: The process is an arc jet CVD diamond deposition process with very low methane, less than 0.07%, and the addition of water. The resulting material has is characterized by a narrow Raman peak, a relatively large lattice constant, and a charge carrier collection distance of at least 25 microns.Also disclosed is a particle detector device which makes use of the diamond material according to the invention.Type: GrantFiled: May 23, 1995Date of Patent: September 30, 1997Assignee: Saint-Gobain/Norton Industrial Ceramics Corp.Inventors: Grant Lu, Gordon L. Cann
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Patent number: 5518766Abstract: A multi-layer diamond film is grown by d.c. arc assisted plasma deposition. A series of layers are deposited on each other by periodically back-etching the surface and renucleating during deposition. There may also be deposited a thin layer of non-diamond carbon material between the diamond layers, but no other non-carbon material. Renucleation is controlled by varying the proportion of methane to hydrogen in the feed gases, by temperature cycling of the substrate, or by inducing modal changes in the arc.Type: GrantFiled: September 2, 1993Date of Patent: May 21, 1996Assignee: Norton CompanyInventors: Louis K. Bigelow, Robert M. Frey, Gordon L. Cann
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Patent number: 5487787Abstract: The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.Type: GrantFiled: January 6, 1995Date of Patent: January 30, 1996Assignee: Celestech, Inc.Inventors: Gordon L. Cann, Cecil B. Shepard, Jr., Frank X. McKevitt
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Patent number: 5435849Abstract: The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.Type: GrantFiled: January 13, 1993Date of Patent: July 25, 1995Assignee: Celestech, Inc.Inventors: Gordon L. Cann, Cecil B. Shepard, Jr., Frank X. McKevitt
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Patent number: 5342660Abstract: The disclosure is directed to a method for depositing a substance, such as synthetic diamond. A plasma beam is produced, and contains the constituents of the substance to be deposited. A substrate is provided, and has a surface in the path of the beam, the area of said surface being substantially larger than the cross-sectional area of the beam impinging on the surface. Repetitive motion is introduced between the substrate and the beam as the substance is deposited on the surface. The substrate, the beam, or both can be moved. Spinning of the substrate, with the beam non-concentric thereon, is one of the disclosed techniques.Type: GrantFiled: May 10, 1991Date of Patent: August 30, 1994Assignee: Celestech, Inc.Inventors: Gordon L. Cann, Cecil B. Shepard, Jr.
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Patent number: 5340401Abstract: In a first embodiment of an improved diamond deposition cell, a chamber is evacuated to a low pressure and a graphite element in the chamber is heated to a selected high temperature and heats a substrate positioned within the chamber spaced by a selected gap from the graphite body to a selected lower temperature. Hydrogen or a mixture of hydrogen and hydrocarbon gas is admitted to the chamber and part of the hydrogen reacts with the hot graphite body to form atomic hydrogen and hydrocarbon gasses. Hydrogen and hydrocarbon gasses cycle repeatedly across the gap between the facing surfaces of the body and the substrate in the kinetic regime resulting in a net transfer of carbon to the substrate and its deposition as diamond crystals or film on the substrate. In a second embodiment, the graphite body is heated by combusting gasses in a cavity therein.Type: GrantFiled: January 25, 1993Date of Patent: August 23, 1994Assignee: Celestech Inc.Inventor: Gordon L. Cann
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Patent number: 5310596Abstract: A multi-layer diamond film is grown by d.c. arc assisted plasma deposition. A series of layers are deposited on each other by periodically back-etching the surface and renucleating during deposition. There may also be deposited a thin layer of non-diamond carbon material between the diamond layers, but no other non-carbon material. Renucleation is controlled by varying the proportion of methane to hydrogen in the feed gases, by temperature cycling of the substrate, or by inducing modal changes in the arc.Type: GrantFiled: December 18, 1991Date of Patent: May 10, 1994Assignee: Norton CompanyInventors: Louis K. Bigelow, Robert M. Frey, Gordon L. Cann
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Patent number: 5204144Abstract: The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.Type: GrantFiled: May 10, 1991Date of Patent: April 20, 1993Assignee: Celestech, Inc.Inventors: Gordon L. Cann, Cecil B. Shephard, Jr., Frank X. McKevitt
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Patent number: 5182093Abstract: In a first embodiment of an improved diamond deposition cell, a chamber is evacuated to a low pressure and a graphite element in the chamber is heated to a selected high temperature and heats a substrate positioned within the chamber spaced by a selected gap from the graphite body to a selected lower temperature. Hydrogen or a mixture of hydrogen and hydrocarbon gas is admitted to the chamber and part of the hydrogen reacts with the hot graphite body to form atomic hydrogen and hydrocarbon gasses. Hydrogen and hydrocarbon gasses cycle repeatedly across the gap between the facing surfaces of the body and the substrate in the kinetic regime resulting in a net transfer of carbon to the substrate and its deposition as diamond crystals or film on the substrate. In a second embodiment, the graphite body is heated by combusting gasses in a cavity therein.Type: GrantFiled: January 8, 1990Date of Patent: January 26, 1993Assignee: Celestech, Inc.Inventor: Gordon L. Cann
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Patent number: 4825647Abstract: A thruster assembly is disclosed which includes a removable filament mounted in a heat exchange cavity which isolates propellant from the filament and transfers energy from the filament to the propellant. The filament may comprise a single winding of wire or may, if desired, comprise a bifilar wound helix. Also disclosed are a number of ways of powering the filament including a plurality of power supplies provided for redundancy as well as variability of operation. The thruster assembly housing includes sophisticated heat conduction structure including a tortuous internal heat conduction path which minimizes heat loss from the thruster for a variety of disclosed purposes. Also disclosed is structure for providing energy transfer to propellant both through radiation and emission. Several techniques for improving the performance of the thruster assembly and particularly related to the nozzle structure as well as to the fuel supply structure and heat exchange structure form the main basis for this disclosure.Type: GrantFiled: January 24, 1985Date of Patent: May 2, 1989Assignee: Technion, Inc.Inventor: Gordon L. Cann
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Patent number: 4730449Abstract: A thruster assembly is disclosed which includes a removable filament mounted in a heat exhange cavity which isolates propellent from the filament and transfers energy from the filament to the propellant. The filament may comprise a single winding of wire or may if desired comprise a bifilar wound helix. Also disclosed are a number of ways of powering the filament including a plurality of power supplies provided for redundancy as well as variability of operation. The thruster assembly housing includes sophisticated heat conduction structure including a tortuous internal heat conduction path which minimizes heat loss from the thruster for a variety of disclosed purposes. Also disclosed is structure for providing energy transfer to propellant both through radiation and emission. Further, a test bed facility for testing the inventive thruster assembly is set forth.Type: GrantFiled: December 19, 1986Date of Patent: March 15, 1988Assignee: Technion, Inc.Inventor: Gordon L. Cann
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Patent number: 4682564Abstract: Embodiments of magnetoplasmadynamic processors are disclosed which utilize specially designed cathode-buffer, anodeionizer and vacuum-insulator/isolator structures to transform a working fluid into a beam of fully ionized plasma. The beam is controlled both in its size and direction by a series of magnets which are mounted in surrounding relation to the cathode, anode, vacuum insulator/isolators and plasma beam path. As disclosed, the processor may be utilized in many diverse applications including the separation of ions of differing weights and/or ionization potentials and the deposition of any ionizable pure material. Several other applications of the processor are disclosed.Type: GrantFiled: July 11, 1983Date of Patent: July 28, 1987Inventor: Gordon L. Cann
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Patent number: 4577461Abstract: This invention relates to a thruster apparatus applicable to the environment of a space vehicle or satellite and operable for positioning such vehicle or satellite in the proper orbital location. The device utilizes a unique configuration of passageways to convey the propellant to a location adjacent an electrical arc forming device. The propellant, heated thereby, then travels out a nozzle section of the thruster to thereby produce thrust. If desired, an external heater may be provided to preheat the thruster to thereby contribute to greater efficiency in the use of propellant. Further, if desired, the thruster may include an accelerator extension.Type: GrantFiled: June 22, 1983Date of Patent: March 25, 1986Inventor: Gordon L. Cann
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Patent number: 4569198Abstract: A heater/emitter for a rocket engine assembly utilizes a resistance heated wire coil or coils which may also function as a cathode emitter or as a thermal driver for an auxiliary emitter. This heater/emitter may if desired be formed into a bifilar and may be supported by the wire lead itself or by isolated supports. The power leads are located in a lead channel and feature an overwrapping of similar wire material which reduces the internal resistance heating of the lead to increase the electrical conductivity of the supporting lead and increase the thermal conduction thereof to establish a cooler and structurally-stronger lead. A plurality of radiation discs or shields are spaced along the leads to further minimize energy losses from the heater out of the lead channel. The heater/emitter itself is enclosed, except for the lead channel, by a heat exchanger housing.Type: GrantFiled: May 17, 1985Date of Patent: February 11, 1986Assignee: Technion, IncorporatedInventor: Gordon L. Cann
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Patent number: 4548033Abstract: This invention relates to a thruster apparatus applicable to the environment of a space vehicle or satellite and operable for positioning such vehicle or satellite in the proper orbital location. The device utilizes a unique configuration of passageways to convey the propellant to a location adjacent an electrical arc forming device. The propellant, heated thereby, then travels out a nozzle section of the thruster to thereby produce thrust. If desired, an external heater may be provided to preheat the thruster to thereby contribute to greater efficiency in the use of propellant. Further, if desired, the thruster may include an accelerator extension.Type: GrantFiled: May 9, 1984Date of Patent: October 22, 1985Inventor: Gordon L. Cann
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Patent number: RE32918Abstract: A heater/emitter for a rocket engine assembly utilizes a resistance heated wire coil or coils which may also function as a cathode emitter or as a thermal driver for an auxiliary emitter. This heater/emitter may if desired be formed into a bifilar and may be supported by the wire lead itself or by isolated supports. The power leads are located in a lead channel and feature an overwrapping of similar wire material which reduces the internal resistance heating of the lead to increase the electrical conductivity of the supporting lead and increase the thermal conduction thereof to establish a cooler and structurally-stronger lead. A plurality of radiation discs or shields are spaced along the leads to further minimize energy losses from the heater out of the lead channel. The heater/emitter itself is enclosed, except for the lead channel, by a heat exchanger housing.Type: GrantFiled: November 13, 1986Date of Patent: May 9, 1989Assignee: Technion, Inc.Inventor: Gordon L. Cann
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Patent number: RE34806Abstract: Embodiments of magnetoplasmadynamic processors are disclosed which utilize specially designed cathode-buffer, anodeionizer and vacuum-insulator/isolator structures to transform a working fluid into a beam of fully ionized plasma. The beam is controlled both in its size and direction by a series of magnets which are mounted in surrounding relation to the cathode, anode, vacuum insulator/isolators and plasma beam path. As disclosed, the processor may be utilized in many diverse applications including the separation of ions of differing weights and/or ionization potentials and the deposition of any ionizable pure material. Several other applications of the processor are disclosed.Type: GrantFiled: May 4, 1992Date of Patent: December 13, 1994Assignee: Celestech, Inc.Inventor: Gordon L. Cann