Publication number: 20200270742
Abstract: An amorphous thin metal film can comprise a combination of three metals or metalloids including: 5 at % to 90 at % of a metalloid selected from the group of carbon, silicon, and boron; 5 at % to 90 at % of a first metal selected from the group of titanium, vanadium, chromium, iron, cobalt, nickel, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, hafnium, tantalum, tungsten, osmium, iridium, and platinum; and 1 at % to 90 at % of cerium. The three elements may account for at least 50 at % of the amorphous thin metal film.
Type:
Application
Filed:
June 24, 2016
Publication date:
August 27, 2020
Applicants:
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P., The State of Oregon State Board of Higher Education on behalf of Oregon State University
Inventors:
James Elmer Abbott, Jr., John M McGlone, Kristopher Olsen, Douglas A Keszler, John Wager, Roberto A Pugliese, William F Stickle, Greg Scott Long