Patents by Inventor Guanyang Lin

Guanyang Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS
    Publication number: 20110250544
    Abstract: Antireflective coating compositions are discussed.
    Type: Application
    Filed: June 16, 2011
    Publication date: October 13, 2011
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Weihong Liu, Guanyang Lin, JoonYeon Cho, Jian Yin, Salem K. Mullen, Mark Neisser
  • Antireflective Compositions and Methods of Using Same
    Publication number: 20110200938
    Abstract: A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.
    Type: Application
    Filed: February 18, 2010
    Publication date: August 18, 2011
    Inventors: Huirong Yao, Guanyang Lin, Jianhui Shan, Joon Yeon Cho, Salem K. Mullen
  • Antireflective Coating Composition and Process Thereof
    Publication number: 20110151376
    Abstract: The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): ?A-B?n??(1) where A is a fused aromatic ring and B has a structure (2), where R1 is C1-C4alkyl and R2 is C1-C4alkyl The invention further relates to a process for forming an image using the composition.
    Type: Application
    Filed: December 23, 2009
    Publication date: June 23, 2011
    Inventors: M. Dalil Rahman, Douglas McKenzie, Huirong Yao, JoonYeon Cho, Yi Yi, Guanyang Lin
  • Antireflective Composition for Photoresists
    Publication number: 20110104613
    Abstract: The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, X is a linking moiety selected from a nonaromatic (A) moiety, aromatic (P) moiety and mixture thereof, R? is a group of structure (2), R? is independently selected from hydrogen, a moiety of structure (2), Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbylene linking moiety, and, Y? is independently a (C1-C20) hydrocarbylene linking moiety, where structure (2) is where R1 and R2 are independently selected from H and C1-C4alkyl and L is an organic hydrocarbyl group. The invention further relates to a process for imaging the antireflective coating composition.
    Type: Application
    Filed: October 30, 2009
    Publication date: May 5, 2011
    Inventors: Huirong Yao, Guanyang Lin, Mark O. Neisser
  • Spin On Organic Antireflective Coating Composition Comprising Polymer with Fused Aromatic Rings
    Publication number: 20100316949
    Abstract: The present invention relates to an organic spin on hard mask antireflective coating composition comprising a polymer comprising at least one unit of fused aromatic rings in the backbone of the polymer and at least one unit with a cycloaliphatic moiety in the backbone of the polymer. The invention further relates to a process for making the polymer and a process for imaging the present composition.
    Type: Application
    Filed: June 10, 2009
    Publication date: December 16, 2010
    Inventors: M. Dalil Rahman, Douglas McKenzie, Guanyang Lin, Jianhui Shan, Ruzhi Zhang, Mark Neisser
  • Bottom Antireflective Coating Compositions
    Publication number: 20100092894
    Abstract: Antireflective coating compositions are discussed.
    Type: Application
    Filed: October 14, 2008
    Publication date: April 15, 2010
    Inventors: Weihong Liu, Guanyang Lin, Joon Yeon Cho, Jian Yin, Salem K. Mullen, Mark Neisser
  • DUAL DAMASCENE VIA FILLING COMPOSITION
    Publication number: 20100015550
    Abstract: Compositions for use in dual damascene process are disclosed.
    Type: Application
    Filed: July 17, 2008
    Publication date: January 21, 2010
    Inventors: Weihong Liu, Guanyang Lin, Salem K. Mullen, Jian Yin, Mark Neisser
  • Antireflective Coating Compositions
    Publication number: 20100009297
    Abstract: Antireflective coatings and related polymers are disclosed.
    Type: Application
    Filed: July 8, 2008
    Publication date: January 14, 2010
    Inventors: Huirong Yao, Guanyang Lin, Jian Yin, Hengpeng Wu, Mark Neisser, Ralph Dammel
  • Photoresist Composition for Deep UV and Process Thereof
    Publication number: 20090042148
    Abstract: The present invention refers to a photoresist composition comprising (i) a polymer A comprising at least one acid labile group; (ii) at least one photoacid generator; (iii) at least one base; (iv) a polymer B, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (v) a coating solvent composition. The present invention also relates to the process of imaging the photoresist.
    Type: Application
    Filed: August 6, 2007
    Publication date: February 12, 2009
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Guanyang Lin
  • Photoresist compositions
    Patent number: 7122291
    Abstract: The present invention provides for a photoresist composition comprising a mixture of two different copolymers.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: October 17, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Guanyang Lin, Takanori Kudo, Chi-Sun Hong, M. Dalil Rahman
  • Photoresist compositions
    Publication number: 20060024610
    Abstract: The present invention provides for a photoresist composition comprising a mixture of two different copolymers.
    Type: Application
    Filed: August 2, 2004
    Publication date: February 2, 2006
    Inventors: Munirathna Padmanaban, Guanyang Lin, Takanori Kudo, Chi-Sun Hong, M. Dalil Rahman