Patents by Inventor Guido de Boer
Guido de Boer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150321356Abstract: The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.Type: ApplicationFiled: May 6, 2015Publication date: November 12, 2015Inventors: Joep Gerard Vijverberg, Laurens Vincent Plandsoen, Bas van Gelder, Guido de Boer, Michel Pieter Dansberg
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Patent number: 9176397Abstract: An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.Type: GrantFiled: April 30, 2012Date of Patent: November 3, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Vincent Sylvester Kuiper, Erwin Slot, Marcel Nicolaas Jacobus Van Kervinck, Guido De Boer, Hendrik Jan De Jong
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Publication number: 20150309424Abstract: A lithography system having one or more lithography elements Each lithography element has a plurality of lithography subsystems. The lithography system further has a control network forming a control network path between the plurality of the lithography subsystems and at least one element control unit for communication of control information. The lithography system is arranged for: issuing control information to the at least one element control unit to control operation of one or more of the lithography subsystems for exposure of one or more wafers; issuing a process program to the element control unit. The process program has a set of predefined commands and associated parameters. The element control unit is arranged to transmit a command of the process program to a lithography subsystem to be executed by the lithography subsystem, regardless of an execution status of a preceding command transmitted to the lithography subsystem.Type: ApplicationFiled: June 15, 2015Publication date: October 29, 2015Inventors: Marcel Nicolaas Jacobus VAN KERVINCK, Guido DE BOER
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Publication number: 20150268032Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.Type: ApplicationFiled: May 19, 2015Publication date: September 24, 2015Inventors: Guido de Boer, Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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Patent number: 9086912Abstract: A clustered substrate processing system comprising one or more lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit for transmitting commands to and receiving responses from the lithography subsystems. Each lithography element also comprises a cluster front-end for interface to an operator or host system. The front-end is arranged for issuing a process program to the element control unit, the process program comprising a set of predefined commands and associated parameters, each command corresponding to a predefined action or sequence of actions to be performed by one or more of the lithography subsystems, and the parameters further defining how the action or sequence of actions are to be performed.Type: GrantFiled: April 23, 2012Date of Patent: July 21, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Marcel Nicolaas Jacobus Van Kervinck, Guido De Boer
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Patent number: 9082584Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.Type: GrantFiled: December 30, 2014Date of Patent: July 14, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Jerry Peijster, Guido de Boer
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Publication number: 20150190994Abstract: A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface.Type: ApplicationFiled: March 19, 2015Publication date: July 9, 2015Inventors: Guido DE BOER, Ralph VAN MELLE, Teunis VAN DE PEUT, Henk DERKS, Frederik Matthias SPIEGELHALDER, Roy Josephus Stephanus DERKS, Edwin Johannes Theodorus SMULDERS
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Patent number: 9069265Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.Type: GrantFiled: March 30, 2012Date of Patent: June 30, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido de Boer, Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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Publication number: 20150177625Abstract: The invention relates to a substrate comprising an optical position mark for being read-out by an optical recording head for emitting light of predetermined wavelength, preferably red or infra-red light, more in particular of 635 nm light, the optical position mark having a mark height, a mark length and a predetermined known position on the substrate, the optical position mark extending along a longitudinal direction and being arranged for varying a reflection coefficient of the position mark along said longitudinal direction, wherein the optical position mark comprises: a first region having a first reflection coefficient and a first width; a second region neighboring the first region and forming a first region pair, the second region having a second reflection coefficient and a second width, and the second reflection coefficient being different from the first reflection coefficient, wherein the first region comprises sub-wavelength structures in comparison with a wavelength of the predetermined wavelengType: ApplicationFiled: February 25, 2015Publication date: June 25, 2015Inventors: Guido DE BOER, Niels VERGEER
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Publication number: 20150162165Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.Type: ApplicationFiled: December 30, 2014Publication date: June 11, 2015Inventors: Jerry PEIJSTER, Guido de Boer
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Patent number: 9036962Abstract: A method of forming an optical fiber array. The method comprises providing a substrate having a first surface and an opposing second surface. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. Additionally, a plurality of fibers is provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. For each fiber, from the first surface side of the substrate, the fiber is inserted in a corresponding aperture such that the fiber end is positioned in close proximity of the second surface. Then the fiber is bent in a predetermined direction such that the fiber abuts a side wall of the aperture at a predetermined position. Finally, the bent fibers are bonded together using an adhesive material.Type: GrantFiled: April 20, 2012Date of Patent: May 19, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido De Boer, Ralph Van Melle, Teunis Van De Peut, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks, Edwin Johannes Theodorus Smulders
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Patent number: 9009631Abstract: The invention relates to a lithography system for patterning a target, said system comprising a feedback control system comprising an actuator for displacing the target, a measurement system for measuring a position of said target, and a control unit adapted for controlling the actuator based on the position measured by the measurement system, said feedback control system having a first latency being a maximum latency between measuring and controlling the actuator based on said measuring, a storage system for storing the measured positions, comprising a receive buffer and a storage unit with a second latency being an average latency between receiving measured positions in the receive buffer and storing said measured positions in the storage unit, wherein the first latency is at least an order of magnitude smaller than the second latency, the feedback control system comprising a unidirectional connection for transmitting said measured positions to the storage system.Type: GrantFiled: July 10, 2012Date of Patent: April 14, 2015Assignee: Mapper Lighography IP B.V.Inventors: Alexius Otto Looije, Michel Pieter Dansberg, Marcel Nicolaas Jacobus Van Kervinck, Guido De Boer
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Patent number: 8957395Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.Type: GrantFiled: March 20, 2014Date of Patent: February 17, 2015Assignee: Mapper Lithography IP B.V.Inventors: Jerry Peijster, Guido de Boer
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Patent number: 8936994Abstract: A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N?1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit.Type: GrantFiled: April 30, 2012Date of Patent: January 20, 2015Assignee: Mapper Lithography IP B.V.Inventors: Vincent Sylvester Kuiper, Erwin Slot, Marcel Nicolaas Jacobus Van Kervinck, Guido De Boer, Hendrik Jan De Jong
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Patent number: 8905369Abstract: The invention relates to a vibration isolation module (101) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (102), an intermediate body (103) and a support body (104) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.Type: GrantFiled: September 10, 2012Date of Patent: December 9, 2014Assignee: Mapper Lithography IP B.V.Inventors: Jerry Johannes Martinus Peijster, Rogier Martin Lambert Ellenbroek, Guido De Boer
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Patent number: 8895943Abstract: The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area.Type: GrantFiled: December 13, 2011Date of Patent: November 25, 2014Assignee: Mapper Lithography IP B.V.Inventors: Guido De Boer, Hendrik Jan De Jong, Vincent Sylvester Kuiper, Erwin Slot
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Patent number: 8841920Abstract: The invention relates to a lithography system. The lithography system has a projection lens system and a capacitive sensing system. The projection lens system is provided with a final projection lens. The capacitive sensing system is arranged for making a measurement related to a distance between the final projection lens and a target. The capacitive sensing system includes at least one capacitive sensor. Additional, the capacitive sensing system is provided with a flexible printed circuit structure and at least one integrated flex print connector. The at least one sensor is located in the flexible printed circuit structure. The flexible printed circuit structure has a flexible base provided with conductive electrodes for the at least one sensor and conductive tracks. The conductive tracks extend from the electrodes along the at least one integrated flex print connector.Type: GrantFiled: October 28, 2013Date of Patent: September 23, 2014Assignee: Mapper Lithography IP B.V.Inventors: Guido De Boer, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Niels Vergeer, Stijn Willem Herman Karel Steenbrink
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Patent number: 8796644Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.Type: GrantFiled: August 17, 2009Date of Patent: August 5, 2014Assignee: Mapper Lithography IP B.V.Inventors: Jerry Peijster, Guido de Boer
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Publication number: 20140203187Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.Type: ApplicationFiled: March 20, 2014Publication date: July 24, 2014Inventors: Jerry Peijster, Guido de Boer
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Publication number: 20140197330Abstract: The invention relates to a vibration isolation module (101) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (102), an intermediate body (103) and a support body (104) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.Type: ApplicationFiled: September 10, 2012Publication date: July 17, 2014Applicant: MAPPER LITHOGRAPHY IP B.V.Inventors: Jerry Johannes Martinus Peijster, Rogier Martin Lambert Ellenbroek, Guido De Boer