Patents by Inventor Gunnar Schornick

Gunnar Schornick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4778847
    Abstract: Carboxylates of hydroxyl-containing polymers are prepared by reacting a finely dispersed hydroxyl-containing polymer with a carboxylic anhydride in the heterogeneous phase in the presence of a tertiary amine as a catalyst by a method in which an N-alkylimidazole, where alkyl is of 1 to 10 carbon atoms, is used as the catalyst.
    Type: Grant
    Filed: September 24, 1986
    Date of Patent: October 18, 1988
    Assignee: BASF Aktiengesellschaft
    Inventors: Gunnar Schornick, Gunther Schulz, Walter Mann
  • Patent number: 4734444
    Abstract: Mixtures which are curable by heating or irradiation with actinic light contain one or more cationically curable compounds, such as an epoxy, an olefinically unsaturated monomer, amino resin or phenolic resin, and as a cationically active curing catalyst one or more N-sulfonylamino-sulfonium salts of the formula ##STR1## such as N-p-toluenesulfonyl-N-methylaminodiphenylsulfonium hexafluorophosphate with or without quinones or peroxides are suitable, inter alia, for producing moldings, coatings, relief images and resist patterns.
    Type: Grant
    Filed: February 12, 1987
    Date of Patent: March 29, 1988
    Assignee: BASF Aktiengesellschaft
    Inventors: Andreas Henne, Wolfram Ochs, Helmut Tesch, Gunnar Schornick, Reinhold J. Leyrer
  • Patent number: 4725524
    Abstract: In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of (a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, (b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, (c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, (d) from 0.001 to 10% by weight of one or more photoinitiators and (e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.
    Type: Grant
    Filed: December 18, 1985
    Date of Patent: February 16, 1988
    Assignee: BASF Aktiengesellschaft
    Inventors: Albert Elzer, Gunnar Schornick, Axel Sanner
  • Patent number: 4714751
    Abstract: Oligomeric resins are crosslinkable by polymerization, soluble or dispersible in aqueous alkaline solutions, preferably contain more than 2 (meth)acryloyl groups and free carboxyl groups and are prepared by a special process. Photosensitive, photopolymerizable and crosslinkable recording materials for optical information fixing are based on these oligomeric resins, and lithographic printing plates are produced by a process in which the novel photosensitive recording materials are used.
    Type: Grant
    Filed: December 18, 1985
    Date of Patent: December 22, 1987
    Assignee: BASF Aktiengesellschaft
    Inventors: Gunnar Schornick, Albert Elzer, Reiner Hofmann
  • Patent number: 4673591
    Abstract: Layer-type magnetic recording media are produced by dispersing a finely divided magnetically anisotropic material in a binder which consists of not less than 30% of a radiation-curable aqueous binder dispersion, applying the dispersion onto a non-magnetic base, orienting the magnetically anisotropic material and drying and crosslinking the applied layer by means of UV or high-energy electron radiation.
    Type: Grant
    Filed: July 26, 1985
    Date of Patent: June 16, 1987
    Assignee: BASF Aktiengesellschaft
    Inventors: August Lehner, Guenter Heil, Werner Lenz, Werner Balz, Albert Kohl, Gunnar Schornick
  • Patent number: 4606994
    Abstract: Photocured layers possessing a defined controllable hardness are produced by exposing a layer of a photopolymerizable or photocrosslinkable mixture, which contains a partially crystalline polymeric binder possessing olefinic double bonds capable of undergoing polymerization, to actinic light, by a method in which the photocurable layer, prior to exposure to actinic light, is subjected to a heat treatment in which the partially crystalline parts of the polymeric binder are partially or completely fused.
    Type: Grant
    Filed: April 23, 1985
    Date of Patent: August 19, 1986
    Assignee: BASF Aktiengesellschaft
    Inventors: Karl H. Illers, Mong-Jon Jun, Gunnar Schornick
  • Patent number: 4590144
    Abstract: A photopolymerizable recording material for the production of relief plates comprises a photopolymerizable layer which can be developed in an alcoholic solution and contains a mixture of a photoinitiator, a photopolymerizable monomer and a linear, high molecular weight polyurethane which possesses activated double bonds in side branches, and is prepared using a polyether-diol from the group comprising the polyethylene glycols, propylene glycols and ethylene glycol/propylene glycol co-condensates.
    Type: Grant
    Filed: July 13, 1984
    Date of Patent: May 20, 1986
    Assignee: BASF Aktiengesellschaft
    Inventors: Gunnar Schornick, Mong-Jon Jun, Axel Sanner, August Lehner, Werner Lenz, Peter Richter, Albrecht Eckell
  • Patent number: 4522693
    Abstract: Acylphosphine sulfides of the formula ##STR1## where R.sup.1 is alkyl, cycloalkyl or an unsubstituted or substituted phenyl, naphthyl or heterocyclic radical; R.sup.2 has the meaning of R.sup.1 and can be identical to or different from R.sup.1, or is alkoxy, unsubstituted or substituted phenoxy or phenoxyalkyl, or R.sup.1 or R.sup.2 are linked together to form a ring, which may contain further alkyl substituents and fused-on benzene rings; R.sup.3 is alkyl, a cycloaliphatic radical, substituted phenyl, an unsubstituted or substituted naphthyl or heterocyclic radical or the group ##STR2## where X is unsubstituted or substituted phenylene or an aliphatic or cycloaliphatic divalent radical; and where one or more of R.sup.1, R.sup.2 and R.sup.3 may be olefinically unsaturated.These acylphosphine sulfides can be prepared from acylphosphines and sulfur and can be used as photoinitiators in photopolymerizable compositions.
    Type: Grant
    Filed: June 2, 1983
    Date of Patent: June 11, 1985
    Assignee: BASF Aktiengesellschaft
    Inventors: Andreas Henne, Anton Hesse, Guenter Heil, Gunnar Schornick
  • Patent number: 4447520
    Abstract: Acylphosphine oxides of the general formula ##STR1## where R.sup.1 is methyl or ethyl, R.sup.2 is a branched or straight-chain alkyl radical or chlorine, alkoxy or hydrogen, R.sup.3 and R.sup.4 are identical or different, and are each alkyl, alkoxy, alkylthio or chlorine and R.sup.5 is hydrogen, chlorine, alkoxy, alkylthio or alkyl, may be used as photoinitiators in photopolymerizable materials.
    Type: Grant
    Filed: August 19, 1982
    Date of Patent: May 8, 1984
    Assignee: BASF Aktiengesellschaft
    Inventors: Andreas Henne, Anton Hesse, Manfred Jacobi, Gunnar Schornick, Rudolf Vyvial, Klaus Holoch