Abstract: In a method and in a controller for an advanced process control one or more currently valid process states are stored and are compared, upon the occurrence of a reset event, with a subsequent valid process state that has been established after the re-initialization of the process controller. Upon comparison of the previously established process state, including the associated history information to the process state established after occurrence of the reset event on the basis of the newly gathered history information, it is decided whether or not a reset of the process controller has been necessary. If it is assessed that a reset has not been necessary, process control is continued on the basis of the previously established process state and possibly the presently valid process state and the relevant history information.

Abstract: In a system and a method for controlling critical dimensions of features to be formed on a substrate, a measurement device is coupled to an etch tool to form a feedback loop to control the critical dimensions on a wafer basis instead of a lot basis. In a further embodiment, the etch tool is in communication with a control unit that allows controlling of the etch tool and/or of the photolithography tool on the basis of an etch model. Thus, variations within a lot may be compensated by a software implementation of the etch model. The control unit may be implemented in the etch tool or an external device.

Abstract: A semiconductor device structure comprises a corner structure enclosed by a delineation region, wherein the shape of the corner structure does not exhibit any symmetry with respect to point symmetry and axial symmetry, such that the corner structure is unambiguously recognizable by an automated alignment system. Furthermore, the inner region of the corner structure may be filled with a pattern indicating the type of material layer in which the corner structure is formed. The corner structure exhibits a strong contrast even if the wafer is subjected to a CMP treatment.