Abstract: A polyimide oligomer of the formula wherein G is a group having a valence of t, each R is independently a C1-30 divalent bridging group, a C1-20 alkylene-X, or a C6-30 arylene-X wherein —X is —O-M?, —C(O)O-M?, —OC(O)O-M?, —S-M?, —S(O)2-M?, —S(O)3-M?, —OS(O)3-M?, or —OP(O)3-M? wherein each M? is independently Li, Na, K, Cs, Mg, Ca, Sr, Cr, Mn, Fe, Co, Ni, Cu, Zn, Cd, B, Al, Ga, In, Ge, Sn, Pb, As, or Sb, provided that at least one R is C1-20 alkylene-X or C6-30 arylene-X, q is 0 or 1, m is 0 or 1, d is 0 or 1, p is 1 or 2, t is 1 to 6, and each n is independently 1 to 1,000, the total of all values of n is greater than 4, the polyimide oligomer is thermoplastic, and Q, M, D, and V are as provided herein.

Abstract: An article comprising one or more layers of plasmonic nanoparticles located between opposing layers of dielectric materials.

Abstract: Provided are a flowrate measurement device and a flowrate measurement method. The flowrate measurement device includes an attachment portion configured to attach the flowrate measurement device to an object to be measured, and a measurement portion. The measurement portion includes a first ultrasonic transmitter, a second ultrasonic transmitter and a plurality of signal receivers between the first ultrasonic transmitter and the second ultrasonic transmitter. The plurality of signal receivers are spaced apart from each other. The first ultrasonic transmitter, the second ultrasonic transmitter and the plurality of the signal receivers are all disposed on the attachment portion, such that both the first ultrasonic transmitter and the second ultrasonic transmitter are capable of emitting an ultrasonic wave signal to the object to be measured. The signal receivers are capable of receiving an ultrasonic wave signal reflected from the object to be measured.

Abstract: A ureido-pyrimidinone oligomer having the formula (I) wherein each Z? is independently the same or different, and is a substituted or unsubstituted straight or branched chain C1-10 alkyl, each R1 is independently the same or different, and is a substituted or unsubstituted straight or branched chain C1-20 alkylene, substituted or unsubstituted C2-20 alkenylene, substituted or unsubstituted C3-8 cycloalkylene, or substituted or unsubstituted C6-18 arylene, each V is independently the same or different, and is a substituted or unsubstituted tetravalent C4-40 hydrocarbon group, each R is independently the same or different, and is a substituted or unsubstituted C1-24 divalent hydrocarbon group; and n has an average value of 2 to 50, preferably 3 to 40, more preferably 5 to 30.

Abstract: A polyimide oligomer of the formula wherein G is a group having a valence of t, each R is independently a C1-30 divalent bridging group, a C1-20 alkylene-X, or a C6-30 arylene-X wherein —X is —O-M?, —C(O)O-M?, —OC(O)O-M?, —S-M?, —S(O)2-M?, —S(O)3-M?, —OS(O)3-M?, or —OP(O)3-M? wherein each M? is independently Li, Na, K, Cs, Mg, Ca, Sr, Cr, Mn, Fe, Co, Ni, Cu, Zn, Cd, B, Al, Ga, In, Ge, Sn, Pb, As, or Sb, provided that at least one R is C1-20 alkylene-X or C6-30 arylene-X, q is 0 or 1, m is 0 or 1, d is 0 or 1, p is 1 or 2, t is 1 to 6, and each n is independently 1 to 1,000, the total of all values of n is greater than 4, the polyimide oligomer is thermoplastic, and Q, M, D, and V are as provided herein.

Abstract: In accordance with an embodiment of the disclosure, a tip array can include an elastomeric tip substrate layer comprising a first surface and an oppositely disposed second surface, the tip substrate layer being formed from an elastomeric material; a plurality of tips fixed to the first surface, the tips each comprising a tip end disposed opposite the first surface, the tips having a radius of curvature of less than about 1 micron; and an array of heaters disposed on the second surface of the tip substrate layer and configured such that when the tip substrate layer is heated by a heater, a tip disposed in a location of a heated portion of tip substrate layer is lowered relative to a tip disposed in a location of an unheated portion of the tip substrate layer.

Abstract: In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array

Abstract: Provided are methods of fabricating thin film structures that involve assembling block copolymer materials in the presence of condensed phase surfaces on both sides of the thin film, at least one of which is a chemically patterned surface configured to direct the assembly of the block copolymer material. According to various embodiments, the other of the condensed phase surfaces can be a chemically homogenous surface or a chemically patterned surface. Also provided are structures, morphologies, and templates formed in the domain structure of block copolymer materials. In certain embodiments, complex 3-D morphologies and related structures not present in bulk block copolymer materials are provided.

Abstract: The present invention relates to a phenol derivative and the preparation method and use in medicine thereof, and particular to a phenol derivative represented by general formula (A) or a stereoisomer, a solvate, a metabolite, a prodrug, a pharmaceutically acceptable salt or a cocrystal thereof, a preparation method thereof, a pharmaceutical composition comprising the same, and use of the compound or composition of the present invention in the field of the central nervous system; wherein the definitions of substituents in general formula (A) are the same as those in the Description.

Abstract: The present invention relates to a phenol derivative and the preparation method and use in medicine thereof, and particular to a phenol derivative represented by general formula (A) or a stereoisomer, a solvate, a metabolite, a prodrug, a pharmaceutically acceptable salt or a cocrystal thereof, a preparation method thereof, a pharmaceutical composition comprising the same, and use of the compound or composition of the present invention in the field of the central nervous system; wherein the definitions of substituents in general formula (A) are the same as those in the Description.

Abstract: In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array

Abstract: A method of forming a nanostructure on a substrate surface can include heating a substrate comprising a composition comprising a block copolymer and a nanostructure precursor to a temperature above the glass transition temperature of the block copolymer and below the decomposition temperature of the block copolymer to aggregate the nanostructure precursor to form a nanostructure precursor aggregated composition. The method can further include heating the nanostructure precursor aggregated composition to a temperature above the decomposition temperature of the nanostructure precursor to decompose the polymer and form the nanostructure.

Abstract: A method for making a master mold used to nanoimprint patterned magnetic recording disks that have chevron servo patterns with minimal defects uses directed self-assembly of block copolymers. A pattern of chemically modified polymer brush material is formed on the master mold substrate. The pattern includes sets of slanted stripes and interface strips between the sets of slanted stripes. A block copolymer material is deposited on the pattern, which results in directed self-assembly of the block copolymer as lamellae perpendicular to the substrate that are formed into alternating slanted stripes of alternating first and second components of the block copolymer. This component also forms on the interface strips, but as a lamella parallel to the substrate. One of the components is then removed, leaving the remaining component as a grid that acts as a mask for etching the substrate to form the master mold.

Abstract: A method using directed self-assembly of BCPs enables the making of a master disk for nanoimprinting magnetic recording disks that have patterned data islands and patterned binary encoded nondata marks. The method uses guided self-assembly of a BCP to form patterns of sets of radial lines and circumferential gaps of one of the BCP components, which can be used as an etch mask to make the master disk. The sets of radial lines and circumferential gaps can be patterned so as to encode binary numbers. The pattern is replicated as binary encoded nondata marks into the nanoimprinted disks, with the marks functioning as binary numbers for data sector numbers and/or servo sector numbers. If the disks also use a chevron servo pattern, the binary numbers can function to identify groups of tracks associated with the chevron servo pattern.

Abstract: A method for making a master disk for nanoimprinting patterned-media magnetic recording disks has patterns for both the data islands and the nondata regions. The method uses guided self-assembly of a block copolymer (BCP) to form patterns of generally radial lines and/or generally concentric rings as well as patterns of gap regions of one of the BCP components. The pattern of lines and/or rings have the BCP components aligned as lamellae perpendicular to the substrate, while the pattern of gap regions has the BCP components aligned as lamellae parallel to the substrate. One of the BCP components is removed, leaving the other BCP component as an etch mask to fabricate either the final master disk or two separate molds that are then used to fabricate the master disk.

Abstract: Provided are methods of fabricating thin film structures that involve assembling block copolymer materials in the presence of condensed phase surfaces on both sides of the thin film, at least one of which is a chemically patterned surface configured to direct the assembly of the block copolymer material. According to various embodiments, the other of the condensed phase surfaces can be a chemically homogenous surface or a chemically patterned surface. Also provided are structures, morphologies, and templates formed in the domain structure of block copolymer materials. In certain embodiments, complex 3-D morphologies and related structures not present in bulk block copolymer materials are provided.

Abstract: A method using directed self-assembly of BCPs enables the making of a master disk for nanoimprinting magnetic recording disks that have patterned data islands and patterned binary encoded nondata marks. The method uses guided self-assembly of a BCP to form patterns of sets of radial lines and circumferential gaps of one of the BCP components, which can be used as an etch mask to make the master disk. The sets of radial lines and circumferential gaps can be patterned so as to encode binary numbers. The pattern is replicated as binary encoded nondata marks into the nanoimprinted disks, with the marks functioning as binary numbers for data sector numbers and/or servo sector numbers. If the disks also use a chevron servo pattern, the binary numbers can function to identify groups of tracks associated with the chevron servo pattern.

Abstract: A method for making a master disk for nanoimprinting patterned-media magnetic recording disks has patterns for both the data islands and the nondata regions. The method uses guided self-assembly of a block copolymer (BCP) to form patterns of generally radial lines and/or generally concentric rings as well as patterns of gap regions of one of the BCP components. The pattern of lines and/or rings have the BCP components aligned as lamellae perpendicular to the substrate, while the pattern of gap regions has the BCP components aligned as lamellae parallel to the substrate. One of the BCP components is removed, leaving the other BCP component as an etch mask to fabricate either the final master disk or two separate molds that are then used to fabricate the master disk.

Abstract: A method for making a master mold used to nanoimprint patterned magnetic recording disks that have chevron servo patterns with minimal defects uses directed self-assembly of block copolymers. A pattern of chemically modified polymer brush material is formed on the master mold substrate. The pattern includes sets of slanted stripes and interface strips between the sets of slanted stripes. A block copolymer material is deposited on the pattern, which results in directed self-assembly of the block copolymer as lamellae perpendicular to the substrate that are formed into alternating slanted stripes of alternating first and second components of the block copolymer. This component also forms on the interface strips, but as a lamella parallel to the substrate. One of the components is then removed, leaving the remaining component as a grid that acts as a mask for etching the substrate to form the master mold.