Patents by Inventor Hagyoul BAE

Hagyoul BAE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220140148
    Abstract: Provided is a ferroelectric semiconductor device including a source and a drain having different polarities. The ferroelectric semiconductor may include a ferroelectric including zirconium oxide (ZrO2), hafnium oxide (HfO2), and/or hafnium-zirconium oxide (HfxZr1?xO, 0<x<1). The semiconductor device may have memory-like characteristics.
    Type: Application
    Filed: November 1, 2021
    Publication date: May 5, 2022
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Seunggeol NAM, Jinseong HEO, Sangwook KIM, Hagyoul BAE, Taehwan MOON, Yunseong LEE
  • Publication number: 20220140104
    Abstract: Provided is a ferroelectric semiconductor device including a ferroelectric layer and two or more electrode layers. The semiconductor device may include a first electrode layer and a second electrode layer which have thermal expansion coefficients less than the thermal expansion coefficient of the ferroelectric layer. The difference between the thermal expansion coefficients of the second electrode layer and the ferroelectric layer may be greater than the difference between the thermal expansion coefficients of the first electrode layer and the ferroelectric. The second electrode layer may have a thickness greater than the thickness of the first electrode layer.
    Type: Application
    Filed: November 1, 2021
    Publication date: May 5, 2022
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jinseong HEO, Yunseong LEE, Seunggeol NAM, Hagyoul BAE, Taehwan MOON, Sanghyun JO
  • Patent number: 11133312
    Abstract: A semiconductor device and a method for manufacturing the semiconductor device are provided. The semiconductor device includes: a substrate: a drain region vertically disposed on the substrate; a body region vertically disposed on the drain region; a source region vertically disposed on the body region; a bit-line connected to the drain region and extending in a first direction; and a word-line connected to the source region and extending in a second direction that is different from the first direction. The drain region, the body region, and the source region together define a pillar extending in a third direction that is perpendicular to the first and second direction.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: September 28, 2021
    Assignees: SK hynix Inc.
    Inventor: Hagyoul Bae
  • Publication number: 20190378841
    Abstract: A semiconductor device and a method for manufacturing the semiconductor device are provided. The semiconductor device includes: a substrate: a drain region vertically disposed on the substrate; a body region vertically disposed on the drain region; a source region vertically disposed on the body region; a bit-line connected to the drain region and extending in a first direction; and a word-line connected to the source region and extending in a second direction that is different from the first direction. The drain region, the body region, and the source region together define a pillar extending in a third direction that is perpendicular to the first and second direction.
    Type: Application
    Filed: March 13, 2019
    Publication date: December 12, 2019
    Inventor: Hagyoul BAE