Patents by Inventor Haitao Wang

Haitao Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10516875
    Abstract: A method and an apparatus for obtaining a depth image by using a time-of-flight sensor may generate a depth image based on a plurality of images in which a motion blur area caused by a movement of an object was corrected. In this case, since the motion blur area is corrected after an initial phase difference of emitted light is compensated, an accuracy of the depth image may be enhanced.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: December 24, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji Zhao, Wen Zhou, Haitao Wang, Yonghwa Park
  • Patent number: 10504765
    Abstract: Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: December 10, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Kartik Ramaswamy, Anwar Husain, Haitao Wang, Evans Yip Lee, Jaeyong Cho, Hamid Noorbakhsh, Kenny L. Doan, Sergio Fukuda Shoji, Chunlei Zhang
  • Publication number: 20190348260
    Abstract: Methods and apparatus for boosting ion energies are contemplated herein. In one embodiment, the methods and apparatus comprises a controller, a process chamber with a symmetrical plasma source configured to process a wafer, one or more very high frequency (VHF) sources, coupled to the process chamber, to generate plasma density and two or more frequency generators that generate low frequencies relative to the one or more VHF sources, coupled to a bottom electrode of the process chamber, the two or more low frequency generators configured to dissipate energy in the plasma sheath, wherein the controller controls the one or more VHF sources to generate a VHF signal and the two or more low frequency sources to generate two or more low frequency signals.
    Type: Application
    Filed: July 24, 2019
    Publication date: November 14, 2019
    Inventors: WONSEOK LEE, KARTIK RAMASWAMY, Ankur AGARWAL, Haitao WANG
  • Patent number: 10466485
    Abstract: Provided is a head-mounted display (HMD) apparatus, including a light modulator and eye lens, where the light modulator is configured to perform integral imaging on an image output from a 2D display panel, to form a light field image, the eye lens are configured to magnify the light field image formed by the light modulator.
    Type: Grant
    Filed: January 25, 2018
    Date of Patent: November 5, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Mingcai Zhou, Tao Hong, Weiming Li, Haitao Wang
  • Patent number: 10440344
    Abstract: A method and apparatus for correcting an image error in a naked-eye three-dimensional (3D) display may include controlling a flat-panel display displaying a stripe image, calculating a raster parameter of the naked-eye 3D display based on a captured stripe image, and correcting a stereoscopic image displayed on the naked-eye 3D display based on the calculated raster parameter, wherein the naked-eye 3D display includes the flat-panel display and the raster.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: October 8, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Weiming Li, Mingcai Zhou, Tao Hong, Dong Kyung Nam, Hyoseok Hwang, Jinho Lee, Zairan Wang, Zhihua Liu, Haitao Wang
  • Publication number: 20190291112
    Abstract: Provided is a microfluidic chip for generating a plurality of droplets comprising plural droplet-forming units serially connected together, an inlet for receiving the loading fluid and providing the loading fluid to the plural droplet-forming units, and an outlet for discharging the loading fluid remained after passing through the plural droplet-forming units. Each of the individual droplet-forming unit include an inflow channel, a neck channel, a droplet-forming well and a bypass channel therearound, a restricted flow port element, and an outflow channel, the arrangement of which allows the microfluidic chip to form robust and stable droplets for reliable and flexible drug screening assays using a small sample input size.
    Type: Application
    Filed: March 21, 2019
    Publication date: September 26, 2019
    Inventors: Ada Hang-Heng WONG, Chuxia DENG, Yanwei JIA, Haoran LI, Pui-In MAK, Rui Paulo da Silva MARTINS, Yan LIU, Chi Man VONG, Hang Cheong WONG, Pak Kin WONG, Haitao WANG, Heng SUN
  • Publication number: 20190286588
    Abstract: The data processing method for a baseboard management controller (BMC) system including two or more chips is provided. The method includes obtaining a first command; determining a first function corresponding to the first command based on the first command; searching for at least one first chip supporting the first function in the two or more chips; and sending the first command to the at least one first chip supporting the first function, such that the at least one first chip executes the first command to implement the first function.
    Type: Application
    Filed: March 15, 2019
    Publication date: September 19, 2019
    Inventor: Haitao WANG
  • Patent number: 10410889
    Abstract: In some embodiments, a plasma processing apparatus includes a processing chamber to process a substrate; a mounting surface defined within the processing chamber to support a substrate disposed within the processing chamber; a showerhead disposed within the processing chamber and aligned so as to face the mounting surface, the showerhead defining a plurality of orifices to introduce a process gas into the processing chamber toward a substrate disposed within the processing chamber; and one or more magnets supported by the showerhead and arranged so that a radial component of a magnetic field applied by each of the one or more magnets has a higher flux density proximate a first region corresponding to an edge surface region of a substrate when disposed within the processing chamber than at a second region corresponding to an interior surface region of a substrate when disposed within the processing chamber.
    Type: Grant
    Filed: June 30, 2015
    Date of Patent: September 10, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: S. M. Reza Sadjadi, Haitao Wang, Jie Zhou, Tza-Jing Gung, Chunlei Zhang, Fernando M. Silveira
  • Publication number: 20190271082
    Abstract: Embodiments of the present disclosure relate to a showerhead assembly for use in a processing chamber. The showerhead assembly includes a porous insert disposed in a space defined between a gas distribution plate and a base plate to moderate the corrosive radicals resulting from plasma ignition to reduce particle issues and metal contamination in the chamber. The porous insert is a conductive material, such as metal, used to reduce the gap electrical field strength, or may be a dielectric material such as ceramic, polytetrafluoroethylene, polyamide-imide, or other materials with a low dielectric loss and high electrical field strength under conditions of high frequency and strong electric fields. As such, the electrical breakdown threshold is enhanced. The porous insert may reduce and/or eliminate showerhead backside plasma ignition and may include multiple concentric narrow rings that cover gas holes of the gas distribution plate.
    Type: Application
    Filed: May 21, 2019
    Publication date: September 5, 2019
    Inventors: Haitao WANG, Hamid NOORBAKHSH, Chunlei ZHANG, Sergio Fukuda SHOJI, Kartik RAMASWAMY, Roland SMITH, Brad L. MAYS
  • Publication number: 20190261917
    Abstract: Embodiments of the present disclosure provide a device for determining a location of a blood vessel and a method thereof. The device includes a plurality of sensors, a processor, and an indicating device. The plurality of sensors may detect pressure values at a plurality of skin locations in contact with the plurality of sensors. The processor may determine the location of the blood vessel based on the pressure values. The pressure value at the skin location corresponding to the location of the blood vessel is greater than the pressure values at both sides of the skin location in a direction perpendicular to a direction of the blood vessel. The indicating device may indicate the location of the blood vessel.
    Type: Application
    Filed: November 29, 2018
    Publication date: August 29, 2019
    Inventors: Qiangqiang LUO, Yingxi TAI, Haitao WANG, Zhenfang LI
  • Patent number: 10395896
    Abstract: Methods and apparatus for boosting ion energies are contemplated herein. In one embodiment, the methods and apparatus comprises a controller, a process chamber with a symmetrical plasma source configured to process a wafer, one or more very high frequency (VHF) sources, coupled to the process chamber, to generate plasma density and two or more frequency generators that generate low frequencies relative to the one or more VHF sources, coupled to a bottom electrode of the process chamber, the two or more low frequency generators configured to dissipate energy in the plasma sheath, wherein the controller controls the one or more VHF sources to generate a VHF signal and the two or more low frequency sources to generate two or more low frequency signals.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: August 27, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Wonseok Lee, Kartik Ramaswamy, Ankur Agarwal, Haitao Wang
  • Patent number: 10378108
    Abstract: Embodiments of the present disclosure relate to a showerhead assembly for use in a processing chamber. The showerhead assembly includes a porous insert disposed in a space defined between a gas distribution plate and a base plate to moderate the corrosive radicals resulting from plasma ignition to reduce particle issues and metal contamination in the chamber. The porous insert is a conductive material, such as metal, used to reduce the gap electrical field strength, or may be a dielectric material such as ceramic, polytetrafluoroethylene, polyamide-imide, or other materials with a low dielectric loss and high electrical field strength under conditions of high frequency and strong electric fields. As such, the electrical breakdown threshold is enhanced. The porous insert may reduce and/or eliminate showerhead backside plasma ignition and may include multiple concentric narrow rings that cover gas holes of the gas distribution plate.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: August 13, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Haitao Wang, Hamid Noorbakhsh, Chunlei Zhang, Sergio Fukuda Shoji, Kartik Ramaswamy, Roland Smith, Brad L. Mays
  • Patent number: 10356397
    Abstract: A three-dimensional (3D) display apparatus and method are provided. The 3D display apparatus may include a display screen configured to display each of a plurality of sub-images included in a single frame of a 3D image using a time-division multiplexing (TDM), a polarizer configured to polarize each of the displayed sub-images by changing a polarization direction using the TDM, in synchronization with the display screen, and microlens arrays arranged in a plurality of layers and configured to sequentially refract the polarized sub-images, respectively.
    Type: Grant
    Filed: January 5, 2016
    Date of Patent: July 16, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mingcai Zhou, DongKyung Nam, Jinho Lee, Kang Xue, Weiming Li, Xiying Wang, Zhihua Liu, Gengyu Ma, Haitao Wang, Tao Hong
  • Patent number: 10330963
    Abstract: The present disclosure provides a machine table for supporting a substrate. The machine table includes a body; pin holes each penetrating through the body in a thickness direction; and support pins each received in the pin hole and movable up and down in the thickness direction, each support pin including a built-in cavity from which an antistatic liquid is sprayed onto an upper surface of the body.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: June 25, 2019
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Haitao Wang, Wen Wang, Hongkang Jia
  • Publication number: 20190189481
    Abstract: A method and apparatus for de-chucking a workpiece is described that uses a swing voltage sequence. One example pertains to a method that includes applying a mechanical force from an electrostatic chuck against the back side of a workpiece that is electrostatically clamped to the chuck, applying a sequence of voltage pulses with a same polarity to the electrodes, each pulse of the sequence having a lower voltage than the preceding pulse, each pulse of the sequence having a lower voltage than the preceding pulse, and determining whether the workpiece is released from the chuck after the sequence of additional voltage pulses and if the workpiece is not released then repeating applying the sequence of voltage pulses.
    Type: Application
    Filed: February 6, 2019
    Publication date: June 20, 2019
    Inventors: Haitao Wang, Wonseok Lee, Sergio Fukuda Shoji, Chunlei Zhang, Kartik Ramaswamy
  • Patent number: 10324686
    Abstract: An electronic device and an operation method therefor are provided. The electronic device may include: a display panel; an optical element; and a control unit which senses a location of the optical element, generates a 3D image through via display panel and the optical element in a state in which the display panel and the optical element overlap each other, and generates a 2D image via the display panel in a state in which the optical element is detached or separated from the display panel.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: June 18, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Shaohui Jiao, Haitao Wang, Mingcai Zhou, Tao Hong, Weiming Li, Xiying Wang, Dong Kyung Nam
  • Patent number: 10317687
    Abstract: A display device may include a plurality of display panels, and light path adjusters disposed on upper portions of the plurality of the display panels. The light path adjusters include a lens array configured to transfer different beams emitted from the plurality of display panels to each eye of a user, and a joint removal structure disposed on one side of the light path adjusters corresponding to a connecting joint that connects the plurality of display panels. The joint removal structure is configured to refract the beams emitted from the plurality of display panels.
    Type: Grant
    Filed: November 9, 2015
    Date of Patent: June 11, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Weiming Li, Kang Xue, Tao Hong, Xiying Wang, Mingcai Zhou, Zhihua Liu, Gengyu Ma, Haitao Wang
  • Patent number: 10242893
    Abstract: A method and apparatus for de-chucking a workpiece is described that uses a swing voltage sequence. One example pertains to a method that includes applying a mechanical force from an electrostatic chuck against the back side of a workpiece that is electrostatically clamped to the chuck, applying a sequence of voltage pulses with a same polarity to the electrodes, each pulse of the sequence having a lower voltage than the preceding pulse, each pulse of the sequence having a lower voltage than the preceding pulse, and determining whether the workpiece is released from the chuck after the sequence of additional voltage pulses and if the workpiece is not released then repeating applying the sequence of voltage pulses.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: March 26, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Haitao Wang, Wonseok Lee, Sergio Fukuda Shoji, Chunlei Zhang, Kartik Ramaswamy
  • Publication number: 20190090338
    Abstract: Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC voltage, and methods of applying a pulsed DC voltage, to a substrate during plasma assisted or plasma enhanced semiconductor manufacturing processes.
    Type: Application
    Filed: September 20, 2017
    Publication date: March 21, 2019
    Inventors: Travis Lee KOH, Haitao WANG, Philip Allan KRAUS, Vijay D. PARKHE, Daniel DISTASO, Christopher A. ROWLAND, Mark MARKOVSKY, Robert CASANOVA
  • Patent number: D871600
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: December 31, 2019
    Inventor: Haitao Wang