Patents by Inventor Hajime Kawano
Hajime Kawano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10720306Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: February 14, 2019Date of Patent: July 21, 2020Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Patent number: 10707047Abstract: A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.Type: GrantFiled: August 31, 2016Date of Patent: July 7, 2020Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Noritsugu Takahashi, Makoto Sakakibara, Wataru Mori, Hajime Kawano, Yuko Sasaki
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Publication number: 20200203120Abstract: A charged particle beam device includes a scintillator and a light guide. The light guide has an incident surface configured to incident a light from the scintillator, an emission surface configured to emit a light incident from the incident surface, and a first surface configured to guide the light incident from the incident surface to a side of the emission surface. The light guide has a bent portion. The bent portion has a second surface configured to guide the light to the side of the emission surface in regions excluding a region between the incident surface and the emission surface.Type: ApplicationFiled: January 24, 2020Publication date: June 25, 2020Inventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Hajime KAWANO, Shahedul HOQUE
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Patent number: 10692687Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.Type: GrantFiled: January 18, 2019Date of Patent: June 23, 2020Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Wen Li, Shinichi Murakami, Hiroyuki Takahashi, Yuko Sasaki, Minoru Yamazaki, Hajime Kawano
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Patent number: 10679821Abstract: A charged particle beam device includes a scintillator and a light guide. The light guide has an incident surface configured to incident a light from the scintillator, an emission surface configured to emit a light incident from the incident surface, and a first surface configured to guide the light incident from the incident surface to a side of the emission surface. The light guide has a bent portion. The bent portion has a second surface configured to guide the light to the side of the emission surface in regions excluding a region between the incident surface and the emission surface.Type: GrantFiled: January 24, 2020Date of Patent: June 9, 2020Assignee: Hitachi High-Tech CorporationInventors: Yoshifumi Sekiguchi, Shin Imamura, Hajime Kawano, Shahedul Hoque
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Publication number: 20200090897Abstract: An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.Type: ApplicationFiled: September 17, 2019Publication date: March 19, 2020Inventors: Keigo KASUYA, Shuhei ISHIKAWA, Kenji TANIMOTO, Hajime KAWANO, Hideo TODOKORO, Souichi KATAGIRI, Takashi DOI, Soichiro MATSUNAGA
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Patent number: 10593512Abstract: The present invention provides a light guide capable of guiding light generated by a scintillator at high efficiency to a photoreceiving element, a detector, and a charged particle beam device. For attaining the purpose, the present invention proposes a light guide that guides light generated by a scintillator to a photoreceiving element, provided with a scintillator containment portion formed of a first surface facing a surface opposite to a charged particle incident surface of the scintillator and a second surface facing a surface different from the surface opposite to the charged particle incident surface of the scintillator, and a tilted surface reflecting light incident from the second surface to the inside of the light guide.Type: GrantFiled: February 3, 2017Date of Patent: March 17, 2020Assignee: Hitachi High-Technologies CorporationInventors: Yoshifumi Sekiguchi, Shin Imamura, Hajime Kawano, Shahedul Hoque
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Patent number: 10559447Abstract: A charged particle apparatus including a charged particle source unit; a blanking electrode unit that blanks a charged particle beam launched from the charged particle source unit; a deflecting electrode unit that deflects the charged particle beam; an objective lens unit that converges the charged particle beam deflected by the deflecting electrode unit and radiates the charged particle beam to a surface of a sample; a secondary charged particle detection unit that detects a secondary charged particle generated from the sample; a signal processing unit that processes a signal obtained by detecting the secondary charged particle; and a control unit that corrects a transient signal when the blanking of the charged particle beam is turned off by the blanking electrode, such that an image with no distortion can be obtained even when the blanking electrode is operated to turn on and off at a high speed.Type: GrantFiled: April 6, 2016Date of Patent: February 11, 2020Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Ryo Kadoi, Wen Li, Kazuki Ikeda, Hajime Kawano, Hiroyuki Takahashi
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Publication number: 20200043695Abstract: A charged particle beam device includes a deflection unit that deflects a charged particle beam released from a charged particle source to irradiate a sample, a reflection plate that reflects secondary electrons generated from the sample, and a control unit that controls the deflection unit based on an image generated by detecting the secondary electrons reflected from the reflection plate. The deflection unit includes an electromagnetic deflection unit that electromagnetically scans with the charged particle beam by a magnetic field and an electrostatic deflection unit that electrostatically scans with the charged particle beam by an electric field. The control unit controls the electromagnetic deflection unit and the electrostatic deflection unit, superimposes an electromagnetic deflection vector generated by the electromagnetic scanning and an electrostatic deflection vector generated by the electrostatic scanning, and controls at least a trajectory of the charged particle beam.Type: ApplicationFiled: March 6, 2017Publication date: February 6, 2020Inventors: Kazuki IKEDA, Wen LI, Takuma NISHIMOTO, Hiroyuki TAKAHASHI, Wataru MORI, Makoto SUZUKI, Hajime KAWANO
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Patent number: 10546715Abstract: The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction.Type: GrantFiled: September 29, 2015Date of Patent: January 28, 2020Assignee: Hitachi High—Technologies CorporationInventors: Shahedul Hoque, Hajime Kawano, Yoshinori Momonoi, Hideki Itai, Minoru Yamazaki, Hiroshi Nishihama
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Patent number: 10546718Abstract: Even in a case where a disturbance is applied from an adjacently disposed power supply circuit or the like, in order to realize a reduction in ripple, a high-voltage power supply device is configured to include a drive circuit, a transformer that boosts an output voltage of the drive circuit, a boost circuit that further boosts a voltage boosted by the transformer, a shield that covers the transformer and the boost circuit, a filter circuit that filters, smoothes, and outputs a high voltage output from the boost circuit, and an impedance loop circuit configured by connection of a plurality of impedance elements into a loop shape. A grounding point of the boost circuit, a grounding point of the shield, and a grounding point of the filter circuit are configured to be grounded via the impedance loop circuit, and this is applied to a high-voltage power supply unit that applies a high voltage to an electron gun of a charged particle beam apparatus.Type: GrantFiled: December 8, 2015Date of Patent: January 28, 2020Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Takuma Nishimoto, Wen Li, Hiroyuki Takahashi, Hajime Kawano
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Publication number: 20190355549Abstract: The disclosure provides a charged particle detector including a scintillator that emits light with stable intensity and obtains high light emission intensity regardless of an energy of an incident electron. The disclosure provides the charged particle detector including: a first light-emitting part (21) in which a layer containing Ga1-x-yAlxInyN (where 0?x<1, 0?y<1) and a layer containing GaN are alternately laminated; a second light-emitting part (23) in which the layer containing Ga1-x-yAlxInyN (where 0?x<1, 0?y<1) and the layer containing GaN are alternately laminated; and a non-light-emitting part (22) that is interposed between the first light-emitting part (21) and the second light-emitting part (23) (see FIG. 2).Type: ApplicationFiled: January 25, 2018Publication date: November 21, 2019Inventors: Shin IMAMURA, Takashi OHSHIMA, Tomonobu TSUCHIYA, Hajime KAWANO, Shahedul HOQUE, Shunsuke MIZUTANI, Makoto SUZUKI
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Publication number: 20190341225Abstract: Provided is a charged particle beam device to enable determination of a noise source of a charged particle beam device that can cause a noise frequency component superimposed on a measurement image. The charged particle beam device includes a unit that extracts information regarding a noise source.Type: ApplicationFiled: December 27, 2016Publication date: November 7, 2019Inventors: Takuma NISHIMOTO, Wen LI, Hiroyuki TAKAHASHI, Wataru MORI, Hajime KAWANO
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Publication number: 20190318906Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.Type: ApplicationFiled: January 18, 2019Publication date: October 17, 2019Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Wen LI, Shinichi MURAKAMI, Hiroyuki TAKAHASHI, Yuko SASAKI, Minoru YAMAZAKI, Hajime KAWANO
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Patent number: 10446359Abstract: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.Type: GrantFiled: January 28, 2015Date of Patent: October 15, 2019Assignee: Hitachi High-Technologies CorporationInventors: Toshiyuki Yokosuka, Hideyuki Kazumi, Yuzuru Mizuhara, Hajime Kawano
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Patent number: 10424459Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit.Type: GrantFiled: June 5, 2017Date of Patent: September 24, 2019Assignee: Hitachi High-Technologies CorporationInventors: Wen Li, Ryo Kadoi, Kazuki Ikeda, Hiroyuki Takahashi, Hajime Kawano
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Patent number: 10373797Abstract: In order to improve visibility of a measurement/inspection image in an inspection measurement apparatus inspecting or measuring a fine pattern, a charged particle beam device is configured to include a charged particle optical system that irradiates a surface of a sample with a converged charged particle beam so as to perform scanning, a detection unit that detects secondary charged particles generated from the sample irradiated with the charged particle beam by the charged particle optical system, an image forming unit that receives a detection signal from the detection unit and forms an image of the sample, an image processing unit that processes the image formed in the image forming unit, and a display unit that displays a result processed by the image processing unit, in which the image forming unit includes an analog signal processing portion that processes an analog signal component of the detection signal in the detection unit so as to form an image, a pulse count method signal processing portion thatType: GrantFiled: February 16, 2016Date of Patent: August 6, 2019Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Wen Li, Kazuki Ikeda, Hajime Kawano, Hiroyuki Takahashi, Makoto Suzuki
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Publication number: 20190206654Abstract: A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.Type: ApplicationFiled: August 31, 2016Publication date: July 4, 2019Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Noritsugu TAKAHASHI, Makoto SAKAKIBARA, Wataru MORI, Hajime KAWANO, Yuko SASAKI
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Publication number: 20190198284Abstract: Provided is a high-brightness, high-current electron source including a wire-like member. The wire-like member has an electron emission plane at the tip of the wire-like member. The electron emission plane has a projectingly curved surface. At least the surface of the electron emission plane is formed of an amorphous material.Type: ApplicationFiled: September 6, 2016Publication date: June 27, 2019Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Soichiro MATSUNAGA, Yasunari SOHDA, Souichi KATAGIRI, Hajime KAWANO, Takashi DOI
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Publication number: 20190180979Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: February 14, 2019Publication date: June 13, 2019Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI