Patents by Inventor Hamid Noorbakhsh

Hamid Noorbakhsh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10886107
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a body having a first side and a second side; a gas distribution plate disposed proximate the second side of the body and having an annular channel formed in a side surface; and a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the clamp includes a body and a protrusion extending radially inward into the annular groove, and wherein a portion of the gas distribution plate extends over a bottom surface of the clamp.
    Type: Grant
    Filed: July 2, 2019
    Date of Patent: January 5, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Hamid Noorbakhsh, Xiaoping Zhou
  • Publication number: 20200411355
    Abstract: Embodiments of a plug for use in an electrostatic chuck are provided herein. In some embodiments, a plug for use in an electrostatic chuck includes a polymer sleeve having a central opening; a core press-fit in the central opening of the polymer sleeve and having a gas flow channel disposed therethrough; a cap disposed on the polymer sleeve and covering the core, the cap having a through hole through the cap; and an annular channel disposed between the core and the cap, wherein the core, the cap, and the annular channel define a gas flow path through the plug.
    Type: Application
    Filed: June 12, 2020
    Publication date: December 31, 2020
    Inventors: Hamid NOORBAKHSH, Anwar HUSAIN, Kartik RAMASWAMY, Sergio Fukuda SHOJI, Reyn Tetsuro WAKABAYASHI
  • Publication number: 20200381282
    Abstract: Methods and apparatus for preventing or reducing arcing of an electrostatic chuck in a process chamber. In some embodiments, a method of preventing or reducing arcing of an electrostatic chuck includes forming a first recess in at least a portion of a sidewall of the electrostatic chuck and filling the first recess with a conformable dielectric material that remains conformable (elastic) over a temperature range of at least approximately zero degrees Celsius to approximately 80 degrees Celsius. In some embodiments, the first recess is filled with the conformable dielectric material such that the conformable dielectric material does not bond to at least one surface of the first recess. The conformable dielectric material may also be used to fill a second recess in a dielectric sleeve adjacent to the electrostatic chuck.
    Type: Application
    Filed: May 13, 2020
    Publication date: December 3, 2020
    Inventors: Anwar HUSAIN, Hamid NOORBAKHSH, Kartik RAMASWAMY
  • Patent number: 10854425
    Abstract: Methods and systems for controlling temperatures in plasma processing chamber with reduced controller response times and increased stability. Temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the processing chamber. A feedforward control signal compensating disturbances in the temperature attributable to the plasma power may be combined with a feedback control signal counteracting error between a measured and desired temperature.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: December 1, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Chetan Mahadeswaraswamy, Walter R Merry, Sergio Fukuda Shoji, Chunlei Zhang, Yashaswini Pattar, Duy D Nguyen, Tina Tsong, Shane C Nevil, Douglas A Buchberger, Jr., Fernando M Silveira, Brad L Mays, Kartik Ramaswamy, Hamid Noorbakhsh
  • Patent number: 10847347
    Abstract: The present disclosure generally relates to apparatuses and methods for controlling a plasma sheath near a substrate edge. The apparatus relates to a processing chamber and/or a substrate support that includes an edge ring assembly with an edge ring electrode and an electrostatic chuck with a chucking electrode. The edge ring assembly is positioned adjacent the electrostatic chuck, such as with the edge ring assembly positioned exterior to or about the electrostatic chuck. The edge ring assembly includes a base and a cap positioned above the base with the edge ring electrode positioned between the cap and the base. The base of the edge ring electrode may include an inner recess and/or an outer recess with the cap including one or more lips that extend into the inner recess and/or the outer recess. One or more silicon rings and/or insulating rings are positioned adjacent the edge ring assembly.
    Type: Grant
    Filed: May 17, 2019
    Date of Patent: November 24, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Hamid Noorbakhsh, Anwar Husain, Reyn Wakabayashi
  • Publication number: 20200365375
    Abstract: Apparatus for stray plasma prevention for substrate processing chambers are provided herein. In some embodiments, an apparatus for preventing stray plasma in a substrate processing chamber includes: a tubular body formed of a dielectric material and defining a central opening passing therethrough from a first end to a second end of the tubular body; and a flange extending radially from the first end of the tubular body. The apparatus can be formed from a process compatible plastic material, such as polyoxymethylene (POM), polyetheretherketone (PEEK), or polytetrafluoroethylene (PTFE).
    Type: Application
    Filed: May 13, 2020
    Publication date: November 19, 2020
    Inventors: Reyn WAKABAYASHI, Hamid NOORBAKHSH
  • Publication number: 20200357675
    Abstract: Methods and apparatus for dechucking a wafer from a surface of an electrostatic chuck (ESC). In some embodiments, a method comprises reducing a pressure of a gas applied to a backside of the wafer to approximately zero psi; reducing a downward pressure in a cylinder bore of a lifting actuator to approximately atmospheric pressure while a processing volume of the processing chamber is in a vacuum state to create a constant upward force on the wafer, the constant upward force less than a breaking force of the wafer; and sweeping a voltage applied to the ESC to dechuck the wafer; and monitoring a sensor on the lifting actuator that is interposed between a chucking position of the lifting actuator and a transfer position of the lifting actuator to detect when the wafer is dechucked.
    Type: Application
    Filed: May 6, 2019
    Publication date: November 12, 2020
    Inventors: HAMID NOORBAKHSH, ANWAR HUSAIN, HAITAO WANG, SERGIO F SHOJI
  • Patent number: 10790120
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the base, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed in a gap between the base and gas distribution plate.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: September 29, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jason Della Rosa, Hamid Noorbakhsh, Vladimir Knyazik, Jisoo Kim, Wonseok Lee, Usama Dadu
  • Patent number: 10745807
    Abstract: Embodiments of the present disclosure relate to a showerhead assembly for use in a processing chamber. The showerhead assembly includes a porous insert disposed in a space defined between a gas distribution plate and a base plate to moderate the corrosive radicals resulting from plasma ignition to reduce particle issues and metal contamination in the chamber. The porous insert is a conductive material, such as metal, used to reduce the gap electrical field strength, or may be a dielectric material such as ceramic, polytetrafluoroethylene, polyamide-imide, or other materials with a low dielectric loss and high electrical field strength under conditions of high frequency and strong electric fields. As such, the electrical breakdown threshold is enhanced. The porous insert may reduce and/or eliminate showerhead backside plasma ignition and may include multiple concentric narrow rings that cover gas holes of the gas distribution plate.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: August 18, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Haitao Wang, Hamid Noorbakhsh, Chunlei Zhang, Sergio Fukuda Shoji, Kartik Ramaswamy, Roland Smith, Brad L. Mays
  • Publication number: 20200238303
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a substrate processing chamber includes a body having a first side and an opposing second side; a gas distribution plate disposed proximate the second side of the body; and a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the body is electrically coupled to the gas distribution plate through the clamp.
    Type: Application
    Filed: April 10, 2020
    Publication date: July 30, 2020
    Inventors: Dmitry LUBOMIRSKY, Vladimir KNYAZIK, Hamid NOORBAKHSH, Jason DELLA ROSA, Zheng John YE, Jennifer Y. SUN, Sumanth BANDA
  • Patent number: 10697061
    Abstract: An apparatus and method for cooling a gas distribution assembly with a cooling plate. The cooling plate having a body having a top surface, an outer perimeter, a center, an inner zone and an outer zone. A plurality of channels formed through the top surface. The plurality of channels having a first outer channel having one or more first outer channel segments configured for flowing a first cooling fluid from a cooling fluid inlet to a cooling fluid outlet and a first inner channel disposed between the first outer channel and the center having one or more first inner channel segments configured for flowing a second cooling fluid from a cooling fluid inlet to a cooling fluid outlet wherein flow in adjacent segments is in an opposite direction.
    Type: Grant
    Filed: November 9, 2017
    Date of Patent: June 30, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Kartik Shah, Nisha Prakash Holla, Vijaykumar Krithivasan, Anantha K. Subramani, Hamid Noorbakhsh
  • Publication number: 20200194229
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the base, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed in a gap between the base and gas distribution plate.
    Type: Application
    Filed: February 25, 2020
    Publication date: June 18, 2020
    Inventors: JASON DELLA ROSA, HAMID NOORBAKHSH, VLADIMIR KNYAZIK, JISOO KIM, WONSEOK LEE, USAMA DADU
  • Patent number: 10636629
    Abstract: Embodiments disclosed herein generally relate to a substrate processing chamber component assembly with a split slit liner door assembly. In one embodiment, the split slit liner door assembly has a first door portion having a top surface, a rear face and a font face, a RF conductive gasket is disposed on the front face of the first door portion, a second door portion having sides, a bottom and a front surface, the bottom coupled to the actuator, and a linkage assembly coupling the first door portion to the second door portion wherein the linkage assembly is configured to translate a vertical motion of the second door portion relative to a first door portion and a horizontal motion spacing the first door portion from the second door portion.
    Type: Grant
    Filed: October 5, 2017
    Date of Patent: April 28, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Hamid Noorbakhsh, Reyn Wakabayashi
  • Patent number: 10625277
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a substrate processing chamber includes a body having a first side and an opposing second side; a gas distribution plate disposed proximate the second side of the body; and a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the body is electrically coupled to the gas distribution plate through the clamp.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: April 21, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Dmitry Lubomirsky, Vladimir Knyazik, Hamid Noorbakhsh, Jason Della Rosa, Zheng John Ye, Jennifer Y. Sun, Sumanth Banda
  • Patent number: 10607816
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a body having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the body, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body; and a thermal gasket disposed in a gap between the body and gas distribution plate.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: March 31, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jason Della Rosa, Hamid Noorbakhsh, Vladimir Knyazik, Jisoo Kim, Wonseok Lee, Usama Dadu
  • Publication number: 20200066495
    Abstract: The present disclosure generally relates to apparatuses and methods for controlling a plasma sheath near a substrate edge. The apparatus relates to a processing chamber and/or a substrate support that includes an edge ring assembly with an edge ring electrode and an electrostatic chuck with a chucking electrode. The edge ring assembly is positioned adjacent the electrostatic chuck, such as with the edge ring assembly positioned exterior to or about the electrostatic chuck. The edge ring assembly includes a base and a cap positioned above the base with the edge ring electrode positioned between the cap and the base. The base of the edge ring electrode may include an inner recess and/or an outer recess with the cap including one or more lips that extend into the inner recess and/or the outer recess. One or more silicon rings and/or insulating rings are positioned adjacent the edge ring assembly.
    Type: Application
    Filed: May 17, 2019
    Publication date: February 27, 2020
    Inventors: Hamid NOORBAKHSH, Anwar HUSAIN, Reyn WAKABAYASHI
  • Publication number: 20200066493
    Abstract: Methods and apparatus for confining plasma in a process chamber. In some embodiments, the apparatus includes a first liner with a first set of openings, the first liner configured to surround a substrate support when installed and a second liner with a second set of openings, the second liner configured to surround the substrate support under the first liner when installed, wherein the first set of openings and the second set of openings are configured to be offset from each other when installed in the process chamber to prevent a line-of-sight through the first liner and the second liner from a top down viewpoint, and wherein the first liner and the second liner are configured to be spaced apart vertically when installed in the process chamber to allow high fluid conductance through the first set of openings and the second set of openings.
    Type: Application
    Filed: June 21, 2019
    Publication date: February 27, 2020
    Inventors: HAMID NOORBAKHSH, KARTIK RAMASWAMY, SERGIO F. SHOJI, KENNY DOAN, JOSEPH PERRY
  • Publication number: 20200066566
    Abstract: Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.
    Type: Application
    Filed: November 5, 2019
    Publication date: February 27, 2020
    Inventors: Kartik Ramaswamy, Anwar Husain, Haitao Wang, Evans Yip Lee, Jaeyong Cho, Hamid Noorbakhsh, Kenny L. Doan, Sergio Fukuda Shoji, Chunlei Zhang
  • Patent number: 10504765
    Abstract: Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: December 10, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Kartik Ramaswamy, Anwar Husain, Haitao Wang, Evans Yip Lee, Jaeyong Cho, Hamid Noorbakhsh, Kenny L. Doan, Sergio Fukuda Shoji, Chunlei Zhang
  • Publication number: 20190326100
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a body having a first side and a second side; a gas distribution plate disposed proximate the second side of the body and having an annular channel formed in a side surface; and a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the clamp includes a body and a protrusion extending radially inward into the annular groove, and wherein a portion of the gas distribution plate extends over a bottom surface of the clamp.
    Type: Application
    Filed: July 2, 2019
    Publication date: October 24, 2019
    Inventors: Hamid Noorbakhsh, Xiaoping Zhou