Patents by Inventor Han Chang
Han Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240145304Abstract: An interconnect structure is provided. The interconnect structure includes a transistor on a substrate, a first dielectric layer over the transistor, a first metal line through the first dielectric layer, a second dielectric layer over the first dielectric layer, and a via through the second dielectric layer and on the first metal line. A first side surface of the first dielectric layer includes a first portion in direct contact with the first metal line and a second portion in direct contact with the via, and the first portion of the first side surface of the first dielectric layer is aligned with the second portion of the first side surface of the first dielectric layer.Type: ApplicationFiled: December 22, 2023Publication date: May 2, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chih-Han LIN, Che-Cheng CHANG
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Publication number: 20240142776Abstract: A pupil replicator for a head up display system includes a waveguide adapted to receive an incoming image beam, and including a transparent body having a partially transmissive top surface and a reflective bottom surface, a Dammann grating adapted to create a plurality of duplicate image beams having equal intensity, and reflect each of the plurality of duplicate image beams within the waveguide, and a beam aligning device adapted to receive each of the plurality of duplicate image beams and to reflect each of the plurality of duplicate image beams at a common angle relative to the waveguide, wherein, after being reflected by the beam aligning device, each of the plurality of duplicate image beams are parallel to one another.Type: ApplicationFiled: October 26, 2022Publication date: May 2, 2024Inventors: Manoj Sharma, Thomas A. Seder, Kai-Han Chang
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Patent number: 11971544Abstract: A hybrid augmented reality head-up display system for displaying graphics upon a windscreen of a vehicle includes a windscreen having a transparent substrate including light emitting particles dispersed within, a primary graphic projection device for generating a first set of images upon the windscreen of the vehicle based on visible light, and a secondary graphic projection device for generating a second set of images upon a secondary area the windscreen of the vehicle based on an excitation light. The first set of images are displayed upon a primary area of the windscreen. The light emitting particles in the windscreen emit visible light in response to absorbing the excitation light. The first set of images displayed upon the primary area of the windscreen cooperate with the second set of images displayed upon the secondary area of the windscreen to create an edge-to-edge augmented reality view.Type: GrantFiled: May 20, 2022Date of Patent: April 30, 2024Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLCInventors: Thomas A. Seder, Kai-Han Chang, Joseph F. Szczerba, John P. Weiss
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Patent number: 11973127Abstract: Semiconductor structures and method for forming the same are provide. The semiconductor structure includes a fin structure protruding from a substrate and a gate structure formed across the fin structure. The semiconductor structure further includes an Arsenic-doped region formed in the fin structure and a source/drain structure formed over the Arsenic-doped region. In addition, a bottommost portion of the Arsenic-doped region is lower than a bottommost portion of the source/drain structure.Type: GrantFiled: November 4, 2020Date of Patent: April 30, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shahaji B. More, Shih-Chieh Chang, Cheng-Han Lee, Huai-Tei Yang
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Patent number: 11973048Abstract: A semiconductor package includes a first die having a first surface, a first conductive bump over the first surface and having first height and a first width, a second conductive bump over the first surface and having a second height and a second width. The first width is greater than the second width and the first height is substantially identical to the second height. A method for manufacturing the semiconductor package is also provided.Type: GrantFiled: November 8, 2021Date of Patent: April 30, 2024Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: An-Nong Wen, Ching-Han Huang, Ching-Ho Chang
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Publication number: 20240137592Abstract: An information processing method of the present disclosure includes: via one or more computer processors, receiving data relating to live sales performed by a livestreamer via live video streaming; inputting the data into a machine learning model; and based on a result generated by the machine learning model, obtaining promotional information that is useful for the livestreamer to perform the live sales.Type: ApplicationFiled: October 10, 2023Publication date: April 25, 2024Inventors: Yung-Chi HSU, Chia-Han CHANG, Chen-Hai TENG
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Publication number: 20240134410Abstract: The present disclosure discloses a memory access interface device. A clock generation circuit generates reference signals. A transmitter transmits an output command and address signal to a memory device according to the reference signals. A signal training circuit executes a training process in a training mode that includes steps outlined below. A training signal is generated such that the training signal is transmitted as the output command and address signal. The training signal and the data signal generated by the memory device are compared to generate a comparison result indicating whether the data signal matches the training signal. The comparison result is stored. The clock generation circuit is controlled to modify a phase of at least one of the reference signals to be one of a plurality of under-test phases to execute a new loop of the training process until all the under-test phases are trained.Type: ApplicationFiled: October 24, 2022Publication date: April 25, 2024Inventors: FU-CHIN TSAI, GER-CHIH CHOU, CHUN-CHI YU, CHIH-WEI CHANG, MIN-HAN TSAI
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Publication number: 20240134239Abstract: A display device including a substrate, a cholesteric liquid crystal layer, and a transparent electrode layer that are sequentially stacked is provided. The cholesteric liquid crystal layer includes cholesteric liquid crystal molecules and a plurality of transparent photoresist structures. Each of the transparent photoresist structures is a closed structure, and the cholesteric liquid crystal molecules are respectively accommodated in a plurality of patterned areas respectively surrounded by the transparent photoresist structures, so as to form a plurality of cholesteric liquid crystal patterns. The transparent electrode layer includes a plurality of sub-electrodes. The cholesteric liquid crystal patterns are respectively driven by the sub-electrodes. An orthogonal projection of each of the transparent photoresist structures on the substrate falls in an orthogonal projection of a corresponding sub-electrode of the sub-electrodes on the substrate.Type: ApplicationFiled: October 22, 2023Publication date: April 25, 2024Applicant: AUO CorporationInventors: Chun-Han Lee, Chien-Chuan Chen, Ju-Wen Chang, Hsin Chiang Chiang, Peng-Yu Chen
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Publication number: 20240137431Abstract: A packet sorting and reassembly circuit module, including a header parser, an information processing circuit, at least one state tracking and reassembly circuit, and an output arbiter, is provided. The header parser is configured to analyze multiple first packet segments to obtain header information corresponding to a first network packet, wherein the first network packet is transmitted based on a transmission control protocol (TCP) communication protocol. The information processing circuit is configured to transmit the first packet segments and sideband information corresponding to the first packet segments to a first state tracking and reassembly circuit among the at least one state tracking and reassembly circuit according to the header information. The first state tracking and reassembly circuit is configured to reassemble and sort the first packet segments according to the sideband information. The output arbiter is configured to output the first packet segments according to a sorting result.Type: ApplicationFiled: January 16, 2023Publication date: April 25, 2024Applicants: Chung Yuan Christian University, KGI Securities Co. Ltd.Inventors: Yu-Kuen Lai, Chao-Lin Wang, He-Ping Li, Cheng-Han Chuang, Kai-Po Chang
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Publication number: 20240134279Abstract: A photoresist includes a solvent, a polymer and an additive. The polymer is dissolved in the solvent, and the additive is dispersed in the solvent. The additive includes a double bond or includes an epoxy group. The additive has a surface tension different from a surface tension of the polymer.Type: ApplicationFiled: March 27, 2023Publication date: April 25, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chieh-Hsin HSIEH, Wei-Han LAI, Ching-Yu CHANG
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Patent number: 11967652Abstract: A sensor package structure includes a substrate, a sensor chip and a ring-shaped solder mask frame those are disposed on the substrate, a ring-shaped support disposed on a top side of the annular solder mask frame, and a light permeable member that is disposed on the ring-shaped support. The sensor chip is electrically coupled to the substrate. A top surface of the sensor chip has a sensing region, and the sensing region is spaced apart from an outer lateral side of the sensor chip by a distance less than 300 ?m. The ring-shaped solder mask frame surrounds and contacts the outer lateral side of the sensor chip. The light permeable member, the ring-shaped support, and the sensor chip jointly define an enclosed space.Type: GrantFiled: February 16, 2023Date of Patent: April 23, 2024Assignee: TONG HSING ELECTRONIC INDUSTRIES, LTD.Inventors: Fu-Chou Liu, Jui-Hung Hsu, Yu-Chiang Peng, Chien-Chen Lee, Ya-Han Chang, Li-Chun Hung
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Patent number: 11968908Abstract: In an embodiment, a method includes: forming a first inter-metal dielectric (IMD) layer over a semiconductor substrate; forming a bottom electrode layer over the first IMD layer; forming a magnetic tunnel junction (MTJ) film stack over the bottom electrode layer; forming a first top electrode layer over the MTJ film stack; forming a protective mask covering a first region of the first top electrode layer, a second region of the first top electrode layer being uncovered by the protective mask; forming a second top electrode layer over the protective mask and the first top electrode layer; and patterning the second top electrode layer, the first top electrode layer, the MTJ film stack, the bottom electrode layer, and the first IMD layer with an ion beam etching (IBE) process to form a MRAM cell, where the protective mask is etched during the IBE process.Type: GrantFiled: June 30, 2022Date of Patent: April 23, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Tai-Yen Peng, Hui-Hsien Wei, Han-Ting Lin, Sin-Yi Yang, Yu-Shu Chen, An-Shen Chang, Qiang Fu, Chen-Jung Wang
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Patent number: 11964298Abstract: A slot die coating device according to one embodiment of the present disclosure includes a slot die coater forming an internal space for housing an electrode slurry and a discharge passage in communication with the internal space to discharge the electrode slurry; and a block positioned in the internal space, wherein a first distance defined between a first inside portion and a second inside portion forming the internal space is greater than a second distance defined between a first discharge inside portion and a second discharge inside portion forming the discharge passage, and wherein the block comprises a first block facing the first inside portion and a second block facing the second inside portion.Type: GrantFiled: May 4, 2021Date of Patent: April 23, 2024Assignee: LG Energy Solution, Ltd.Inventors: Jeong Soo Seol, Hwan Han Kim, Seok Ju Chang
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Publication number: 20240120277Abstract: A chip structure is provided. The chip structure includes a substrate, a redistribution layer over the substrate, a bonding pad over the redistribution layer, a shielding pad over the redistribution layer and surrounding the bonding pad, an insulating layer over the redistribution layer and the shielding pad, and a bump over the bonding pad and the insulating layer. The insulating layer includes a first part and a second part surrounded by the first part, the first part has first thickness, the second part has a second thickness, and the first thickness and the second thickness are different.Type: ApplicationFiled: December 18, 2023Publication date: April 11, 2024Inventors: Hong-Seng SHUE, Sheng-Han TSAI, Kuo-Chin CHANG, Mirng-Ji LII, Kuo-Ching HSU
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Publication number: 20240115616Abstract: The present disclosure provides a method for treating liver cirrhosis by using a composition including mesenchymal stem cells, extracellular vesicles produced by the mesenchymal stem cells, and growth factors. The composition of the present disclosure achieves the effect of treating liver cirrhosis through various efficacy experiments.Type: ApplicationFiled: October 4, 2023Publication date: April 11, 2024Inventors: Po-Cheng Lin, Pi-Chun Huang, Zih-Han Hong, Ming-Hsi Chuang, Yi-Chun Lin, Chia-Hsin Lee, Chun-Hung Chen, Chao-Liang Chang, Kai-Ling Zhang
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Publication number: 20240120314Abstract: Methods of ion implantation combined with annealing using a pulsed laser or a furnace for cutting substrate in forming semiconductor devices and semiconductor devices including the same are disclosed. In an embodiment, a method includes forming a transistor structure of a device on a first semiconductor substrate; forming a front-side interconnect structure over a front side of the transistor structure; bonding a carrier substrate to the front-side interconnect structure; implanting ions into the first semiconductor substrate to form an implantation region of the first semiconductor substrate; and removing the first semiconductor substrate. Removing the first semiconductor substrate includes applying an annealing process to separate the implantation region from a remainder region of the first semiconductor substrate. The method also includes forming a back-side interconnect structure over a back side of the transistor structure.Type: ApplicationFiled: December 20, 2023Publication date: April 11, 2024Inventors: Huicheng Chang, Jyh-Cherng Sheu, Chen-Fong Tsai, Yun Chen Teng, Han-De Chen, Yee-Chia Yeo
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Patent number: 11955336Abstract: Method of manufacturing a semiconductor device, includes forming a protective layer over substrate having a plurality of protrusions and recesses. The protective layer includes polymer composition including polymer having repeating units of one or more of: Wherein a, b, c, d, e, f, g, h, and i are each independently H, —OH, —ROH, —R(OH)2, —NH2, —NHR, —NR2, —SH, —RSH, or —R(SH)2, wherein at least one of a, b, c, d, e, f, g, h, and i on each repeating unit is not H. R, R1, and R2 are each independently a C1-C10 alkyl group, a C3-C10 cycloalkyl group, a C1-C10 hydroxyalkyl group, a C2-C10 alkoxy group, a C2-C10 alkoxy alkyl group, a C2-C10 acetyl group, a C3-C10 acetylalkyl group, a C1-C10 carboxyl group, a C2-C10 alkyl carboxyl group, or a C4-C10 cycloalkyl carboxyl group, and n is 2-1000. A resist layer is formed over the protective layer, and the resist layer is patterned.Type: GrantFiled: April 23, 2021Date of Patent: April 9, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Jing Hong Huang, Wei-Han Lai, Ching-Yu Chang
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Patent number: 11955397Abstract: A semiconductor structure is provided. The semiconductor structure includes a substrate, a channel layer, a barrier layer, a compound semiconductor layer, a gate electrode, and a stack of dielectric layers. The channel layer is disposed on the substrate. The barrier layer is disposed on the channel layer. The compound semiconductor layer is disposed on the barrier layer. The gate electrode is disposed on the compound semiconductor layer. The stack of dielectric layers is disposed on the gate electrode. The stack of dielectric layers includes layers having different etching rates.Type: GrantFiled: November 9, 2020Date of Patent: April 9, 2024Assignee: Vanguard International Semiconductor CorporationInventors: Shin-Cheng Lin, Cheng-Wei Chou, Ting-En Hsieh, Yi-Han Huang, Kwang-Ming Lin, Yung-Fong Lin, Cheng-Tao Chou, Chi-Fu Lee, Chia-Lin Chen, Shu-Wen Chang
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Publication number: 20240114693Abstract: In one embodiment, an apparatus includes a first metal layer, a second metal layer above the first metal layer, a first metal via generally perpendicular with and connected to the first metal layer, a second metal via generally perpendicular with and connected to the second metal layer, a third metal via generally perpendicular with and extending through the first metal layer and the second metal layer, a ferroelectric material between the third metal via and the first metal layer and between the third metal via and the second metal layer, and a hard mask material around a portion of the first metal via above the first metal layer and the second metal layer, around a portion of the second metal via above the first metal layer and the second metal layer, and around a portion of the ferroelectric material above the first metal layer and the second metal layer.Type: ApplicationFiled: September 30, 2022Publication date: April 4, 2024Applicant: Intel CorporationInventors: Christopher M. Neumann, Brian Doyle, Nazila Haratipour, Shriram Shivaraman, Sou-Chi Chang, Uygar E. Avci, Eungnak Han, Manish Chandhok, Nafees Aminul Kabir, Gurpreet Singh
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Publication number: 20240113154Abstract: A semiconductor device may include a compound substrate and a 3-dimensional inductor structure. The compound substrate may include a front surface and a back surface. The 3-dimensional inductor structure may include a front conductive stack, a back conductive layer, and at least one through-hole structure. At least one portion of the front conductive stack may include a first conductive layer disposed on the front surface of the compound substrate, and a second conductive layer disposed on the first conductive layer. The second conductive layer has a thickness ranging between 30 micrometers and 400 micrometers. The back conductive layer is disposed on the back surface of the compound substrate. The at least one through-hole structure penetrates through the compound substrate, and electrically connects the front conductive stack to the back conductive layer.Type: ApplicationFiled: November 20, 2022Publication date: April 4, 2024Applicant: RichWave Technology Corp.Inventors: Chia-Wei Chang, Yan-Han Huang, Chin-Chia Chang