Patents by Inventor Han-Lin Wu

Han-Lin Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LENS ASSEMBLY AND METHOD FOR FORMING THE SAME
    Publication number: 20120194915
    Abstract: A method for forming a lens assembly is provided, including: providing a mold substrate, wherein at least a recess is formed from a surface of the mold substrate; providing a transparent substrate; disposing a lens precursor material on the surface of the mold substrate or on a first surface of the transparent substrate; disposing the mold substrate on the transparent substrate such that at least a portion of the lens precursor material is filled in the recess; disposing a mask on a second surface of the transparent substrate to partially cover the transparent substrate; after the mask is disposed, irradiating a light on the second surface of the transparent substrate to transform at least a portion of the lens precursor material on the first surface of the transparent substrate into a lens; and removing the mask and the mold substrate from the transparent substrate and the lens.
    Type: Application
    Filed: October 25, 2011
    Publication date: August 2, 2012
    Inventors: Han-Lin WU, Chih-Chiang Ho, Lin-Ya Tseng, Chia-Yang Chang, Kuo-Jung Fu
  • Lens assembly and method for forming the same
    Patent number: 8072685
    Abstract: A method for forming a lens assembly is provided, including: providing a mold substrate, wherein at least a recess is formed from a surface of the mold substrate; providing a transparent substrate; disposing a lens precursor material on the surface of the mold substrate or on a first surface of the transparent substrate; disposing the mold substrate on the transparent substrate such that at least a portion of the lens precursor material is filled in the recess; disposing a mask on a second surface of the transparent substrate to partially cover the transparent substrate; after the mask is disposed, irradiating a light on the second surface of the transparent substrate to transform at least a portion of the lens precursor material on the first surface of the transparent substrate into a lens; and removing the mask and the mold substrate from the transparent substrate and the lens.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: December 6, 2011
    Assignees: OmniVision Technologies, Inc., VisEra Technologies Company Limited
    Inventors: Han-Lin Wu, Chih-Chiang Ho, Lin-Ya Tseng, Chia-Yang Chang, Kuo-Jung Fu
  • Method for repairing a phase shift mask
    Patent number: 7348106
    Abstract: A method is disclosed for repairing an attenuated phase shift mask. The mask initially has a mask substrate coated with a predetermined shift layer material, a mask pattern layer, and an energy beam resist layer sequentially. After forming a predetermined mask pattern in the mask pattern layer through an energy beam resist layer, the mask is inspected for detecting at least one missing pattern in the mask pattern layer. The predetermined mask pattern is repaired in a predetermined defect area for correcting the missing pattern. After the missing pattern is reformed. The predetermined mask pattern is transferred in the shift layer material.
    Type: Grant
    Filed: May 7, 2004
    Date of Patent: March 25, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hung-Chun Wang, Ming-Chih Hsieh, Han-Lin Wu
  • Method for repairing a phase shift mask
    Publication number: 20050247669
    Abstract: A method is disclosed for repairing an attenuated phase shift mask. The mask initially has a mask substrate coated with a predetermined shift layer material, a mask pattern layer, and an energy beam resist layer sequentially. After forming a predetermined mask pattern in the mask pattern layer through an energy beam resist layer, the mask is inspected for detecting at least one missing pattern in the mask pattern layer. The predetermined mask pattern is repaired in a predetermined defect area for correcting the missing pattern. After the missing pattern is reformed. The predetermined mask pattern is transferred in the shift layer material.
    Type: Application
    Filed: May 7, 2004
    Publication date: November 10, 2005
    Inventors: Hung-Chun Wang, Ming-Chih Hsieh, Han-Lin Wu