Patents by Inventor Han-Song LEE

Han-Song LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist underlayer composition and process of producing integrated circuit devices using same
    Patent number: 8841218
    Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product of hydrolyzed products produced from a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and a compound represented by Chemical Formula 3.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: September 23, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Kwen-Woo Han, Mi-Young Kim, Woo-Jin Lee, Han-Song Lee, Seung-Hee Hong, Sang-Kyun Kim, Jin-Wook Lee
  • PROCESS OF PREPARING A GAP FILLER AGENT, A GAP FILLER AGENT PREPARED USING SAME, AND A METHOD FOR MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE GAP FILLER AGENT
    Publication number: 20140187017
    Abstract: A method of preparing a gap filler agent includes adding a halosilane to a basic solvent, and, to the basic solvent and the halosilane, adding ammonia in an amount of about 50 to about 70 parts by weight based on 100 parts by weight of the halosilane at a rate of about 1 g/hr to about 15 g/hr.
    Type: Application
    Filed: December 31, 2013
    Publication date: July 3, 2014
    Inventors: Jin-Hee BAE, Han-Song LEE, Taek-Soo KWAK, Go-Un KIM, Bo-Sun KIM, Sang-Kyun KIM, Yoong-Hee NA, Eun-Su PARK, Jin-Woo SEO, Hyun-Ji SONG, Sang-Hak LIM, Wan-Hee LIM, Seung-Hee HONG, Byeong-Gyu HWANG
  • RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING SAME
    Publication number: 20130037921
    Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product of hydrolyzed products produced from a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and a compound represented by Chemical Formula 3.
    Type: Application
    Filed: August 10, 2012
    Publication date: February 14, 2013
    Inventors: Kwen-Woo HAN, Mi-Young KIM, Woo-Jin LEE, Han-Song LEE, Seung-Hee HONG, Sang-Kyun KIM, Jin-Wook LEE
  • RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING THE SAME
    Publication number: 20120270981
    Abstract: A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3, [R1O]3Si—X ??[Chemical Formula 1] [R2O]3Si—R3 ??[Chemical Formula 2] [R4O]3Si—Si[OR5]3.
    Type: Application
    Filed: July 2, 2012
    Publication date: October 25, 2012
    Inventors: Mi-Young KIM, Woo-Jin LEE, Kwen-Woo HAN, Han-Song LEE, Sang-Kyun KIM, Jong-Seob KIM