Patents by Inventor Hans Butler
Hans Butler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10191389Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.Type: GrantFiled: July 18, 2017Date of Patent: January 29, 2019Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
-
Patent number: 10191392Abstract: An actuator includes coil assemblies arranged in an array, wherein each coil assembly defines a core chamber having a core chamber height; and at least one magnetic member that extends partly along the core chamber height of the core chamber of a corresponding at least one coil assembly, wherein the at least one magnetic member is made of a magnetic material. A shape of the at least one magnetic member, a size of the at least one magnetic member, a position of the at least one magnetic member and/or the magnetic material of the at least one magnetic member may be selected so as to control one or more parameters of the actuator.Type: GrantFiled: July 10, 2015Date of Patent: January 29, 2019Assignee: ASML Netherlands B.V.Inventors: Johannes Adrianus Antonius Theodorus Dams, Dirk Hendrikus Marinus Engelen, Peter Michel Silvester Maria Heijmans, Simon Bernardus Cornelis Maria Martens, Hans Butler, Antonius Franciscus Johannes De Groot
-
Patent number: 10180629Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: GrantFiled: December 20, 2016Date of Patent: January 15, 2019Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebranc Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christian Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
-
Publication number: 20190011838Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.Type: ApplicationFiled: December 7, 2016Publication date: January 10, 2019Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Fransiscus Mathijs JACOBS, Pavel KAGAN, Jeroen Pieter STARREVELD, Maurice Willem Jozef Etiënne WIJCKMANS
-
Patent number: 10175587Abstract: A control device configured to determine a primary first drive signal, based on a first error signal representing a difference between desired and measured positions of a first body, for driving a positioner driving the first body; determine a primary second drive signal, based on a second error signal representing a difference between desired and measured positions of a second body, for driving a positioner driving the second body; determine, based on the second error signal, a secondary first drive signal for driving the first body positioner; determine, based on the first error signal, a secondary second drive signal for driving the second body positioner; combine the primary and secondary first drive signals and combine the primary and secondary second drive signals; and output the combined first and second drive signals to the respective positioning devices.Type: GrantFiled: November 21, 2014Date of Patent: January 8, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Marcus Joseph Elisabeth Godfried Breukers, Marcel François Heertjes
-
Publication number: 20180373156Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.Type: ApplicationFiled: November 17, 2016Publication date: December 27, 2018Inventors: Hans BUTLER, Björn Hubertus Maria BUKKEMS, Cornelius Adrianus Lambertus DE HOON, Maurice Willem Jozef Etiënne WIJCKMANS
-
Patent number: 10139735Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.Type: GrantFiled: May 13, 2015Date of Patent: November 27, 2018Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Hans Butler, Christiaan Alexander Hoogendam, Sander Kerssemakers, Bart Smeets, Robertus Nicodemus Jacobus Van Ballegoij, Hubertus Petrus Leonardus Henrica Van Bussel
-
Publication number: 20180335705Abstract: A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.Type: ApplicationFiled: November 17, 2016Publication date: November 22, 2018Inventors: Hans BUTLER, Johannes Petrus Martinus Bernardus VERMEULEN, Engelbertus Antonius Fransiscus VAN DER PASCH
-
Publication number: 20180329292Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.Type: ApplicationFiled: September 30, 2016Publication date: November 15, 2018Applicant: ASML Netherlands B.V.Inventors: Junichi KANEHARA, Hans BUTLER, Paul Cornè Henri DE WIT, Engelbertus Antonius Fransiscus VAN DER PASCH
-
Patent number: 10120293Abstract: An object positioning system includes an object; a measurement system to measure the position of the object, wherein each sensor of the measurement system has an associated measurement area on the object and wherein a location of at least one measurement area on the object is dependent on the position of the object; an actuator system to position the object; a control system configured to drive the actuator system, wherein the control system includes an observer with a dynamic model of the object to estimate an internal dynamic behavior of the object, wherein the dynamic model includes the dependency of the location of at least one measurement area on the position of the object, and wherein the control system is configured to drive the actuator system in dependency of an output of the observer.Type: GrantFiled: September 25, 2014Date of Patent: November 6, 2018Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Ramidin Izair Kamidi, Yanin Kasemsinsup
-
Publication number: 20180224755Abstract: A lithographic apparatus includes a patterning device support to support a patterning device, the patterning device system including a moveable structure movably arranged relative to an object, a patterning device holder movably arranged relative to the movable structure to hold the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder with respect to the movable structure; a substrate support to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system; and a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.Type: ApplicationFiled: April 9, 2018Publication date: August 9, 2018Applicant: ASML Netherland B.V.Inventor: Hans BUTLER
-
Patent number: 9977349Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.Type: GrantFiled: December 18, 2014Date of Patent: May 22, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Ingmar August Kerp, Pieter Johannes Gertrudis Meijers, Jeroen Pieter Starreveld, Derk Ten Hoopen, Martinus Van Duijnhoven, Edward Hage, Evert Hendrik Jan Draaijer, Wesley Ooms
-
Patent number: 9946168Abstract: A lithographic apparatus includes a patterning device support to support a patterning device to form a patterned radiation beam, the patterning device support including a moveable structure movably arranged with respect to an object, a patterning device holder movably arranged relative to the movable structure and holding the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder relative to the movable structure; a substrate support to hold a substrate; and a projection system to project the patterned radiation beam onto the substrate, a position measurement system for measuring a substrate positional error which is a difference between a desired position and an actual position of the substrate relative to a reference object; and a controller to move the actuator and the ultra short stroke actuator based on the substrate positional error.Type: GrantFiled: April 5, 2013Date of Patent: April 17, 2018Assignee: ASML NETHERLANDS B.V.Inventor: Hans Butler
-
Patent number: 9927721Abstract: An object positioning system including a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.Type: GrantFiled: May 1, 2015Date of Patent: March 27, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Wilhelmus Henricus Theodorus Maria Aangenent, Nic Jasper Dirkx, Ramidin Izair Kamidi, Wilhelmus Franciscus Johannes Simons
-
Publication number: 20180017879Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.Type: ApplicationFiled: January 26, 2016Publication date: January 18, 2018Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Maurice Willem Jozef Etiënne WIJCKMANS, Engelbertus Antonius Fransiscus VAN DER PASCH, Christiaan Alexander HOOGENDAM, Bernardus Antonius Johannes LUTTIKHUIS
-
Publication number: 20170363965Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.Type: ApplicationFiled: November 16, 2015Publication date: December 21, 2017Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Raoul Maarten Simon KNOPS, Bob STREEFKERK, Christiaan Louis VALENTIN, Jan Bernard Plechelmus VAN SCHOOT, Wilhelmus Franciscus Johanne SIMONS, Leon Leonardus Franciscus MERKX, Robertus Johannes Marinus DE JONGH, Roel Johannes Elisabeth MERRY, Michael Frederik YPMA
-
Publication number: 20170343904Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.Type: ApplicationFiled: July 18, 2017Publication date: November 30, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Joeri LOF, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Helmar VAN SANTEN
-
Patent number: 9753381Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.Type: GrantFiled: February 15, 2013Date of Patent: September 5, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Hans Butler
-
Patent number: 9754711Abstract: A vibration isolator is provided including a base structure, a load structure, a displacement structure and at least one vertical open gap formed by opposing and substantially parallel walls of the base structure and the load structure. The opposing walls being at least partly covered by respective arrays of permanent magnets, neighboring magnets in the arrays having alternating magnetization directions, an arrangement of the permanent magnets in the arrays being such that a gravitational force on the load structure is substantially compensated by a net magnetic force of the base structure on the load structure. The displacement structure relatively displaces arrays of permanent magnets of the opposing walls with respect to each along the gap for adjusting a load capacity of the vibration isolator.Type: GrantFiled: December 11, 2015Date of Patent: September 5, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Jeroen Lodevicus Gerardus Janssen, Johannes Jacobus Hubertus Paulides, Elena Andreevna Lomonova, Dave Theodorus Everardus Henricus Van Casteren, Hans Butler
-
Patent number: 9746312Abstract: A lithographic apparatus includes a support configured to hold an object, the support being moveable relative to a reference structure in a direction; a first position measurement system configured to provide a first measurement signal in a first frequency range, the first measurement signal representative of a position of the support relative to the reference structure in the direction; a second position measurement system configured to provide a second measurement signal in a second frequency range, the second measurement signal representative of the position of the support relative to the reference structure in the direction; and a processor configured to (a) filter the first measurement signal so as to attenuate a signal component having a frequency in the second frequency range, (b) filter the second measurement signal so as to attenuate a signal component having a frequency in the first frequency range, and (c) combine the filtered first measurement signal and the filtered second measurement signal intoType: GrantFiled: February 7, 2011Date of Patent: August 29, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Engelbertus Antonius Franciscus Van Der Pasch