Abstract: An apparatus and method for generating gas-phase active chemical species suitable for selectively processing one side of a textile or nonwoven material are described. Processing includes etching or stripping coatings, as examples. A low-temperature plasma is used to produce an ionized gas containing radical species, atoms, ions, and electrons, some of which are suitable for removing or modifying the coating. For the purposes of the present invention, the plasma may be generated in a vacuum, or at atmospheric pressure. Dielectric-barrier discharges, atmospheric-pressure plasma jets, micro hollow-cathode discharges, coronas, or plasmas produced by a microwave discharge or laser-supplied energy may be used to generate the required species.

Abstract: Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.

Abstract: A non-arcing atmospheric pressure plasma processing reactor that includes a wafer platform that is electrically conductive and operatively placed near at least one radio frequency electrode to allow the creation of an electric field. An rf power supply is electrically attached to both the radio frequency electrode and the wafer platform to create said electric field for generation of said non-arcing atmospheric pressure plasma. A process gas supply comprising a mixture of 90% to 99% support gas to 1 % to 10% reactive gas is supplied to the electric field to generate the atmospheric pressure plasma.

Abstract: Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.

Abstract: A plant and a process for crushing and mash production is provided wherein the raw material to be processed is broken up and mashed in a mill system. Prior to the mill system (1) being filled with the material (6) to be crushed the mill system is filled with an inert gas from a gas reservoir (13) so that the atmospheric oxygen in the mill system (1) is substantially displaced. After the mill system (1) has been filled, the latter is sealed in substantially gas-tight manner and the raw material (6) is ground and mashed in, subject to exclusion of atmospheric oxygen.

Abstract: A device for the feeding of mash into a lauter tun is provided with a mash pump, a main pipe (12) which is connected to the mash pump and at least two partial stream pipes (6) which connect the main pipe (12) to a feed opening (19) in the lauter tun (2) in each case. When the mash pump is in operation, mash is fed from a mash container into the lauter tun (2) via the main pipe (12) and the partial stream pipes (6). To enable the mash to flow into the lauter tun (2) in as uniform a manner as possible a buffer vessel (22) is arranged between the main pipe (12) and the partial stream pipes (6).

Abstract: A mechanical four wheel drive tractor having a solenoid valve which is de-energized to effect engagement of drive to the front wheels in a predetermined operational mode. Normally, the valve is controlled by an operator switch but when the engine is overloaded and exhaust gas temperature rises, a thermal sensor breaks the circuit to the solenoid valve so that four wheel drive is automatically engaged. This action is restricted to a low gear range by a switch linked to the mechanism selecting between the low range and a high range. Restriction to a low gear range prevents unwanted automatic four wheel drive engagement from occuring in other gear ranges without regard to vehicle speed. Automatic engagement of four wheel drive reduces the overload on the transmission.

Abstract: A stackable, tray-type packaging unit for semiconductor discs, having a lr portion accommodating the discs and a matching lid, comprising two upright, elongated side walls in the lower portion and two narrow end walls, all walls as well as the lid consisting of deep-drawn plastic material inert to the disc material. A plurality of ribs are formed opposite to each other on the side walls, serving as guide means for the discs during the loading of the unit, stabilizing ribs for accommodating the discs are provided in the base of the lower portion on the joining line between opposite guide ribs. The lower part of the side walls are curved inwardly at an angle of 30.degree. to 60.degree. with respect to the perpendicular upper part.

Abstract: This relates to a process for manufacturing monolithic integrated circuits comprising at least one pair of complementary bipolar planar transistors. The pair of transistors, having two buried layers and two superimposed epitaxially deposited layers upon a semiconductor substrate body, are manufactured by deposition of an epitaxial layer having a thickness wherein the base zone of the pnp-transistor remains and is surrounded by a p-conducting zone which is diffused during the diffusion of the base zone of the npn-transistor and a portion of an insulating zone.